bnl photocathode r&d
DESCRIPTION
BNL Photocathode R&D. An overview of research on high quantum efficiency photocathodes and associated laser systems. Andrew Burrill HPHB Workshop Nov 9, 2004. Photocathode Criteria. High Quantum Efficiency 0.5 A at 351 MHz (1/2 RF frequency) = 1.3nC/bunch Uniform emission surface - PowerPoint PPT PresentationTRANSCRIPT
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BNL Photocathode R&DBNL Photocathode R&DAn overview of research on high An overview of research on high
quantum efficiency photocathodes quantum efficiency photocathodes and associated laser systemsand associated laser systems
Andrew BurrillHPHB WorkshopNov 9, 2004
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High Quantum Efficiency High Quantum Efficiency 0.5 A at 351 MHz (1/2 RF frequency) = 1.3nC/bunch0.5 A at 351 MHz (1/2 RF frequency) = 1.3nC/bunch
Uniform emission surfaceUniform emission surface Long lifetimeLong lifetime RobustRobust Reproducible preparation techniqueReproducible preparation technique Photoemission at convenient laser Photoemission at convenient laser
wavelengthwavelength
Photocathode CriteriaPhotocathode Criteria
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Research GoalsResearch Goals
Establish deposition system with a reproducible Establish deposition system with a reproducible optimized recipe optimized recipe
Study Lifetime related issues: Dependence on Study Lifetime related issues: Dependence on laser intensity and wavelength laser intensity and wavelength current density current density ContaminantsContaminants Vacuum conditions Vacuum conditions
Integration into load lock or diamond capsuleIntegration into load lock or diamond capsule
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Cathode OptionsCathode OptionsPhotocathodePhotocathode CsKCsK22SbSb CsCs22TeTe GaAsGaAs MgMg
Laser wavelengthLaser wavelength 532/355532/355 266 nm266 nm 800 nm800 nm 266 nm266 nm
QEQE 3%/10%3%/10% 3%3% 5-10%5-10% .1%.1%
Laser power to Laser power to achieve .5Aachieve .5A
38W/17W38W/17W 77 W77 W 15 W15 W 2300 W2300 W
Prompt emissionPrompt emission YesYes YesYes NoNo YesYes
Commercial Laser Commercial Laser availableavailable
YesYes NoNo MaybeMaybe NoNo
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Photocathode Deposition SystemPhotocathode Deposition System
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Fabrication ProcedureFabrication Procedure
Chemical Deposition Chemical Deposition systemsystem
Polished 1” Molybdenum Polished 1” Molybdenum substratesubstrate
Multi-stage deposition Multi-stage deposition processprocess
200 Å Sb, 150 Å K, ~200 Å 200 Å Sb, 150 Å K, ~200 Å Cs Cs
Current is monitored as a Current is monitored as a function of Cs depositionfunction of Cs deposition
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Current vs. Cs Deposition timeCurrent vs. Cs Deposition time
0
2
4
6
8
10
12
14
16
18
20
0 50 100 150 200 250 300 350 400
time (sec)
Cu
rre
nt (
uA
)
0
0.5
1
1.5
2
2.5
3
QE
(%
)
Current
QE %
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Surface UniformitySurface Uniformity
0
0.5
1
1.5
2
2.5
3
3.5
4
4.5
0 5 10 15 20 25 30
Position
curr
en
t (u
A)
545 nm
365 nm
Position for Cs/Kdeposition
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ReproducibilityReproducibility
0
5
10
15
20
25
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24
curr
en
t in
uA
2.6%
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Lifetime StudiesLifetime Studies
0
5
10
15
20
25
0 10 20 30 40 50 60
Days
Cur
rent
(uA
)
normal laser lifetime
focused laser
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Cathode Gun InterfaceCathode Gun Interface
Load-lock to attach deposition system to Load-lock to attach deposition system to SCRF gunSCRF gun
Capsule design with diamond window Capsule design with diamond window sealed onto photocathodesealed onto photocathode
Outcome of SEY program will determine Outcome of SEY program will determine final course takenfinal course taken
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Laser System RequirementsLaser System Requirements
351.875 MHz351.875 MHz 532 nm, 355 nm532 nm, 355 nm 10 ps pulse length10 ps pulse length Synchronized to Synchronized to
master RF clockmaster RF clock Adjustable output Adjustable output
powerpower Variety of amplifier Variety of amplifier
systemssystems
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Laser RequirementsLaser Requirements
Laser Laser WavelengthWavelength
CsKCsK22Sb QESb QE SEYSEY Desired Desired CurrentCurrent
Laser Laser Power to Power to CathodeCathode
532 nm532 nm 3%3% 00 0.5 A0.5 A 38 W38 W
532 nm532 nm 3%3% 5050 0.5 A0.5 A 0.7 W0.7 W
355 nm355 nm 9%9% 00 0.5 A0.5 A 17 W17 W
355 nm355 nm 9%9% 5050 0.5 A0.5 A 0.35 W0.35 W
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Laser Layout optionsLaser Layout options
Oscillator multi-pass Amplifier Chain Harmonic Conversion
CsK2Sb cathode in SCRF gun
CsK2Sb cathode with diamond secondary emitter
Oscillator Amplifier Harmonic Conversion
1064 nm351 MHzFew watts
Multi-passMulti-stageAdjustable output power to 80 W
2nd or 3rd Harmonic40 W green20 W UV
1064 nm351 MHzFew watts
Single pass(Optional)
2nd or 3rd Harmonic1 W green0.5 W UV
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ConclusionsConclusions
Cathode research Cathode research Moderate QE obtainedModerate QE obtained Good surface Good surface
uniformityuniformity Lifetime and current Lifetime and current
density studies are density studies are promisingpromising
Reproducibility needs Reproducibility needs to be betterto be better
Different Substrate Different Substrate materials will be materials will be studiedstudied
Laser SystemLaser System Commercial oscillators Commercial oscillators
are availableare available Outcome of SEY Outcome of SEY
experiments will experiments will determine amplifier determine amplifier needsneeds
Cathode-Gun Cathode-Gun interface being interface being addressedaddressed