anh huong cua o2 va nhiet do u_2

8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2

1/16

Quang ph Laser

DNG PH RAMAN V PH QUANGPHT QUANG

NGHIN CU NH HNG CA T LKH OXY V S NHIT I VI

MNG TIO2 CH TO BNG PP PHNX MAGNETON PHN NG


2/16


3/16

Quang ph Laser

MC CH:

Nghin cu s nh hng ca t l dng oxy avo trong h phn x trong vic ch to mng

Nghin cu s nh hng ca nhit trongqu trnh hnh thnh cu trc ca mng


4/16

Quang ph Laser

GiI THIU:

Ch to mng TiOx bng phng php phn xmagneton trc tip nhit phng vi t l dngoxy a vo khong 3-15%

Sau em nhit 350-750oC

Dng ph nhiu x tia X, quang pht quang vph Raman nghin cu tnh cht ca mng

2

22

FOFO % 100%FO FAr

! v


5/16

Quang ph Laser

TH NGHIM:

Dng p-Si(100), lm sch bi H2SO4 v H2O

Target Ti tinh khit 99.99%, ng knh 2in v cp vo ngun DC 100W

c p in th -150V

Khong cch gia v bia l 100mm

p sut nn 2.7*10-4 Pa, p sut lm vic 2.7*10-4

Pa

Thi gian phn x 40 pht

dy ca mng t 50-200nm


6/16

Quang ph Laser

Cu trc mng, thng tin phase (anatase hay rutile) o bi quang ph k tia X s dng bc x Cu K(0.1542nm). Made in Japan

Cc lin kt c o bi ph Raman. Made in rancePh PL dng laser He-Cd 325nm 50mW, cch t vCCD

O TNH CHT MNG:


7/16

Quang ph Lazer

LabRAM HRUV/Vis/NIR

+ Ar ion CW Laser (514.5nm, 488nm) upto 40mW at sample.+ He-Cd CW Laser (325nm) -Auto motor controlled XY mapping stage

Anatase Rutile


8/16

Quang ph Laser

Anatase

APPLICATION1- Paints, and Coating , emulsioninterior Paints, Enamels2- Road-Marking Paints3- Filler , Primers, and undercoat4- Paper Industry5- Plastic Industry6- Rubber Industry7- Cement Industry.

widely used in painting, printing oilpaper makingPlasticRubberartificial fiber (si quang nhn to)welding electric (hn in)Enamel (trng men)electric appliances and constructionmaterial etc

Rutile


9/16

GIXRD patterns of titanium oxide lms

formed at: 3, 6, 10 and 15 FO2% and

post-annealing at 750 C for 2 min in air

RESULTSAND DISCUSSION_ The deposition time was

xed at 40 min._ The crystalline (101)anatase peak denoted as

(101) at 25,3._ The (110) rutile peak

denoted as R(110) at 27.4can be easily observed fromthe TiOx thin lm formed at 3

O2%.

_ The intensity of anatasepeaks at 3 O2% is strongerthan rutile peaks.

_ As O2% is higher than6%, the rutile peaks cannot

be detected.


10/16

GIXRD patterns of titanium oxide lms

formed at: 3 FO2% and post-annealed

at RT, 350C , 550C , and 750C for 2

min in air.

RESULTSAND DISCUSSION

_ TiOx lm annealed at350C is still an amorphouslm because of no distinctdiffraction peak.

_ The mixed crystallineanatase and rutile lms areobtained after 550C and750C annealing.

_ The intensity of bothanatase and rutile peaksincreases with increasingtemperature.


11/16

Raman spectra of titanium oxide

lms formed at 3, 6, 10 and 15

FO2% and post-annealed at 750

C for 2 min in air.


_ The lm at 3 O2% showsseveral anatase peaks at 396and 639 cm 1 and rutile peaksat 449 and 612 cm 1.

_ The rutile peaks decreasewith increasing oxygen owratio.

_ The intensity of anatase

peak decreaseswith increasingoxygen ow ratio due to thereduction of lm thickness.


12/16

Raman spectra of titaniumoxide

lms at 3 FO2% and post-

annealed at RT, 350 C , 550 C ,

and 750 C for 2 min in air.


_ The intensity of anatasepeaks at 396 and 639 cm 1

and rutile peaks at 449 and612cm 1 increases withannealing temperature fromRT to 750C, especially foranatase peaks.


13/16


14/16

The Gaussian tted curve ofPL

spectra of the 3 FO2% lm at

750 C annealed for 2 min in

air.


_ The wide peak is mergedfrom two different TiOx peaks.

_ The curve can be tted into

two Gaussian peaks at 486 nm(2,55eV) and 588 nm(2,11eV).


15/16

PL spectra of titanium oxide lms

at 3 FO2% and post-annealed at

RT, 350 C , 550 C , and 750 C

for 2 min in air.


_ Luminescence shift caused by the mixed anatase andrutile phase.

_ The intensity of PL peaksincreases with annealingtemperature because ofenhancement of the crystalline

phase._ For the as-deposited and 350

C annealed samples, the PLsignal is very weak due to thepoor crystallinity.


16/16

The oxygen ow ratios during deposition and post-annealedtemperatures result in the evolution of phase formation of the lms

CONCLUSION

The XRD and Raman results indicate that the 3 FO2% lm isformed of a mixed phase of anatase and rutile, and the specimensof 10 FO2%, and 15 FO2% are the single-phase anatase after550750 C annealing

The as-deposited TiOx lms and those annealed at 350 C are all

amorphous because of no distinct diffraction peak.

The minimum thermal annealing temperature necessary tostimulate the crystallization of lm is between 350 C and 550C.

anh huong cua o2 va nhiet do u_2

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