analysis of microstrip lines on substrates composed of ...173580/fulltext01.pdf · compared with...
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Master Program in Electronics/Telecommunications
Examiner: Olof Bengtsson
Supervisor: Marcos V. T. Heckler
DEPARTMENT OF TECHNOLOGY AND BUILT ENVIRONMENT
Analysis of Microstrip Lines on Substrates Composed of Several Dielectric Layers under the Application of the
Discrete Mode Matching Subtitle
Manuel Gustavo Sotomayor Polar
September 2008
Master’s Thesis in Electronics/Telecommunications
Abstract
Microstrip structures became very attractive with the development of cost-effective
dielectric materials. Among several techniques suitable to the analysis of such
structures, the discrete mode matching method (DMM) is a full-wave approach that
allows a fast solution to Helmholz equation. Combined with a full-wave equivalent
circuit, the DMM allows fast and accurate analysis of microstrips lines on multilayered
substrates.
The knowledge of properties like dispersion and electromagnetic fields is essential in
the implementation of such transmission lines. For this objective a MATLAB computer
code was developed based on the discrete mode matching method (DMM) to perform
this analysis.
The principal parameter for the analysis is the utilization of different dielectric profiles
with the aim of a reduction in the dispersion in comparison with one-layer cylindrical
microstrip line, showing a reduction of almost 50%. The analysis also includes current
density distribution and electromagnetic fields representation. Finally, the data is
compared with Ansoft HFSS to validate the results.
ii
Acknowledgement
It would be unfair to start this thesis without the appropriate acknowledgement to all the
people who helped in one way or another in the accomplishment of this thesis, but it is
equally unfair not to acknowledge expressly many people who were keystones in this
work.
I would like to express my gratitude to my supervisor Marcos Heckler, his help, wise
advices and encouragements make possible the culmination of this thesis.
I would also like expressly to thank my dear friends Efrain, Juan Felipe, Juan Jose and
Olof for sharing wise advices and good times. To Enrique and Nikola, who have
supported me during my stay in Germany, making workdays nice and funny, especially
at lunch time. To The Orates group, for sharing a lifetime plenty of true friendship.
This thesis is dedicated to my beloved family, which always supported me in its
realization. I am very grateful for their love, understanding, help, support and to the
examples of my father F. Carlos Sotomayor Campana, my mother Ana Maria Polar de
Sotomayor, my brother Carlos and my sisters Victoria and Ana, their unflinching
courage and conviction will always inspire me. It is to them that I dedicate this work.
iii
Table of Contents
CHAPTER 1 ....................................................................................................... 1
Introduction..........................................................................................................................................1 1.1. The Problem................................................................................................................................1 1.2. Goal ............................................................................................................................................1 1.3. Previous Research .......................................................................................................................2 1.4. Justification of the Project ...........................................................................................................3
CHAPTER 2 ....................................................................................................... 4
Theory...................................................................................................................................................4 2.1. Discrete Mode Matching .............................................................................................................4
2.1.1. Cylindrical Microstrip Lines ................................................................................................4 2.1.2. Wave Equation in Cylindrical Coordinates ...........................................................................5 2.1.3. Tangential Field Components...............................................................................................6 2.1.4. Discretization.......................................................................................................................6 2.1.5. Matrix Formulations ............................................................................................................7 2.1.6. Hybrid Matrix......................................................................................................................8
2.2. Full-Wave Equivalent Circuit ....................................................................................................10 2.2.1. Propagation Constant .........................................................................................................11 2.2.2. Fields Analysis ..................................................................................................................12 2.2.3. Concept of Profile..............................................................................................................14
CHAPTER 3 ..................................................................................................... 15
Software Implementation ...................................................................................................................15 3.1. Method .....................................................................................................................................15
3.1.1. Basic Model.......................................................................................................................15 3.1.2. Dispersion Analysis ...........................................................................................................16 3.1.3. Currents Analysis...............................................................................................................20 3.1.4. Field Analysis ....................................................................................................................21 3.1.5. Base of Comparison ...........................................................................................................25 3.1.6. Validation of the Results ....................................................................................................25
CHAPTER 4 ..................................................................................................... 27
Results.................................................................................................................................................27 4.1. Dispersion Analysis...................................................................................................................27 4.2. Field Analysis ...........................................................................................................................32
iv
CHAPTER 5 ..................................................................................................... 36
Discussion ...........................................................................................................................................36
Future Work.......................................................................................................................................37 5.1. Characteristic Impedance...........................................................................................................37 5.2. Analysis of higher propagation modes .......................................................................................38
Conclusions.........................................................................................................................................39
References...........................................................................................................................................40
Appendix.............................................................................................................................................41
v
List of Figures Figure 1: (a) Outside cylindrical microstrip line. (b) Inside cylindrical microstrip line...................................................................5
Figure 2: Discretization of a cylindrical microstrip line .................................................................................................................7
Figure 3: Stratified dielectric layer ...............................................................................................................................................7
Figure 4: Full-wave Equivalent Circuit model ............................................................................................................................ 10
Figure 5: Full wave equivalent circuit, with only one current source. ........................................................................................... 10
Figure 6: Dielectric profile of a multilayered microstrip line........................................................................................................14
Figure 7: a) Discretization considering N=2, b) Discretization considering N=10, N: number of e-lines on the microstrip...............16
Figure 8: Extrapolation of the propagation constant when infinite number of e-lines on the microstrip ..........................................20
Figure 9: Sequence to calculate the fields in the substrate. ...........................................................................................................22
Figure 10: Sequence to calculate the fields in the superstrate. ......................................................................................................23
Figure 11: Interpolation of both the electric and magnetic field depending on the discrete angles .................................................. 24
Figure 12: Determination of the improvement in the dispersion. ..................................................................................................25
Figure 13: Deviation from the perfect circular cylinder ............................................................................................................... 25
Figure 14: Substrate and superstrate configuration of the microstrip line used for the validation.................................................... 26
Figure 15: a) Electric permittivity profiles of one-layer microstrip lines, b) Dispersion of the transmission lines. ........................... 27
Figure 16: Dispersion changes because of different profiles of the electric permittivity in the substrate..........................................28
Figure 17: Dispersion changes due to different profiles of the electric permittivity in the superstrate.. ...........................................28
Figure 18: Dispersion improvements because of different profiles of the electric permittivity in both the substrate and the superstrate. ..........................29
Figure 19: Dispersion improvements because of different profiles of the electric permittivity in both the substrate and the superstrate. ..........................29
Figure 20: Dispersion improvements because of different profiles of the electric permittivity in both the substrate and the superstrate. ..........................30
Figure 21: Dispersion improvements because of considering one continuous profile. ............................................................................................................31
Figure 22: Validation of the results, comparative between DMM and HFSS results in three different cases....................................31
Figure 23: Electric Field Distribution of a microstrip line with air as both substrate and superstrate. ..............................................32
Figure 24: Magnetic Field Distribution.......................................................................................................................................33
Figure 25: Real power distribution, a) Results obtained from DMM, b) Results obtained from HFSS. ...........................................33
Figure 26: a) Electric field distribution, b) Electric permittivity profile, c) Dispersion improvement. .............................................34
Figure 27: Magnetic field distribution ........................................................................................................................................34
Figure 28: Real power distribution, a) Results obtained from DMM, b) Results obtained from HFSS. ...........................................35
Figure 29: Invested time per simulation (average) using DMM and HFSS to calculate the propagation constant. ........................... 35
Figure 30: Second Propagation Mode, a) Electric Field. b) Dielectric Profile. c) Magnetic Field. d) Real Power Flow. ................... 38
Figure 31: Electric permittivity profile, Dispersion and real power. ............................................................................................. 41
Chapter 1
Introduction
1.1. The Problem
Microstrip lines are also utilized in applications where a cylindrical body is
present as vehicles, aircrafts, missiles or sounding rockets, because of their
light weight and conformability. The knowledge of properties like dispersion,
electromagnetic fields and current distributions, is essential in their
implementation.
1.2. Goal
The goal of this work is to investigate of the dispersion properties of conformal
microstrip lines printed on cylindrical structures, which consist of multiple
dielectric layers. For this purpose a MATLAB computer code will be
developed based on the discrete mode matching method (DMM) to compute
the propagation constants.
Chapter 1: Introduction
2 _______________________________________________________________________
The main parameter for the analysis will be the utilization of different
dielectric profiles. Finally a validation of DMM’s results will be carried out
comparing them with results given by HFSS.
1.3. Previous Research
As showed in [1], an extension of the Discrete Mode Matching for the analysis
of structures in cylindrical coordinates has been presented, giving very accurate
results when determining both the propagation constant and the effective
dielectric constant in cylindrical microstrip lines. It also suggests a way to be
implemented, so the analysis of microstrip lines composed of several dielectric
layers could be done.
Although there are several methods and approaches to analyze transmission
lines with cylindrical structure, some of them treated rectangular microstrip
lines and some others cylindrical microstrip lines and even cylindrical
striplines; every one of them has advantages and drawbacks.
The method of lines is suitable for the analysis of asymmetric cylindrical
homogeneous and inhomogeneous guided wave structures using rectangular or
cylindrical structures [2]. Another approach makes the microstrip with multi-
layers dielectric equal to the common one simplifying the boundary conditions
using optical theory [3]. In [4] an analysis of frequency dependent propagation
characteristic of microstrip lines anisotropic substrate and overlay that uses the
Galerkin’s procedure given a good agreement with the results, but it only
considers just one layer in the substrate and one layer in the superstrate. A full-
wave two dimensional Finite-Difference-Time-Domain method in cylindrical
coordinate system is presented in [5], this method proved to be efficient and
economical in both CPU time, temporary storage requirement and it can also
be used to study the cylindrical optical fiber.
There is also a patent of a method to analyze the properties of cylindrical
transmission lines based on the use of green’s functions.
Chapter 1: Introduction
3 _______________________________________________________________________
1.4. Justification of the Project
Cylindrical microstrip lines have been gaining more attention lately because of
the need for new kinds of antennas and/or devices which can be mounted in
curved surfaces. That is why a fast and accurate analysis is required not only to
obtain the intrinsic characteristics, but also to determine how the utilization of
several dielectric layers affects them.
This kind of analysis can be achieved under the application of the Discrete
Mode Matching (DMM) method, which is well suited to the analysis of
multilayered structures, since the fields must be only sampled at the interfaces
between the dielectric layers. The analytical solution is obtained with the
Green's functions using a full-wave equivalent circuit.
Chapter 2
Theory
2.1. Discrete Mode Matching
2.1.1. Cylindrical Microstrip Lines
Basically there are two kinds of cylindrical microstrip lines; the outside
cylindrical microstrip line and the inside cylindrical microstrip line [6], as it is
shown in Figure 1. These transmission lines have different response; because
of its special configuration. On the other hand, since the outside cylindrical
microstrip line has a more familiar configuration; it was chosen to be the basic
model for the analysis in this thesis work; although the method of analysis can
be applied in both cases indistinctly.
Chapter 2: Theory
5 _______________________________________________________________________
Figure 1: (a) Outside cylindrical microstrip line. (b) Inside cylindrical microstrip line
2.1.2. Wave Equation in Cylindrical Coordinates
Considering an infinite long transmission line in z-direction, the propagation
with zjk ze and assuming time harmonic variations, a full wave solution is
expected as a result of the wave equation within every source-free layer
normalized by 0k [1, 7].
2
2 , , 0d z
(2.1)
Where represents each of the components zE or zH
2d r r zk
r : is the relative permeability
r : is the relative permittivity
zk : is the propagation constant along the z-direction
The solution of the wave equation can be written as the modal expansion in the
-direction.
1, ( )2
i ji
ie
(2.2)
Where the tilde indicates that, the field components are in the spectral domain.
In order to apply the Discrete Mode Matching formulation, N terms have to be
Chapter 2: Theory
6 _______________________________________________________________________
taken in (2.2), which correspond to the number of e-lines used to discretize the
whole cross section [1], see Figure 2.
For a multilayered structure, the electromagnetic fields within every layer “k”
in the spectral domain are given by:
( )k k
ik k i k iA J k B Y k (2.3)
Where ( )iJ x and ( )iY x are the Bessel functions of first and second kind
respectively [1].
The modal expansion, in j -direction, is carried out using the next equation [8].
2( )
0( , ) iz jj k zi z e e dzd
(2.4)
2.1.3. Tangential Field Components
The other field components which are tangential to the dielectric interfaces are
given in spatial domain by [8]:
2
2
2 20 0
1
1
rz
r rz
r
jz
zj
z
E EH H
(2.5)
2.1.4. Discretization
There are three basic rules to perform the discretization in order to use the
Discrete Mode Matching method.
The discretization starts at 0.25( ) from the edges of the microstrip line,
where “ ” is the angular distance between discretization lines of the same
kind.
The first discretization point from any of the edges of the microstrip line is
designated to e-lines.
Chapter 2: Theory
7 _______________________________________________________________________
The e-lines and h-lines are related to the transformation matrices which will be
explained later on.
The next figure shows, a discretization example following the guidelines
described before.
-10 -8 -6 -4 -2 0 2 44
6
8
10
12
14
16
18
X-axis (mm)
Y-a
xis
(mm
)
Discretization
e-linesh-linesmetallization
0.2 5( )j0.5( )j
-15 -10 -5 0 5 10 15-15
-10
-5
0
5
10
15
X-axis (mm)
Y-a
xis
(mm
)
Discretization
e-linesh-linesmetallization
0.5
0.25
Figure 2: Discretization of a cylindrical microstrip line
In order to perform the discretization, some designations have to be made in
the limits of a given layer. The next figure depicts the designations of the
distance in - direction for each layer.[8]
Figure 3: Stratified dielectric layer
2.1.5. Matrix Formulations
The zE and zH matrices containing the information of the fields (z-direction)
in the spatial domain are given by the pair of equation in (2.6), the
transformation matrices eT and hT are found by the set of equations in (2.7)
[1].
Chapter 2: Theory
8 _______________________________________________________________________
zz e
zz h
E T E
H T H (2.6)
,
,
h
e
h jih h
e jie e
i e
i e
T
T (2.7)
Where e and h are the angles of the discretization lines (e-lines or h-lines)
according to Figure 2.
These transformation matrices will be used to transform the fields and the
Green’s functions in the spectral domain back to the spatial domain in which it
is needed to apply the boundary conditions later on.
In this case, when transforming the dyadic Green matrix to the spatial domain,
the transformation process is given by the next equation.
z z
z zz z zz
1h h
1e e
G G T 0 G G T 0G G 0 T G G 0 T
(2.8)
2.1.6. Hybrid Matrix
The Hybrid Matrix kK , using different intrinsic characteristics of the layers
( r , r , physical dimensions), gives information about the relationship
between the fields in both sides of every single layer; so, it is possible to track
down the evolution of the fields through the layers. There is one kK hybrid
matrix per layer which is composed by submatrices [8],
kk
kk k
V ZK
Y B (2.9)
where the submatrices: kV , kZ , kY and kB are 2x2 matrices given by the next
set of equations.
2
2z
kk
k k
νr ν r q
V0 q
(2.10)
Chapter 2: Theory
9 _______________________________________________________________________
2 2 2
22r r z z
kr z k
k k k
k k
s ν p νpZ
νp p (2.11)
2
2 2 22z
kr z r r z k
k k
k k k
p νpY
νp s ν p (2.12)
22kz k
k k
ν ν
q 0B
ν r q r (2.13)
Where the recurrence relations for cross-product of Bessel functions can be
found in [9].
Now that hybrid matrices are known in each layer, the equivalent hybrid matrix
is obtained by a multiplication of each of them as shown in equation (2.14).
1
n
eq kk
eq eqeq
eq eq
K K
V ZK
Y B
(2.14)
Taking into account both the influence of the external medium and the inner
ground cylinder, the correspondent admittance matrices are found using the
following equations [10].
21
1
n zvnn
n n n z n
k kk k
I νuYν y
(2.15)
2
2 2 212
zn rn rn n n
n
kk
y ν u (2.16)
1'(2) (2)1 1n n n n nk k
ν νu H H (2.17)
Chapter 2: Theory
10 _______________________________________________________________________
2.2. Full-Wave Equivalent Circuit
The Full-Wave equivalent circuit is a special representation of layered structure
including the metallizations and dielectric layers of the microstrip line.
Because of DMM requires an evaluation of the fields just next to the interfaces
of each given layer, the model of the equivalent circuit relates current densities
and fields at those interfaces. The next figures show the full-wave equivalent
circuit of one-layer microstrip line.
eqK mE
mHmH
mJ (0)Y
0H
-5
0
5
x 10-3
0.006 0.008 0.01 0.012 0.014 0.016
X (m
)
Y (m)
Microstrip Line
1r 2r
Figure 4: Full-wave Equivalent Circuit model
The grounded metallization is represented with a short circuit on the left hand
side of the diagram, the substrate is represented by its equivalent hybrid matrix,
the microstrip metallization is represented by a current source and the
surrounding medium is represented by an admittance element. Figure 5 shows
a detailed diagram of a multilayered microstrip line.
0E
0H 1H
1mE
• • •
• • •
1mH
1K mK mE1mK
mHmH
mJ
1mE
1mH
• • •
• • •
1nK
2nH
1nE
nE
1nH
nH
nY
uK
0K
mE
mHmH
mJ (0)Y( )uY
( )a
( )b
Figure 5: Full wave equivalent circuit, with only one current source.
(a) Expanded Circuit, (b) Simplified Circuit.
Chapter 2: Theory
11 _______________________________________________________________________
The admittance matrices ( )uY and (0)Y are determined using the next
equations. Regarding that there is a metallic cylinder in the interior of the
structure [11], then:
( ) 1uu uY Z V (2.18)
where uZ and uV represent the components of the hybrid matrix uK which is
the equivalent hybrid matrix of the substrate layers.
And considering that there is no an exterior metallic cladding surrounding the
structure, (0)Y can be represented as [11]:
1(0)0 0 0 0n nY Y B Y V Z Y
(2.19)
where the elements with sub-index “0” are the components of the hybrid
matrix 0K , which is the equivalent hybrid matrix of the superstrate layers; and
nY is the admittance matrix of the last layer that extends to infinity, generally it
is considered the layer of air (surrounding medium).
According to Figure 5b, the magnetic field in spectral domain can be found
using:
( )
(0)
um m
m m
H Y EH Y E
(2.20)
2.2.1. Propagation Constant
Using a simple circuit analysis, the Green’s functions can be derived to obtain
the relationship between the electric field and current density at the microstrip
interface.
0z
z zz zz
j
G G J E
JG G E (2.21)
Where G is the dyadic Green’s function in the spectral domain, and J and E
represent the electric surface current densities and the electric field at the
interfaces respectively [1].
Using equation(2.8), the last equation in the spatial domain is given by:
Chapter 2: Theory
12 _______________________________________________________________________
0z
z zz z z
j
G G J EG G J E
(2.22)
Regarding that tangential component of the electric field must vanish in the
metallization, two systems equations are obtained since the boundary
conditions are complementary [1]:
and/or red red red red G J 0 Y E 0 (2.23)
The only value of zk , which fulfills either of these equations, is the
propagation constant of the line; the dispersion can be obtained when
calculating it for different frequencies.
2.2.2. Fields Analysis
From the definition of a point source considered in [11], the relationship of the
electric field and the current density in the microstrip interface is given by:
( ' ' )' '
'
1 ˆ( ) ( ) zj k zn z nk z k
k
k k e
ν IE G J (2.24)
Expanding the previous equation:
( ' ' )
0( ' ' )
' '
ˆ
ˆ
z
z
j k zzk n
j k zz zzkzn k z
e Jj
e J
ν I
ν I
G GEG GE
(2.25)
Considering a single microstrip line composed of only one layer in the
substrate, the magnetic field in spectral domain is related to the electric field
also in the spectral domain by the next equation [11].
1
01
n n n
zn n nn
n n zn
j
H Y E
H EY
H E
(2.26)
Chapter 2: Theory
13 _______________________________________________________________________
Where: nY is the admittance matrix of the most external layer (surrounding
medium), and generally considered as air (cf. Equation (2.15)).
The relationship between the fields in one given interface and the fields in the
next interface within either the substrate or the superstrate is given by the
equivalent hybrid matrix between those two interfaces as the next equations
present [11]:
1
1
k k k k
k k k k
E V Z EH Y B H
(2.27)
0
k kk
zk
zkk
k k
j
EE
E
HH
H
(2.28)
Regarding that and z components are known parameters, the components of
both electric field and magnetic field in - direction can be found from the z-
components of both fields as indicated in the next equations [11].
20 0
11
1
z rkk k zk
k zkrk z
jk
k jk
I νE EH Hν I
(2.29)
In order to perform the derivative of the fields in the spectral domain, the
general solution for the wave equation also in spectral domain is applied as
follows.
1 11 k k kk
k k kk
ν ν
ν ν
J Y AΨJ Y BΨ
(2.30)
1 11 k k kkk
k k kk
k
ν ν
ν ν
J Y AΨJ Y BΨ
(2.31)
Chapter 2: Theory
14 _______________________________________________________________________
1 1
k k k
k k k
k
k
C C
C C (2.32)
Where, kΨ represents any of the electromagnetic field in z-direction within
any given interface; and kC represents the Bessel function of first or second
kind of order .
Equations (2.30) and (2.31) form a complete set of linear equations, which
guaranties a unique solution.
2.2.3. Concept of Profile
Given a multilayered microstrip line, the profile is obtained when the electric
permittivity is plotted for every layer. Considering that the layers are in a
certain distance from center of the cylindrical structure, the profile can also be
obtained when plotting the electric permittivity vs. the distance of each layer.
Taking into account that each layer is formed by a homogeneous medium,
when a great number of layers are considered, an approximation to a
continuous profile can be achieved.
In all the analyzed cases, the grounded cylinder was considered to be on the
left of the chart and the microstrip metallization is always in the center.
The next figure shows the concept of profile.
8 9 10 11 12 13 14 15 160
0.01
0.02
0.03
0.04
0.05
0.06
0.07
0.08
0.09
0.1
10
8
6
4
2
1 2 3 4 5 1 2 3 4 5
Layer
Elec
tric
Perm
ittiv
ity
Dielectric Profile
Figure 6: Dielectric profile of a multilayered microstrip line
Chapter 3
Software Implementation
3.1. Method
The method of analysis is composed mainly of three steps where each of them
depends on the previous ones.
Dispersion Analysis
Currents Analysis
Fields Analysis
3.1.1. Basic Model
The basic microstrip line model taken for all the analysis has the next physical
dimensions.
Separation between the metallization: 0.762 mm. Ratio between the grounded cylinder radius and the microstrip
metallization radius: 0.935. Ratio between width of the microstrip interface and the separation of
the metallization: 5.37. The frequency range of the analysis is 20 GHz.
Chapter 3: Software Implementation
16 _______________________________________________________________________
3.1.2. Dispersion Analysis
a) Normalization
The first action to take is the normalization of the physical dimensions of the
microstrip in order to avoid handling big numbers in every single analysis. So,
the wave number is chosen to be the normalization factor.
0k (3.1)
0k k k (3.2)
0z zk k k (3.3)
Where refers to cylindrical coordinates, zk is the normalized propagation
constant and k is the wave number in -direction and it is given by [8, 12]:
2r r zk k (3.4)
The sign of k in the most external layer has to be chosen
considering Im 0k according to the Sommerfeld’s radiation condition [8].
b) Discretization and Transformation Matrices
The discretization process was carried out following the concepts explained in
the theory section (cf. Figure 2), the number of discretization lines on the strip
was considered from two (quicker analysis), up to ten for a detailed analysis
and electromagnetic fields analysis.
-10 -5 0 5 10
-10
-5
0
5
10
X-axis (mm)
Y-a
xis
(mm
)
Discretization
e-linesh-linesmetallization
(a)
-10 -5 0 5 10
-10
-5
0
5
10
Discretization
X-axis (mm)
Y-a
xis
(mm
)
e-linesh-linesmetallization
(b) Figure 7: a) Discretization considering N=2, b) Discretization considering N=10, N:
number of e-lines on the microstrip.
Chapter 3: Software Implementation
17 _______________________________________________________________________
The next pair of equations shows a small example of the transformation
matrices building process.
1 max 1min 1
2 max 2min 2
max max
( )( )
( )( )
(2 1) (2 1)
e eei
e eei
j jj
j jje
e e e
T e e e
(3.5)
1 max 1min 1
2 max 2min 2
max max
( )( )
( )( )
(2 1) (2 1)
h hhi
h hhi
j jj
j jjh
e e e
T e e e
(3.6)
c) Dyadic Green’s Matrix
To obtain the dyadic Green’s matrix, first the intrinsic properties of each layer
like r , r , k , k and 1k are calculated in both the substrate and the
superstrate. The hybrid matrices for each layer are calculated using equations
(2.10) - (2.13), after that the equivalent hybrid matrix is determined using
equation (2.14). Since, the transmission line is a cylindrical microstrip line
composed of a grounded cylinder in the interior, the equivalent circuit for the
first layer next to such cylinder is consider short-circuited as in Figure 5, the
equivalent admittance matrix for the substrate ( )uY is found using equation
(2.18), and the equivalent admittance matrix for the superstrate (0)Y is found
with equations (2.15) and (2.19).
Finally the Green function matrix is obtained taking the inverse of the
equivalent admittance matrix of the model. Regarding those calculations are
carried out just for one point in the spectrum, the dyadic Green’s matrix is
assembled joining every point of the spectrum in one bigger matrix. The next
equation shows the distribution when assembling the dyadic Green matrix
according with [11].
Chapter 3: Software Implementation
18 _______________________________________________________________________
( ) ( )
( ) ( )
( ) ( )
( ) ( )
( ) ( )
( ) ( )
0 0 0 0
0 0 0 0
0 0 0 0
0 0 0 0
0 0 0 0
0 0 0 0
z
i iz
z
z zz
i iz zz
z zz
G G
G G
G GG
G G
G G
G G
(3.7)
d) Spatial Domain Transformation and Reduced Dyadic
Green Matrix
Once the dyadic Green’s matrix is obtained, it has to be transformed into de
spatial domain using equations (2.7); so, in conjunction with the currents
density distribution and the boundary conditions, a new reduced G matrix can
be obtained. The boundary conditions state that the tangential electric field
should vanish on the metallization. Considering the currents are normalized to
one and using equation (2.22), the reduced form of the dyadic Green matrix
can be acquired.
0
red redz
red redz zz zz
j
E JG G 0E JG G 0
(3.8)
Expanding the last equation, a small example of the application of the previous
concept can be exposed in equation (3.9).
Chapter 3: Software Implementation
19 _______________________________________________________________________
,11 ,12 ,13 ,11 ,12 ,13
,21 ,22 ,23 ,21 ,22 ,23
,31 ,32 ,33 ,31 ,32 ,33
,11 ,12 ,13 ,11 ,12 ,13
,21 ,22 ,23 ,21 ,22 ,23
,31 ,32 ,33
z z z
z z z
z z z
z z z zz zz zz
z z z zz zz zz
zz z z
G G G G G GG G G G G G
G G G G G G
G G G G G G
G G G G G G
GG G G
1
2
1
,31 ,32 ,33
001 0
01 01 0
z
z zz zz
EE
E
G G
(3.9)
Taking the elements of the dyadic Green matrix related to positions of the
currents on the microstrip, the reduced form is obtained.
,33 ,32 ,33
,23 ,22 ,23
,33 ,32 ,33
z z
z zz zz
z zz zz
G G G
G G GG G G
redG (3.10)
e) Determining the Propagation Constant
In order to find a solution to equation (3.8), the determinant of redG must be
zero as described in theory section (equation (2.23) ).
The Green’s function depends, among some other variables, on the propagation
constant; so, evaluating the determinant of redG while varying the propagation
constant, a solution to equation (3.8) can be found when that determinant is
zero, cf. equation (3.11). The propagation constant should vary from a value of
one until a solution is found. When a solution is obtained, the propagation
constant represents the first mode of propagation.
det 0zkredG (3.11)
Considering that the discretization points are a finite number, a good way to
simulate an infinitesimal discretization is giving a picture of the propagation
constant versus the inverse of the number of discretization points in the
metallization. Then, using a curve fitting method is easy to extrapolate the
value of the propagation constant when an infinite discretization is assumed.
Chapter 3: Software Implementation
20 _______________________________________________________________________
0 0.1 0.2 0.3 0.4 0.51.6
1.605
1.61
1.615
1.62
1.625
1.63
1.635Extrapolation of the Propagation Constant
1/(Num. e-Lines on the microstrip)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: k z
Figure 8: Extrapolation of the propagation constant when infinite number of e-lines
on the microstrip
3.1.3. Currents Analysis
Although the reduced form of dyadic Green’s matrix and the value of the
electric field are known in the microstrip interface, the current density in
equation (3.8) can not be determined because of the determinant of redG is zero
and there is no inverse for such matrix. To solve equation (3.8), the eigenvalues
and eigenvectors of redG are needed. According to the next equation, some
properties of the eigenvalues and eigenvectors are shown.
Given a matrix A:
Av v (3.12)
Where, v is the eigenvector and is the eigenvalues.
Taking the smallest of the eigenvalues ( 0) and its correspondent
eigenvector, the multiplication of the second term in equation (3.12) will tend
to a null vector, so that same concept can be applied to equation (3.8) to find a
solution. The next equations explain this case.
0 min min
00
red redz
red redzz zz
JG Gj v
JG G
(3.13)
0min min
0
red redz
red redzz zz
j JG Gv
j JG G
(3.14)
Chapter 3: Software Implementation
21 _______________________________________________________________________
The previous equation is possible if and only if :
0min
0 z
j Jv
j J
(3.15)
Finally, the currents can be determined from the eigenvector of the reduced
dyadic Green matrix as it is presented in the next equation.
min0
1
z
Jv
J j
(3.16)
3.1.4. Field Analysis
a) Fields in the Metallization Interface
Now that the current densities on the microstrip metallization are determined,
they have to be transformed to the spectral domain in order to use them and
then to calculate both the electric and magnetic field in the interface where the
metallization lies. Equation (2.4) provides the method to transform the current
densities to spectral domain.
Using equation (2.25), the electric field in spectral domain is obtained for each
set of current densities ( and )zJ J . The total electric field is the addition of
the fields generated by each current. To find the magnetic field in spectral
domain, equation (2.26) is used.
b) Fields in the Substrate
To calculate the fields in other interfaces within the substrate, equation (2.27)
is needed. Once the electric field is found, equation (2.20) is used to find the
magnetic field in that interface as well. One has to notice that in order to use
equation (2.20), the admittance matrix ( )uY has to be recalculated, computing
again a new equivalent hybrid matrix considering all the layers from that very
layer to the most inner layer. This recalculation of a new ( )uY has to be done
Chapter 3: Software Implementation
22 _______________________________________________________________________
every time the fields in the next interface are required to be found. To
determine both the electric and magnetic field in - direction, equation (2.29)
is used.
To transform the fields into the spatial domain, transformation matrices are
used which are described by the next set of equations and equations (2.28),
(2.7).
z z
e
h
e
E T EE T E
E T E
(3.17)
z z
h
e
h
H T HH T H
H T H
(3.18)
The next figure shows the sequence which calculates the fields for inner
interfaces within the substrate.
• • •
• • •
1mK
1mH
mE ( )oY0E
mHmH
mJ
(0)Y
mK
2mH
1mE
1K
1H
( 1)mY ( 2)mY (1)Y ( 1) ( )m oY Y
2mE
1E
( ) ( )m uY Y
1
2
3
45
6
0H
( )um mH Y E ( 1)
1 1m
m mH Y E
Figure 9: Sequence to calculate the fields in the substrate.
1. Find the electric field in the microstrip metallization.
2. Calculate the required equivalent admittance element.
3. Calculate the magnetic field in the microstrip metallization.
4. Use the hybrid equivalent matrix between the actual interface and the
next one to find the next electric field.
5. Recalculate the equivalent admittance element using the equivalent
circuit.
6. Use the recalculated equivalent admittance element and the electric
field to obtain the magnetic field.
Chapter 3: Software Implementation
23 _______________________________________________________________________
c) Fields in the Superstrate
To calculate the fields in other interfaces within the superstrate, equation (2.27)
has to change a bit. Taking the inverse of the equivalent hybrid matrix and
place it in the second term of the equation, it is possible to calculate the fields
for a certain layer using the fields in the previous interface:
1
1
1
k k k k
k k k k
E V Z EH Y B H
(3.19)
Once the electric field is found, equation (2.26) is needed to find the magnetic
field in that interface as well. In order to use equation (2.20), the admittance
matrix (0)Y has to be recalculated, a new equivalent hybrid matrix considering
all the layers from that very layer to the most outer layer ( nY ). This
recalculation of a new (0)Y has to be carried out every time the fields in the
next interface are required to be found. To find both the electric and magnetic
field in - direction, equation (2.29) is used.
To transform the fields into the spatial domain, transformation matrices are
used as shown previously in equations (3.17) and (3.18), besides equations
(2.7) and (2.28).
The next figure shows the sequence to calculate the fields for outer interfaces
in the superstrate.
• • •
• • •
2nK
2nH
1nE
nE
1nH
nH
nYmE
mH mH
mJ( )uY 1nK
1nH
2nE
1mK
1mH
( )nnY Y ( 1)nY ( 2)nY ( 2)mY ( 1) ( )m oY Y
1nE
1mE
( ) ( )m uY Y
( )om mH Y E ( 2)
1 1m
m mH Y E
Figure 10: Sequence to calculate the fields in the superstrate.
1. Find the electric field in the microstrip metallization.
2. Calculate the required equivalent admittance element.
3. Calculate the magnetic field in the microstrip metallization.
Chapter 3: Software Implementation
24 _______________________________________________________________________
4. Use the hybrid equivalent matrix between the actual interface and the
next one to find the next electric field.
5. Recalculate the equivalent admittance element using the equivalent
circuit.
6. Use the recalculated equivalent admittance element and the electric
field to obtain the magnetic field.
Regarding equations (3.17) and (3.18), the e-lines discretization points (cf.
Figure 2); only zE , E and H are known values in these points and in view
of the h-lines discretization points (cf. Figure 2); only zH , H and E are the
known parameters. In order to have a complete set of components of both the
electric field and the magnetic field, an interpolation is performed considering
two adjacent components.
The next figure shows how the interpolation is carried out.
zE
E
E
zH
H
H
-10 -8 -6 -4 -2 0 2 4 6 8 100
5
10
15
X-axis (mm)
Y-a
xis
(mm
)
Interpolation
e-linesh-linesmetallization
Figure 11: Interpolation of both the electric and magnetic field depending on the discrete
angles
Considering just the electric field represented by blue vectors; as explained
before, the interpolated values are given by red vectors, and in the case of the
magnetic field, the red vectors represent the calculated values and the blue
vectors the interpolated values.
After the interpolation, every single discretization point counts with a full set
of vectors for each field. The vectors in and direction are used to
determine the poynting vector in each discretization point respectively.
Chapter 3: Software Implementation
25 _______________________________________________________________________
3.1.5. Base of Comparison
The dispersion produced by a one-layer microstrip line is taken as the base of
comparison which is represented by the line with symbols. The improvement in
the reduction of the dispersion is considered as the percentage reduction after
18GHz.
The next figure shows how the improvement is determined.
5 10 15 20
2.08
2.1
2.12
2.14
2.16
2.18
2.2
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
Figure 12: Determination of the improvement in the dispersion.
3.1.6. Validation of the Results
The dispersion and field analysis from DMM will be compared with the
commercial software Ansoft HFSS to validate the results.
The usual method of HFSS to handle curved surface deliberates a deviation
between the surface and the approximation. The next figure shows this
deviation from the perfect circular cylinder due to FEM discretization (HFSS
approximation).
Figure 13: Deviation from the perfect circular cylinder
Chapter 3: Software Implementation
26 _______________________________________________________________________
a) Parameters of the validation
HFSS deviation of 0.1mm and 0.01mm.
Three different microstrip lines composed of 4 layers in the substrate
and no special superstrate.
The surrounding medium is air.
The next table shows the dielectric constants for each layer of the analyzed
microstrip lines and Figure 14 presents the configuration of such layers.
Table 1: Analyzed Microstrip lines for validation.
-15 -10 -5 0 5 10 15-15
-10
-5
0
5
10
15
X-Axis
Y-A
xis
Cylindrical Microstrip Line
Figure 14: Substrate and superstrate configuration of the microstrip line used for the
validation
Dielectric Constant
Layer1 Layer2 Layer3 Layer4
Case 1 4.50 2.94 2.70 2.55
Case 2 10.00 6.00 6.00 4.50
Case 3 10.00 6.15 6.00 6.00
Chapter 4
Results
4.1. Dispersion Analysis
The next figure represents one of the simplest cases; when the microstrip line is
composed of just one layer in the substrate and without any special profile in the
superstrate except the surrounding medium which is considered to be air.
As it can be observed in blue; the dispersion, of the microstrip lines with high values of
electric permittivity, increases in a higher rate than those microstrip lines with low
values of electric permittivity as seen in the red case.
11 11.2 11.4 11.6 11.8 12 12.2 12.4
2
4
6
8
10
12
14
16
18
Distance (Ro Direction in mm.)
Elec
tric
Per
mitt
ivity
Electric Permittivity Profile: Substrate
5 10 15 20
2.6
2.8
3
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
5 10 15 201.48
1.5
1.52
1.54
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Er: 10Er: 2.54
Figure 15: a) Electric permittivity profiles of one-layer microstrip lines, b) Dispersion of
the transmission lines.
Chapter 4: Results
28 _______________________________________________________________________
The next step in complexity is the case when different kinds of profiles are used only in
the substrate. Figure 16 shows the dispersion of a microstrip line in such case and just
air as surrounding medium. Taking into account this configuration, the next figure
presents the substrate profiles which give the best results. The reduction of the
dispersion reaches almost 7.6% in 18GHz.
As it can be seen, the dispersion is very sensitive to any variation in the substrate
profile.
11 11.5 120
2
4
6
8
10
12
Distance (Ro Direction in mm.)
Elec
tric
Per
mitt
ivity
Electric Permittivity Profile: Substrate
0 0.5 1 1.5 2
x 1010
1.4
1.6
1.8
2
2.2
2.4
2.6
2.8
3
Frequency (GHz)N
orm
aliz
ed P
ropa
gatio
n C
onst
ant:
Kz
Dispersion
7.6%
Figure 16: Dispersion changes because of different profiles of the electric permittivity in
the substrate. a) Electric permittivity profiles, b) Dispersion of the transmission lines.
Figure 17 shows the dispersion for different profiles of the superstrate maintaining
constant the one-layer profile in the substrate ( 10r ) in all cases.
As it can be observed, there is a reduction of the dispersion for every profile, with
almost 37% at best when the superstrate has a constant profile of the same width as the
substrate. Although there are big variations among the profiles in the superstrate, the
variations among the dispersion curves are not extensive, which indicates that the
dispersion is not very sensitive to changes of the superstrate profiles.
11 11.2 11.4 11.6 11.8 12 12.2 12.4
2
4
6
8
10
12
14
Distance (Ro Direction in mm.)
Ele
ctric
Per
mitt
ivity
Electric Permittivity Profile
11 11.2 11.4 11.6 11.8 12 12.2 12.4
2
4
6
8
10
12
14
Distance (Ro Direction in mm.)
Ele
ctric
Per
mitt
ivity
Electric Permittivity Profile
0.5 1 1.5 2
x 1010
2.95
3
3.05
3.1
3.15
3.2
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
36.9%
Figure 17: Dispersion changes due to different profiles of the electric permittivity in the
superstrate. a) and b) Electric permittivity profiles, b) Dispersion of the transmission lines.
Chapter 4: Results
29 _______________________________________________________________________
Figure 18 presents a configuration of the profiles where the maximum values of the
electric permittivity are the same in both the substrate and the superstrate. It also shows
the improvements of the dispersion for different profiles in the superstrate regarding the
substrate profile which gives the best performance among others of this same
configuration.
11 11.5 121
1.5
2
2.5
3
Distance (Ro Direction in mm.)
Elec
tric
Perm
itivity
Electric Permitivity Prof ile
11 11.5 121
1.5
2
2.5
3
Distance (Ro Direction in mm.)
Elec
tric
Perm
itivity
Electric Permitivity Prof ile
0.5 1 1.5 2
x 1010
1.16
1.165
1.17
1.175
1.18
1.185
1.19
1.195
1.2
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
49.4%
Figure 18: Dispersion improvements because of different profiles of the electric
permittivity in both the substrate and the superstrate. a) and b) Electric permittivity profiles, b) Dispersion of the transmission lines.
Taking into account a maximum value of the electric permittivity in the substrate
greater than the maximum value in the superstrate as Figure 19 shows, there is an
improvement of the reduction of the dispersion about 29.5% after 18 GHz when the
superstrate width is the same as the substrate width (cf. Figure 19b).
5 10 15 202.2
2.22
2.24
2.26
2.28
2.3
2.32
2.34
2.36
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
29.487%
0 5 10 15 202.15
2.2
2.25
2.3
2.35
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
5.0438%
11 11.5 121
2
3
4
5
6
7
8
9
10
Distance (Ro Direction in mm.)
Ele
ctric
Per
miti
vity
Electric Permitivity Profile of the Line: Cladding Width Reduced
11 11.5 121
2
3
4
5
6
7
8
9
10
Distance (Ro Direction in mm.)
Ele
ctric
Per
miti
vity
Electric Permitivity Profile
Figure 19: Dispersion improvements because of different profiles of the electric
permittivity in both the substrate and the superstrate. a) Electric permittivity profiles, b) and d) Dispersion of the transmission lines, c) Electric permittivity profiles with reduction
of the superstrate width.
Chapter 4: Results
30 _______________________________________________________________________
Reducing the width of the superstrate and maintaining the same profile in the substrate
(cf. Figure 19c), an improvement of 5% is obtained (cf. Figure 19d).
Considering the maximum value of the electric permittivity of the superstrate greater
than the maximum value of r in the substrate as Figure 20 shows, there is an
improvement of the dispersion about 46.7% at best; even if there is a reduction of the
superstrate width, it is possible to get an improvement of the dispersion around 17.1%.
0.5 1 1.5 2x 1010
2
2.02
2.04
2.06
2.08
2.1
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
14.5292%17.1207%
5 10 15
2.05
2.1
2.15
2.2
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
46.7026%42.3195%
11 11.5 12
2
4
6
8
10
Distance (Ro Direction in mm.)
Ele
ctric
Per
miti
vity
Electric Permitivity Profile
11 11.5 121
2
3
4
5
6
7
8
9
10
Number of Layers
Ele
ctric
Per
miti
vity
Electric Permitivity Profile of the line
Figure 20: Dispersion improvements because of different profiles of the electric
permittivity in both the substrate and the superstrate. a) Electric permittivity profiles, b) and d) Dispersion of the transmission lines, c) Electric permittivity profiles with reduction
of the superstrate width.
The next figures consider that both substrate and superstrate model one continuous
profile. It can be observed that when r decreases in distance ( direction) following
the different profiles (see Figure 21a,c), the best improvement of the dispersion reaches
31.9% at best and only 5% at worst; but, in the opposite way, when r increases in
distance the dispersion improves in 24.8% at worst, obtaining even better results at best.
Chapter 4: Results
31 _______________________________________________________________________
0 5 10 15 202.4
2.5
2.6
2.7
2.8
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
0 5 10 15 201.17
1.175
1.18
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
11 11.5 12
2
4
6
8
10
Distance (Ro Direccion in mm.)
Elec
tric
Per
miti
vity
Electric Permitivity Profile
0 5 10 15 202.95
3
3.05
3.1
3.15
3.2
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
0 5 10 15 201.51
1.52
1.53
1.54
1.55
1.56
Nor
mal
ized
Pro
paga
tion
Con
stan
t: K
z
Dispersion
0 5 10 15 201.51
1.52
1.53
1.54
1.55
1.56
11 11.5 12
2
4
6
8
10
Distance (Ro Direccion in mm.)
Elec
tric
Per
miti
vity
Electric Permitivity Profile
Figure 21: Dispersion improvements because of considering one continuous profile of the
electric permittivity for both the substrate and the superstrate in different configurations. a) and c) Electric permittivity profiles, b) and d) Dispersion of the transmission lines.
For the validation of these results, Figure 22 shows the dispersion of three different
microstrips, described in the previous section, and the results obtained from HFSS
taking into account its deviation in the approximation for curved surfaces.
As it can be observed, DMM gives very accurate results and HFSS results converge into
DMM’s when its deviation is reduced.
0 5 10 15 201.5
1.6
1.7
1.8
1.9
2
2.1
2.2
2.3
2.4
2.5Validation
Frequency
Nor
mal
ized
Pro
paga
tion
Con
stan
t
DMMHFSS (dev=0.01mm)HFSS (dev=0.1mm)
Case 1
Case 3
Case 2
Figure 22: Validation of the results, comparative between DMM and HFSS results in three
different cases.
Chapter 4: Results
32 _______________________________________________________________________
4.2. Field Analysis
Figure 23 shows the analysis of the electric field of a microstrip line which substrate
and superstrate are air, using DMM and HFSS. The physical dimensions are the same as
described as the base model of analysis and 6 e-lines were used to for this analysis.
The electric field is more concentrated between the two metallization and the highest
values of the Electric field are just on the edges of the microstrip. The results are very
similar to one another.
-0.2 -0.1 0 0.1 0.2
0.4
0.45
0.5
0.55
Electric Field
X (Normalized)
Y (N
orm
aliz
ed)
Metallizations
-0.2 -0.1 0 0.1 0.2
0.35
0.4
0.45
0.5
0.55
0.6
0.65
0.7
X (Normalized)
Y (N
orm
aliz
ed)
Electric Field (Magnitude)
0.5
1
1.5
2
x 104
Figure 23: Electric Field Distribution of a microstrip line with air as both substrate and
superstrate, a) Results obtained from DMM, b) Results obtained from HFSS, c) Normalized Magnitude of the electric field obtained from DMM, d) Magnitude of the electric field
obtained from HFSS.
Figure 24 shows the analysis of the magnetic field and the current density distribution
on the microstrip metallization.
The magnetic field is more concentrated between the two metallization as well. It can be
seen from Figure 24b that the highest values, of the current density zJ , are on the edges
of the microstrip which matches the theory. Figure 24c shows the current density
distribution does not vanish on the edges of the microstrip and it is because of the
number of discretization points and the distribution of the discretization h-lines which
do not coincide with the edges of the microstrip and that gives mostly this impression.
Chapter 4: Results
33 _______________________________________________________________________
-0.2 -0.1 0 0.1 0.2
0.4
0.45
0.5
0.55
Magnetic Field
X (Normalized)
Y (N
orm
aliz
ed)
Metallizations
1 2 3 4 5 61.4
1.5
1.6
1.7
1.8
1.9
2
2.1Current Density: Jz (Z-Direction)
Discretization Points in the Metallization
Mag
nitu
de
1 2 3 4 5-2
-1.5
-1
-0.5
0
0.5
1
1.5
2x 10
-6 Current Density: Jphi (Phi-Direction)
Discretization Points in the Metallization
Mag
nitu
de
Figure 24: Magnetic Field Distribution, a) Results obtained from DMM, b) Current Density Distribution in z-direction, c) Current Density Distribution in -direction.
Regarding that both the electric and magnetic field are more concentrated between the
two metallization, there will be more power flow in that place. Figure 25 shows the real
power flow of this particular microstrip. It can be observed that the real power is mostly
concentrated on the edges and also between the metallizations but in lower values.
-0.2 -0.1 0 0.1 0.2
0.4
0.45
0.5
0.55
X (Normalized)
Y (N
orm
aliz
ed)
Real Power (Poynting Vector)
2
4
6
8
10
x 106
Figure 25: Real power distribution, a) Results obtained from DMM, b) Results obtained
from HFSS.
The electric field distribution changes slightly when there is a profile in the substrate
and/or in the superstrate. The physical dimensions are kept from the basic model, but 10
e-lines were used for the discretization. Figure 26a illustrates this case, the used profile
is shown in Figure 26b and the improvement of the dispersion is shown in Figure 26c.
The electric field maintains the characteristic distribution of the first mode of
propagation.
Chapter 4: Results
34 _______________________________________________________________________
11 11.5 12 12.5
2
4
6
8
10
Distance (Ro Direction in mm.)
Elec
tric
Perm
itivi
ty
Electric Permitivity Profile
5 10 15 202.24
2.26
2.28
2.3
2.32
2.34
2.36
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: Kz
Dispersion
-1.5 -1 -0.5 0 0.5 1 1.5
3.6
3.8
4
4.2
4.4
4.6
4.8
5
5.2
Electric Field
X (Normalized)
Y (N
orm
aliz
ed)
Metallizations
Figure 26: a) Electric field distribution, b) Electric permittivity profile, c) Dispersion
improvement.
The magnetic field also changes slightly when a profile is applied as it is presented in
Figure 27a. The current density ( zJ ) has higher values near the edges of the microstrip
and J can be seen clearly, due to the number of discretization lines, that it vanishes on
the edges of the microstrip line.
-1.5 -1 -0.5 0 0.5 1 1.5
3.6
3.8
4
4.2
4.4
4.6
4.8
5
5.2
Magnetic Field
X (Normalized)
Y (N
orm
aliz
ed)
2 4 6 8 100.1
0.11
0.12
0.13
0.14
0.15
0.16
0.17
Current Density: Jz (Z-Direction)
Discretization Points in the Metallization
Mag
nitu
de
2 4 6 8
-3
-2
-1
0
1
2
3
x 10-4 Current Density: J
phi (Phi-Direction)
Discretization Points in the Metallization
Mag
nitu
de
Figure 27: a) Magnetic field distribution, b) Current Density Distribution in z-direction, c)
Current Density Distribution in -direction.
Figure 28 presents the power flow in the microstrip, demonstrating that the real power is
concentrated mainly between the metallizations, but still there are two peaks just close
to the edges because of the high values of both electric and magnetic field.
Chapter 4: Results
35 _______________________________________________________________________
-1.5 -1 -0.5 0 0.5 1 1.5
3.6
3.8
4
4.2
4.4
4.6
4.8
5
5.2
X (Normalized)
Y (N
orm
aliz
ed)
Real Power (Poynting Vector)
500
1000
1500
2000
2500
3000
3500
-10
13.5 4 4.5 5
-1000
0
1000
2000
3000
4000
Y (Normalized)
Real Power (Poynting Vector)
X (Normalized)
Pow
er (N
orm
aliz
ed)
500
1000
1500
2000
2500
3000
Figure 28: Real power distribution, a) Results obtained from DMM, b) Results obtained
from HFSS.
A comparative chart about the invested time in average per simulation is given by
Figure 29. For these comparative results between HFSS and DMM, the three different
cases, explained in the previous section, were considered. Each case takes into account
different profiles and five points in frequency. (cf. Table 1, Figure 14 and Figure 22).
HFSS was set to use a deviation of 0.01mm, and it was simulated in a Quad Core
microprocessor with 12 gigabytes RAM computer. DMM was performed in single core
Centrino microprocessor 512 megabytes RAM.
In spite of the great and unfair difference between both simulation platforms, DMM is
considerably faster than HFSS.
Invested Time per Simulation
0
5
10
15
20
25
30
35
40
45
Ave
rage
Tim
e (m
inut
es)
HFSSDMM
HFSS 41.7800DMM 0.3667
1
Figure 29: Invested time per simulation (average) using DMM and HFSS to calculate the
propagation constant.
Chapter 5
Discussion
Although this thesis work got a very good agreement of the data and simulations, what
could be done differently is the method of interpolation when determining the
electromagnetic field components. The bilinear and bicubic interpolation method were
considered for this work and even they have not showed a great difference, there might
be a better method to determine those fields’ components.
The propagation constant when infinite number of e-lines is considered on the
microstrip, the extrapolation process was done in the least square sense. Another
extrapolation method can be considered in this part as well.
The analysis of the improvements in the reduction of the dispersion was done using a
reference curve which compares the percentage of the reduction after some frequency
range. Considering that the dispersion analysis gives curves as results, a kind of
normalization based on decibels might be done in order to achieve lines instead those
curves and then to obtain a better figure of merit.
The conclusions in [3] says that the dispersion of microstrip with multi-layers media is
much large than those with single layer media. Which is only true in some given cases
as proved in this thesis work when the dielectric constant of the one-layer microstrip
line has low values. When that kind of microstrip has high values of dielectric constant,
there are profiles which can reduce the dispersion of that transmission line. (cf. Figure
16 - Figure 20).
Chapter 5: Future Work
37 _______________________________________________________________________
Future Work
5.1. Characteristic Impedance
To develop a computer code able to calculate the characteristic impedance
based on DMM method and high integration possibilities with this thesis work.
The complete dyadic Green matrix is composed of nine elements as shown in
equation (5.1). zG should be determined in order to find the characteristic
impedance of cylindrical microstrip lines [6, 11].
z
z
z z zz
G G GG G G G
G G G
(5.1)
The expression for the characteristic impedance is given by [6]:
2
1 12 2
1
sin ( / 2)2
zk zmM M
j jz zk zm
k mc M
zzm
m
V D I e I eZ
b D I
(5.2)
Where:
( , , )b
z zaV G k d (5.3)
Chapter 5: Future Work
38 _______________________________________________________________________
5.2. Analysis of higher propagation modes
To extend the study and the investigation of the dispersion properties in
conformal microstrip lines considering the analysis for higher propagation
modes.
The next figures show some cases.
-2 -1.5 -1 -0.5 0 0.5 1 1.5 2
5.6
5.8
6
6.2
6.4
6.6
6.8
7
7.2
7.4
7.6Electric Field
X (Normalized)
Y (N
orm
aliz
ed)
11 11.2 11.4 11.6 11.8 12 12.2 12.41
2
3
4
5
6
7
8
9
10
11
Distance (Ro Direction in mm.)
Ele
ctric
Per
miti
vity
Electric Permitivity Profile
-2 -1.5 -1 -0.5 0 0.5 1 1.5 25.6
5.8
6
6.2
6.4
6.6
6.8
7
7.2
7.4
Magnetic Field
X (Normalized)
Y (N
orm
aliz
ed)
-2 -1 0 1 2
5.5
6
6.5
7
7.5
X (Normalized)
Y (N
orm
aliz
ed)
Power (Poynting Vector)
0
50
100
150
200
250
Figure 30: Second Propagation Mode, a) Electric Field. b) Dielectric Profile. c) Magnetic
Field. d) Real Power Flow.
Chapter 5: Conclusions
39 _______________________________________________________________________
Conclusions
The investigation of the dispersion properties cylindrical microstrip lines was presented
in this thesis work, giving very good agreements of the data and the literature.
A MATLAB computer code was developed based on the discrete mode matching
method (DMM) to compute the propagation constants. The main parameter for the
analysis was the utilization of different dielectric profiles.
The theoretical model and the program can be modified without much effort to analyze
some more complex structures such as inside cylindrical microstrip line and coupled
lines.
The propagation constant as well as the dispersion are very sensitive to changes in the
substrate, but not when changes occur in the superstrate.
Improvements of more than 49% in the reduction of the dispersion are achieved by
some dielectric profiles.
The higher the number of discretization points, the better the accuracy.
Both electric and magnetic fields can be obtained without too much computational
effort.
Because of discretization method (e-lines and h-lines) and the interpolation, the fields
will suffer a small deviation from the real values.
DMM is considerably faster than HFSS, besides getting very accurate results.
HFSS converges into DMM’s values when its deviation is reduced in the approximation
for curved surfaces.
References
[1] M. V. T. Heckler and A. Dreher, "Analysis of Cylindrical Microstrip Lines Using the Discrete Mode Matching Method," Microw. and Wireless Compo. Lett., vol. 16 no.7, pp. 392 - 394, 2006.
[2] S. Xiao, R. Vahldieck, and J. Hesselbarth, "Analysis of Cylindrical Transmission Lines with the Method of Lines," IEEE Trans. Microw. Theory Tech., vol. 44, pp. 993-999, 1996.
[3] T. Ling, "The Analysis of the Microstrip Dispersion with Multi-Layers Dielectric," International Journal of Infrared and Millimeter Waves, vol. 20, 1999.
[4] V. Mathew, "Computation of Dispersion in Microstrip Line with Anisotropic Substrate and Overlay," International Journal of Infrared and Millimeter Waves, vol. 26, pp. 563 - 573, 2005.
[5] G. Zheng and K. Chen, "The Studies of Cylindrical Microstrip Line with the FD-TD Method in Cylindrical Coordinate System," International Journal of Infrared and Millimeter Waves, vol. 13, pp. 1421- 1431, 1992.
[6] K.-L. Wong, Design of Nonplanar Microstrip Antennas and Transmission Lines, vol. 1, First ed. Taiwan: John Wiley & Sons, inc., 1999.
[7] R. K. Wangsness, Electromagnetic Fields, 2nd Edition ed. Arizona, 1986. [8] M. Thiel and A. Dreher, "Dyadic Green's Function of Multilayer Cylindrical
Closed and Sector Structures for Waveguide, Microstrip-Antenna, and Network Analysis," IEEE Trans. Microw. Theory Tech., vol. 50 no.11, pp. 2576 - 2579, 2002.
[9] M. Abramowitz and I. A. Stegun, Handbook of Mathematical Functions with Formulas, Graphs, and Mathematical Tables, Ninth ed. New York: Dover, 1964.
[10] M. V. T. Heckler and A. Dreher, "Analysis of Graded-Index Fibers Using a Full-Wave Equivalent Circuit," J. Lightw. Technol., vol. 25 no.1, pp. 392-394, 2007.
[11] M. Thiel, "Die Analyse von zylinderkonformen und quasi-zylinderkonformen Antennen in Streifenleitungstechnik," vol. Ph.D. Dissertation. Munich, Germany: Tech. Univ. Munich, 2002.
[12] D. M. Pozar, Microwave Engineering, vol. 1, 3rd. ed: John Wiley and Sons, Inc., 2005.
Appendix
Recurrence Relation of Cross products of Bessel functions.
k k kq k p q (5.4)
1k k kr k p r (5.5)
21k k k ks k p p s (5.6)
' '
' '
' ' ' '
p J a Y b J b Y a
q J a Y b J b Y a
r J a Y b J b Y a
s J a Y b J b Y a
(5.7)
1k
k
a kb k
(5.8)
The next figure shows the profile, the dispersion improvement and real power flow in a
microstrip line.
5 10 15 20
1.165
1.166
1.167
1.168
1.169
1.17
1.171
1.172
1.173
Frequency (GHz)
Nor
mal
ized
Pro
paga
tion
Con
stan
t: Kz
Dispersion
11 11.5 121
1.5
2
2.5
3
Distance (Ro Direction in mm.)
Ele
ctric
Per
mitiv
ity
Electric Permitivity Profile
-0.2 -0.1 0 0.1 0.2
0.4
0.45
0.5
0.55
X (Normalized)
Y (N
orm
aliz
ed)
Real Power (Poynting Vector)
0.5
1
1.5
2
2.5
3
3.5
4
4.5x 107
-0.20
0.2 0.4 0.45 0.5 0.55
-1
0
1
2
3
4
5x 107
Y (Normalized)
Real Power (Poynting Vector)
X (Normalized)
Rea
l Pow
er (N
orm
aliz
ed)
0.5
1
1.5
2
2.5
3
3.5
4
4.5x 107
(b)(a)
(d)(c)
Figure 31: a) Electric permittivity profile, b) Dispersion improvement, c) Normalized magnitude of the real power, d) 3D representation of the real power (normalized values).