afm investigation on surface evolution of amorphous carbon during ion-beam-assisted deposition
TRANSCRIPT
www.elsevier.com/locate/apsusc
Applied Surface Science 253 (2006) 1480–1483
AFM investigation on surface evolution of amorphous
carbon during ion-beam-assisted deposition
X.D. Zhu a,*, F. Ding a, H. Naramoto b, K. Narumi b
a CAS Key Laboratory of Basic Plasma Physics, Department of Modern Physics,
University of Science and Technology of China, Hefei, Anhui 230026, People’s Republic of Chinab Advanced Science Research Center, Japan Atomic Energy Research Institute, 1233 Watanuki, Takasaki, Gunma 370-1292, Japan
Received 18 May 2005; received in revised form 20 January 2006; accepted 14 February 2006
Available online 31 March 2006
Abstract
Hydrogen-free amorphous carbons (a-C) have been prepared on mirror-polished Si(1 1 1) wafers through thermally evaporated C60 with
simultaneous bombardments of Ne+ ions. The time evolution of film surfaces has been characterized by atomic force microscopy (AFM) at two
temperatures of 400 and 700 8C, respectively. Based on the topography images and the root-mean-square (rms) roughness analysis, it is found that
the a-C surfaces present roughening growth at the initial stage. With increasing growth time, the cooperative nucleation of the islands and pits
appears on the surfaces, suggesting three-dimensional growth, and then they continue to evolve to irregular mounds at 400 8C, and elongated
mounds at 700 8C. At the steady growth stage, these surfaces further develop to the structures of bamboo joints and ripples corresponding to these
two temperatures, respectively. It is believed that besides ion sputtering effect, the chemical bonding configurations in the amorphous carbon films
should be taken into considerations for elucidating the surface evolutions.
# 2006 Elsevier B.V. All rights reserved.
PACS: 68.37.Ps; 68.55.Jk; 81.05.Uw
Keywords: Amorphous carbon; Surface morphology; Ion beam
1. Introduction
A major focus of research on nonequilibrium processes at
surfaces is the evolution of surface morphology, which has been
a topic of continuing research for several decades [1]. Because
the usefulness of a growing film depends heavily on the nature
of surface morphology, including its height variations, rough-
ness, or patterns. It is therefore important to understand the
evolution of the surface morphology during processing.
Ion bombardment of solid surfaces is known to create
curious morphologies ranging from self-affine surface rough-
ness to ripples [2–4]. Ion-beam-assisted deposition (IBAD)
combines this advantage with film growth. A series of chemical
reactions in IBAD can be generated due to collisions between
incident ions and source species, which causes lots of atoms,
clusters and radicals. Further, these species react with the
substrate physically and chemically to form film growth. ‘On
* Corresponding author. Tel.: +86 5513601168; fax: +86 5513601164.
E-mail address: [email protected] (X.D. Zhu).
0169-4332/$ – see front matter # 2006 Elsevier B.V. All rights reserved.
doi:10.1016/j.apsusc.2006.02.034
the other hand, the growing surface is simultaneously
bombarded by incident ion beam, which provides a possibility
of patterning a surface.
In our previous work, we have used IBAD to deposit
successfully amorphous carbon films with various textured
surfaces, such as ripples, mounds [5,6]. In this article, we focus
on the surface evolutions of time-dependent deposits for
amorphous carbons obtained in C60 vapor by simultaneous
bombardments of Ne+ ions at middle and relatively high growth
temperatures.
2. Experiment
Experiments were carried out on an ion-beam-assisted
deposition device. This machine was equipped with an ion gun
and a sublimator. C60 powder with the purity of 99.99% was
placed in a pyrolytic BN crucible of the sublimator. The
background pressure in the chamber was less than 2 � 10�6 Pa.
The Si(1 1 1) wafers used as substrates were rinsed ultra-
sonically with de-ionized water, acetone, and ethanol,
respectively, before they were placed on the substrate holder.
X.D. Zhu et al. / Applied Surface Science 253 (2006) 1480–1483 1481
Fig. 2. Root-mean-square (rms) roughness as a function of growth times. The
samples are deposited at 400 8C.
C60 vapor was produced by heating electrically the sublimator
up to 400 8C, and the growing film was simultaneously
bombarded by Ne+ ions with ion incident angle of 608 from
substrate normal. The emission of the filament in the ion gun is
fixed at 20 mA. The working pressure was maintained around
6 � 10�4 Pa in the chamber. After the deposition, the carbon
films were analyzed by micro-Raman spectroscopy, and atomic
force microscopy (AFM). Micro-Raman spectra were recorded
at room temperature using the 514 nm line of Ar+ ion laser.
3. Results and discussion
Fig. 1 shows Raman spectra of the films deposited at
different growth times at 400 8C. At the initial growth stage of
20 min, the strong peak centered at 980 cm�1 can still be
observed, which is assigned to Si from the substrate. With
increasing the growth time, a broad Raman signal centered at
1547 cm�1 appears and enhances, but Raman spectra of Si
become weaker, and then vanished. From 100 min, the Raman
spectra of the deposited films present similar structures,
suggesting a steady growth. Raman spectra in Fig. 1 manifest
the characteristics of amorphous diamond-like carbon films,
i.e., a broad peaks at energies�1547 cm�1 (symmetric G peak)
with a small shoulder at �1353 cm�1 (asymmetric D peak)
[7,8].
The root-mean-square (rms) roughness as a function of
growth times is shown in Fig. 2. The rms roughness firstly
increases gradually, followed by rapid increase with increasing
growth times. Fig. 3 shows the surface evolution of the
deposited films with growth time. At the initial growth stage of
10 min, the film surface is shown to be undulate.
For the film growth, three growth modes have been, in
principle, classed: layer-by-layer growth in lattice matched
system (Frank–van-der Merwe), the island growth mode
(Volmer–Weber) and the isolated island growth (Stranski–
Kratanow) in lattice mismatched systems [9]. In the early
Fig. 1. Raman spectra of the films deposited at different growth times. The
samples are prepared at 400 8C.
deposition stage, the rms roughness increases gradually, shown
in Fig. 2, and also the films present undulate. So, it is reasonable
to conclude that these are characterized by dynamic rough-
ening. It is considered that the growing surface also faces ion
bombardment. Roughening of surfaces by sputtering has long
been observed, especially at off-normal incidence [10]. The
ability of ion bombardment to affect the dynamics of surface
processes arises by virtue of the energy deposited at or near the
surface during impact. Material removal by sputtering is the
most obvious process that can lead to development of interface
morphology. It is very likely that the gradual increase of the
surface roughness in amorphous carbon films in Fig. 2 is
induced by Ne+ ion sputtering on the growing films.
As the growth time is increased, the three-dimensional
growth takes place, the islands and pits appear on the surfaces.
With a further increase to the growth time, and the topographies
of the a-C films are shown to be a set of continuous irregular
mounds. Simultaneously, there is a rapid increase in rms
roughness as shown in Fig. 2. But this kind surface is unstable,
and with further increase of deposition time, the surface
develops to ‘‘bamboo joint’’ structures at the stable growth
stage.
Fig. 4 shows the surface evolution of the films deposited at
700 8C. Fig. 5 displays the their root-mean-square (rms)
roughness as a function of growth times. In the initial stage, the
surface presents a similar growth as like at 400 8C, and the rms
roughness increases gradually. After 30 min, rms roughness
increases rapidly. At 60 min, the three-dimensional elongated
mounds appear. Different from bamboo joint structures at
400 8C, the periodical ripples with the wave vector parallel to
the projection of incident ion beam form at steady growth stage.
The surface evolution of a-C films is a complicated
nonequilibrium processes. Concerning the formation and
development of far-from-equilibrium interfaces, there have
been a great number of theoretical and experimental
investigations aiming at understanding the mechanism
involved, but experimental verification is still underway. In
our previous work, we have investigated the surfaces of
amorphous carbon films grown by ion-beam-assisted deposi-
tion at 200 8C growth temperature and 2.0 keV ion energy. The
films present mound surfaces at the steady growth stage. In this
X.D. Zhu et al. / Applied Surface Science 253 (2006) 1480–14831482
Fig. 3. AFM images of the films deposited at 400 8C, showing the surface evolution of the deposited films with growth times. (a), (b), (c), (d), and (e) refer to 20, 45,
100, 200, and 250 min, respectively. Insets are enlarged images taken from the centers. The scanning size is 400 nm � 400 nm.
Fig. 4. AFM images of the films deposited at 700 8C, showing the surface evolution of the deposited films with growth times. The scanning size is 400 nm � 400 nm.
X.D. Zhu et al. / Applied Surface Science 253 (2006) 1480–1483 1483
Fig. 5. Root-mean-square (rms) roughness as a function of growth times. The
samples are deposited at 700 8C.
case, the stable structure evolves to bamboo joint structures at
the middle growth temperature 400 8C, and to ripple at high
growth temperatures 700 8C.
Two processes should be noted in IBAD, gas phase and
surface reaction. Ne+ ions extracted from ion gun firstly react
with C60 molecules in vapor environment. We have demon-
strated that the dissociation of C60 clusters may be induced as
ion energy is increased to above 500 eV [6]. To date, the actual
mechanism of fragmentation is not completely clear yet. But it
is known that containing-carbon species including C2 should be
produced during the collisions between C60 clusters and Ne+
ions [11,12].
Since the incident ion energy, ion to atom ratio, ion density
all are independent in IBAD, it is reasonable to suppose that the
gas phase processes should be similar at different growth
temperatures. In this case, surface reaction should be taken into
consideration for the difference of the stable structures
observed at various temperatures. It is generally acknowledged
that film properties, such as composition and morphology are
generally strong functions of temperature.
From Raman spectra (no shown), the chemical bonding
configuration varies distinctly with increasing substrate
temperatures. With elevated growth temperatures, separated
G and D lines appear and become clearer, suggesting an sp2
phase development and organization of small graphite clusters.
These c–c bonding variations strongly affect the surface
diffusion during film growths, which is contributed to various
surface characteristics with growth temperatures.
4. Conclusion
In summary, we have carried kinetic investigation of the
topography of ion-beam-assisted a-C films at two temperatures
400 and 700 8C, respectively. At the initial stage the a-C
surfaces present roughening growth, following by three-
dimensional growths. With increasing growth time, the surfaces
show the cooperative nucleation of the islands and pits, and
then they further develop to three-dimensional irregular
mounds at 400 8C, and elongated mounds at 700 8C. At the
steady growth stage, these mounds evolve to the structures of
bamboo joints and ripples with respect to these two
temperatures, respectively. It is believed that besides ion
sputtering, the chemical bonding configurations in the
amorphous carbon films should be taken into considerations
for elucidating the surface evolutions.
Acknowledgement
One of authors (Zhu) wishes to express appreciations for the
project sponsored by the National Natural Science Foundation
(No. 50472010), the Inertial Confinement Fusion Technology
Exploration Foundation.
References
[1] R. Friedrich, G. Radons, T. Ditzinger, A. Henning, Phys. Rev. Lett. 85
(2000) 4884.
[2] J. Krim, I. Heyvaert, C.V. Haesendonck, Y. Bruynseraede, Phys. Rev. Lett.
70 (1993) 57.
[3] S. Rusponi, G. Costantini, C. Boragno, U. Valbusa, Phys. Rev. Lett. 81
(1998) 4184.
[4] A. Datta, Y.R. Wu, Y.L. Wang, Phys. Rev. B 63 (2001) 125407.
[5] X.D. Zhu, H. Naramoto, Y. Xu, K. Narumi, K. Miyashita, Phys. Rev. B 66
(2002) 165426.
[6] X.D. Zhu, Y.H. Xu, H. Naramoto, K. Narumi, K. Miyashita, J. Phys.
Condens. Matter 14 (2002) 5083.
[7] E.H. Lee, D.M. Hembree Jr., G.R. Rao, L.K. Mansur, Phys. Rev. B 48
(1993) 15540.
[8] M.P. Siegal, D.R. Tallant, L.J. Martinez-Miranda, J.C. Barbour, R.L.
Simpson, D.L. Overmyer, Phys. Rev. B 61 (2000) 10451.
[9] R. Notzel, Semicond. Sci. Technol. 11 (1996) 1365.
[10] R.M. Bradley, J.M.E. Harper, J. Vac. Sci. Technol. A 6 (1988) 2390.
[11] J.F. Christian, Z. Wan, S.L. Anderson, J. Chem. Phys. 99 (1993) 3468.
[12] R.D. Beck, J. Rockenberger, P. Weis, M.M. Kappes, J. Chem. Phys. 104
(1996) 3638.