#4 (oct. 22) photolithgraphy
DESCRIPTION
#4 (Oct. 22) Photolithgraphy. -What is photolithgraphy? -Thin-film patterning using phtolithgraphy -Applications of photolithgraphy -Trends in minimum pattern sizes. What Is Photolithgraphy?. Photo + Lithograph Technologies to replicate patterns on a photomask to - PowerPoint PPT PresentationTRANSCRIPT
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#4 (Oct. 22) Photolithgraphy
-What is photolithgraphy?-Thin-film patterning using phtolithgraphy-Applications of photolithgraphy-Trends in minimum pattern sizes
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What Is Photolithgraphy?Photo + LithographTechnologies to replicate patterns on a photomask to substrates or thin films on the substrates by using photo-chemical reaction photoresist
Photomask Thin film on a substrate
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What Is Photoresit
A material that changes its solubility to developer by irradiation of light (ultraviolet or X ray) and electron beam
Changes:(1) Non-soluble to solvable (positive-type photoresist)(2) Soluble to non-soluble (negative-type photoresist)
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Composition of Photoresist
Sensitizer
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Change of Sensitizer by UV Irradiation
Non-soluble Soluble
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Purposes and Features of Photolithography
Purposes-Fabrication of electron devices such as LSIs-Fabrication of micromachines-Packaging of LSIs and micromachines
Features-Minimum size of 1 m or less is achievable-Batch process-Pattern repetition
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a
Photoresist ( 1 m )
Chromium thin film( 50 nm)
Fused-quartz substrate (1 mm)
ba b
Photomask Fabrication (1)Chromium thin film deposition and
photoresist deposition
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Electron beam
a ba b
Photomask Fabrication (2)
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a ba b
Photomask Fabrication (3)
Development
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a ba b
Photomask Fabrication (4)
Etching of chromium thin film
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a ba b
Photomask Fabrication (5)
Photoresisit removal
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Silicon substrate
a ba b
Phtolithography of Al Thin Film (1)
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SiO2thin film(1 m)
a ba b
Phtolithography of Al Thin Film (2)
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Al thin film( 1 m)
a ba b
Phtolithography of Al Thin Film (3)
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Photoresist
a ba b
Phtolithography of Al Thin Film (4)
Followed by pre-baking at 120 ℃
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Mercury lampPhotomask
a ba b
Phtolithography of Al Thin Film (5)
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Wavelength (nm)
Inte
nsi
ty (
rela
tive
)
Emission Spectrum of Mercury Lamp
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a ba b
Phtolithography of Al Thin Film (6)
Development
Followed by post-baking at 120~180 ℃
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a ba b
Phtolithography of Al Thin Film (7)
Al thin film etching
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a ba b
Phtolithography of Al Thin Film (8)
Photoresist removal
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a ba
Photoresist
Lift-Off of Al Thin Film (1)
b
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(2)
Mercury lampPhotomask
a ba b
Lift-Off of Al Thin Film (2)
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a ba b
Lift-Off of Al Thin Film (3)
Development
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a ba b
Lift-Off of Al Thin Film (4)
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(5)
a ba b
Lift-Off of Al Thin Film (5)
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a ba b
Lift-Off of Al Thin Film (6)
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Wiring Using Al Thin Films
Contact holes
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Cross-Section of CMOS LSI
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Electron beam scanner
ReticlePhotomask
Stepper
Pattern generator Stepper
Pattern Size Reduction by Stepper
WaferDesign data
Contact aligner
Projection aligner
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Stepper
http://www.tochigi-nikon.co.jp/business/stepper/
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Trends in Minimum Pattern Size
http://public.itrs.net/
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Inside Clean Room (MIT)
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by Richard P. Feynman
http://www.zyvex.com/nanotech/feynman.html
There's Plenty of Room at the BottomAn Invitation to Enter a New Field of Physics
Homework: Read This Article by 11/4