1988 technical digest series, volume6tua5 characterization of vanadium oxide optical thin films by...

OPTICAL INTERFERENCE COATINGS1988 TECHNICAL DIGEST SERIES, VOLUME 6

POSTCONFERENCE EDITION

Summaries of papers presented at the

Optical Interference CoatingsTopical Meeting

April 12-15, 1988

Tucson, Arizona

Sponsored by

Optical Society of America

In Cooperation with

American Vacuum SocietySPIE—The International Society for Optical Engineering

and

Society of Vacuum Coaters

The Organizers of the meeting wish to acknowledge contributions fromBalzers Optical Corporation, Balzers High Vacuum Products, Leybold-Heraeus GmbH, and OCLI.

Optical Society of America1816 Jefferson Place, N.W.

Washington, D.C. 20036(202) 223-8130

MONDAY, APRIL 11,1988

PALM ROOM

6:00 PM-9:00 PM REGISTRATION/RECEPTION

TUESDAY, APRIL 12,1988

VIGAS ROOM

7:00 AM-4:30 PM REGISTRATION/SPEAKER CHECKIN

PALM ROOM

7:15 AM-8:15 AM BREAKFAST

SANTA CATALINA BALLROOM

8:15 AM-8:30 AM

OPENING REMARKS

Alfred Thelen, Leybold Heraeus GmbH

8:30 AM-10:50 AM

TuA, CHARACTERIZATION, MICROSTRUCTURE AND

SCATTERING

J. A. Dobrowolski, National Research Council of Canada

Michael R. Jacobson, University of Arizona, Copresiders

8:30 AM (Invited Paper)TuA1 High-Resolution Transmission Electron Microscopyof Thin Films, LeRoy Eyring, Arizona State U. Structures,morphologies, and dynamic changes in thin films and onsurfaces are viewed at near-atomic resolution, including real¬time video recording, (p. 2)

9:00 AM (Invited Paper)TuA2 Film Microstructure and Its Effects on OpticalCoatings, Ian Hodgkinson, U. Otago, NewZealand. Thin filmmodels as they apply to microstructure in vapor deposited

coatings are reviewed. In general the microstructure is aniso¬tropic and so are the thin film properties, (p. 6)

9:30 AM

TuA3 Characterization of Optical Coatings with Backseat-tering Spectrometry, J. A. Leavitt, L. C. Mclntyre, Jr., M. D.

Ashbaugh, J. G. Oder, U. Arizona. Backscattering spectrom¬etry is used to determine impurities, stoichiometry, and

thickness for a magnesium fluoride coating, a tungsten/silicon multilayer soft x-ray mirror, and a trilayer optical data

storage coating, (p. 10)

TUESDAY, APRIL 12,1988 — Continued

9:35 AM

TuA4 Stoichiometry of Reactively Evaporated Films, Albert

Feldman, E. N. Farabaugh, U.S. National Bureau of Stand¬

ards; Y. N. Sun, Lanzhou Institute of Physics, China. XPSmeasurements indicate that the average oxidation state of

silicon atoms in reactively evaporated SiOx films can be lessthan expected from the oxygen content, (p. 14)

9:40 AM

TuA5 Characterization of Vanadium Oxide Optical ThinFilms by X-Ray Diffractometry, E. E. Chain, U. Texas atDallas. Thin film x-ray diffractometry with Seemann-Bohlin

focusing provides enhanced sensitivity to the microstruc-tures of optical thin films. Results on vanadium oxide filmsare presented, (p. 18)

9:45 AM

TuA6 Crystallographic Transition in Conventional Bronze

and Anomalous Blue V02 Thin Films, Francine C. Case, LTV

Missiles & Electronics Group. X-ray diffraction spectra ob¬served both above and below the 67 °C phase transition arediscussed for conventional bronze and anomalous blue V02thin films, (p. 22)

9:50 AM

TuA7 Acoustic Microscopy on Infrared Coatings, Claus W.

Gunkel, Ernst-Leitz-Wetzlar GbmH, F. R. Germany. Acousticmicroscopy is a useful tool for obtaining information frombeneath the surface, especially to discover delamination

centers, e.g., at the layer-substrate interface, (p. 26)

9:55 AM

TuA8 Roughness Effects on Thin Metallic Film Surfaces

Using Photoacoustic Spectroscopy, R. Machorro, J. Si-queiros, J. Valenzuela, IFUNAM, Mexico; E. Regalado, CIF-US, Mexico. The influence of periodic grooves etched on thesurface of silver thin film coated onto a glass prism is stud¬

ied, using the photoacoustic technique. The effect of grooveseparation and height is shown for a given layer thickness.

(P- 30)

10:00 AM

TuA9 Microstructure Effects on Light Propagation in ZnS

Waveguides, M. D. Himel, J. A. Ruffner, U. J. Gibson, U.Arizona. We report a waveguide method of measuring atten¬uation in thin films. Effects of 02 and H20 partial pressureson ZnS film losses have been investigated, (p. 32)

10:05 AM

TuA10 Shape of and Substrate Effects on the Optical Ab-

sorbance of Metal-Spheroidal Island Coatings, J. P. Goudon-

net, U. Dijon, France. Ultrathin metal films are treated as acollection of oblate spheroids in which the shape is govern¬ed by heat treatment and evaporation thickness, (p. 35)

V

TUESDAY, APRIL 12,1988— Continued TUESDAY, APRIL 12,1988—Continued

10:10 AM

TuA11 Topographic Evaluation of Optical Thin Films byHologram Interferometry, David Salazar, Diana Tentori,

CICESE, Mexico. Modification of an aligned hologram inter¬

ferometer is presented. By introducing an etalon, multiplebeam fringes are produced, increasing the sensitivity and

making it possible to evaluate the topography of optical thinfilms as well as to measure its optical thickness, (p. 39)

10:15 AM

TuA12 Characterization of Thin Film Surfaces by Differ¬

ential Scattering Measurements and Digital Analysis ofMicrographs of the Replicas, Zhong-Liang Lu, Jin-Fa Tang,Zhejiang U., China. Differential scattering measurementsand a digital analysis of micrographs provide statisticalproperties of film surfaces over an extended bandwidth of

spatial frequency limits, (p. 40)

10:20 AM

TuA13 Computational Studies of Stylus Profilometer Char¬acteristics, S. R. Wilson, J. R. McNeil, U. New Mexico; G. A.

Al-Jumaily, Ban Associates, Inc. The properties of a stylus

profilometer are investigated computationally. The stylus is

found to exhibit nonlinear, low pass filterlike behavior, (p. 44)

10:25 AM

TuA14 Analysis of Diffraction Anomalies in Multilayer-Overcoated Gratings, L. F. DeSandre, J. Merle Elson, C.

Schwartz, Naval Weapons Center. A rigorous analysis based

on the extinction theorem is presented to study anomalous

resonance effects from multilayer-overcoated, low-efficiencydiffraction gratings, (p. 48)

10:30 AM

TuA15 Comparison of Optical Scatterometer and OpticalProfilometerTechniques for Microstructure Characterizationof Optical Surfaces, R. D. Jacobson, S. R. Wilson, J. R.

McNeil, U. New Mexico; G. A. Al-Jumaily, Ban Associates,Inc. The two measurement techniques were used to charac¬

terize a variety of optical surfaces. Results are discussed, as

are precautions one should consider when comparing meas¬

urement results, (p. 52)

10:35 AM

TuA16 Effects of Metal Coatings on the Surface Rough¬ness and Optical Scatter Characteristics of Coated Sur¬faces, G. A. Al-Jumaily, BanAssociates, Inc.; S. R. Wilson, R.

D. Jacobson, J. R. McNeil, U. New Mexico. The effects of

metallic coatings on reducing optical scatter and surface

microroughness have been examined. The roles of film thick¬ness, deposition conditions, and substrate roughness areexamined, (p. 56)

10:40 AM

TuA17 Scattering Study of Single Layer Titania Films, C.Hickey, C. Amra, E. Pelletier, Ecole Nationale Superieure de

Physique de Marseille, France. Light scattering measure¬ments further characterize a series of titanium dioxide thin

film samples. Previous analyses were given at the 1986 and

1987 OSA Annual Meetings, (p. 59)

10:45 AM

TuA18 Description of a Scattering Apparatus Applicationto the Problems of Characterization of Opaque Surfaces, C.Amra, C. Grezes-Besset, P. Roche, E. Pelletier, Ecole Na¬

tionale Superieure de Physique de Marseille, France. We

show how the complexity of a micropolished optical surfacecan be investigated in detail by measurement of the distribu¬tion of scattered light, (p. 62)

CANYON ROOM

10:30 AM-5:30 PM EXHIBITION

DESERT & BOARD ROOMS

10:50 AM-12:20 PM

CONTRIBUTED PAPER DISCUSSION SESSION/

REFRESHMENTS

PALM ROOM

12:20 PM-1:20 PM LUNCH


1:20 PM-1:50 PM

TuB, APPLICATIONS REVIEW: 1

Charles K. Carniglia, Martin Marietta AerospaceWerner P. Thoeni, Balzers AG, Copresiders

1:20 PM (Invited Paper)TuB1 Wavelength-Division Multiplexing: From InterferenceFilters to Integrated Optics, H. F. Mahlein, Siemens AG, F. R.

Germany. The micro-optic interference filter components forfiber-optic communication in the wavelength-division multi¬

plex mode are compared with their present and emerging

competitors, (p. 66)

1:50 PM-2:45 PM

TuC, CHARACTERIZATIONCharles K. Carniglia, Martin Marietta AerospaceWerner P. Thoeni, Balzers AG, Copresiders

1:50 PM (Invited Paper)TuC1 In situ Ellipsometric Monitoring and Modeling of theGrowth and Synthesis of Thin Films, R. P. Netterfield, P. J.

Martin, K.-H. Muller, W. G. Sainty, C. G. Pacey, S. W. Filip-

czuk, CSIRO Division of Applied Physics, Australia. The re¬sults of in situ ellipsometric monitoring of the growth and

etching of thin films are interpreted in terms of theoreticalmodels, (p. 72)

vi

TUESDAY, APRIL 12,1988 — Continued

2:20 PM

TuC2 Methods of Determining Thin Film Stress, Norman L.

Thomas, Lawrence Livermore National Laboratory. Several

stress measurement techniques are described including:x-ray diffraction, Raman shift, resonance membrane, canti¬

lever beam, laser scanning, geometrical optics, moire fr¬

inges, and optical interference, (p. 76)

2:25 PM

TuC3 Measurement of the Thermal Conductivity of Dielec¬tric Thin Solid Films with a Thermal Comparator, C. A.Amsden, S. E. Gilman, S. D. Jacobs, U. Rochester; J. S.

Torok, Rochester Institute of Technology. The thermal con¬ductivities of silica, titania, alumina, and magnesium fluoridewere measured. The film conductivities obtained are signif¬

icantly below corresponding bulk values, and generally in¬

crease with film thickness, (p. 78)

2:30 PM

TuC4 Effect of Space Contamination on Optical Coatings,Nasrat A. Raouf, Jet Propulsion Laboratory; G. A. Al-Jumaily,Barr Associates, Inc. The effects of certain space con¬taminants on the optical properties of coatings are present¬ed. Single layer coatings of both silicon and aluminum oxyni-tride deposited on silicon substrates using ion-assisteddeposition are examined, (p. 82)

2:35 PM

TuC5 Study of H20 and D20 Contamination Using Laser-Induced Desorption in an Automated System, J. B. Franck,Naval Weapons Center; H. A. Macleod, U. Arizona. Probingwith a small laser focal spot revealed spatially nonuniform

desorption but proved inconvenient for obtaining statisticallysignificant data. Overcoming this difficulty is discussed,(p. 83)

2:40 PM

TuC6 Laser-Induced Damage of Dielectric Systems withGradual Interfaces at 1.064 jum, J. Ebert, D. Ristau, H. Schink,F. Mittendorf, S. M. J. Akhtar, H. Welling, U. Hanover, F. R.Germany. Gradual interfaces are studied in this paper. A

technique for the coevaporation of two materials is pre¬sented and used for the production of high-reflecting andantireflective systems, (p. 85)

TUESDAY, APRIL 12,1988— Continued


2:45 PM-3:15 PM

TuD, MONITORING


2:45 PM

TuD1 Thin Film Microstructure Effects on EllipsometricThin Film Deposition Monitoring, W. Gunning, J. Moyle,RockwellInternational Science Center. Microstructure in thin

films affects the accuracy of ellipsometric monitoring. Amodel of form birefringence is shown to agree with anomal¬ous ellipsometric monitoring results, (p. 88)

2:50 PM

TuD2 Multilayer and Variable-Index Coating Deposition byAutomatic Ellipsometry, B. Tirri, D. Dunn, P. Vanbuskirk,Perkin-Elmer Corporation. Automatic ellipsometry is usefulas a monitoring instrument due to its accuracy and pre¬cision. Its use in several classes of thin film designs aredescribed, (p. 92)

2:55 PM

TuD3 Wideband Optical Monitoring of Broadband ARCoatings, Hue-Qun Hu, Yu-Ming Chen, Jin-Fa Tang, ZhejiangU., China. Broadband AR coatings were produced usingwideband optical monitoring. The monitoring system con¬sists of an IBM-PC/XT coupled to a rapid scanning mono-chromator. (p. 93)

3:00 PM

TuD4 Wideband Monitoring and Measuring System for Op¬tical Coatings, Yi-Hsun Yen, Li Li, Shanghai Institute of Tech¬nical Physics, China. A practical system with a real-time

spectrometer and supporting software has been developedfor monitoring and measuring optical coatings in situ.(p. 97)

3:05 PM

TuD5 Reflectance Diagram-Aided Technique for OpticalDesign and Monitoring, S. Y. Zheng, C. N. Yen, X. Ma, BeijingInstitute of Optoelectric Technology, China; G. Ping, BeijingNormal U., China. We describe a reflectance diagram-aidedtechnique for the design of both induced reflection andtransmission filters, as well as for the monitoring consid¬

eration of all-dielectric multilayers with a symmetric struc¬ture, (p. 101)

3:10 PM

TuD6 Optical Monitoring Scheme for Narrow BandpassFilters, Ronald R. Willey, Opto Mechanik, Inc. We describe anovel split-layer scheme to control the spectral edges of in¬frared bandpass filters to 0.5% and allow thick absorbinglayers to be monitored, (p. 105)

vii

TUESDAY, APRIL 12, 1988— Continued


3:15 PM-3:35 PM

TuE, X-RAY AND EXTREME ULTRAVIOLET COATINGS


3:15 PM

TuE1 Fabrication and Testing of Large Area MultilayerCoated X-Ray Optics, Eberhard Spiller, IBM Watson Re¬search Center; Leon Golub, Smithsonian Astrophysical

Observatory. We discuss the procedures that have been de¬

veloped for the production and testing of soft x-ray multi¬

layer reflection coatings on large figured optical surfaces,

(p. 110)

3:20 PM

TuE2 X-Ray Metal Film Filters at Cryogenic Temperatures,Ritva A. M. Keski-Kuha, NASA Goddard Space Flight Center.

Use of thin metal foil filters at cryogenic temperatures has

been evaluated. Preliminary results on cold testing are dis¬

cussed, particularly the aging of the filters as a result of coldcycling, (p. 114)

3:25 PM

TuE3 Short Wavelength Coatings for Large Optics, J. Kur-dock, E. Strouse, B. Tirri, Perkin-Elmer Corporation. The useof x-ray and VUV coatings on large optics poses uniqueproblems for the coating engineer. Facility design, processdevelopment, and characterization are discussed for severalapplications, (p. 115)

3:30 PM

TuE4 Young's Experiment at X = 1.54 A Using Sputtered-Sliced Multilayers, Norman L. Thomas, Richard M. Bionta,Lawrence Livermore National Laboratory. We discuss our

technique for producing sputtered-sliced zone plates andtransmission gratings. Both amplitude modulated and phasemodulated devices have been produced. These devices have

been used to demonstrate interference effects with 8-keV x

rays. (p. 116)


3:35 PM-5:05 PM


REFRESHMENTS WITH SNACK

5:05 PM-7:15 PM DINNER BREAK

TUESDAY, APRIL 12,1988—Continued

VIGAS ROOM

7:00 PM-9:00 PM REGISTRATION/SPEAKER CHECKIN


7:15 PM-8:30 PM

TuF, RUGATE FILTERS

Keith L. Lewis, Royal Signals and Radar EstablishmentRasheed M. A. Azzam, University of New Orleans at

Lakefront, Copresiders

7:15 PM (Invited Paper)TuF1 Overview of Rugate Filter Technology, Walter E.

Johnson, Robert L. Crane, Air Force Wright Aeronautical

Laboratories. Rugate filters areexamined from historical andcurrent research perspectives. Design features important to

optical system usage are covered, (p. 118)

7:45 PM

TuF2 Si(1_x)Nx Near Infrared Rugate Filter Fabrication bylon-Beam-Assisted Deposition, E. P. Donovan, A. Kahn, C. A.

Carosella, G. K. Hubler, U.S. Naval Research Laboratory; D.Van Vechten, Sachs/Freeman Associates. Infrared rugate fil¬

ters were fabricated under computer control by nitrogenbeam-assisted silicon e-beam evaporation. Refractive index,

composition, deposition parameters, and thermal treat¬ments were correlated, (p. 122)

7:50 PM

TuF3 Codeposition of Continuous Composition Rugate Fil¬

ters, W. Gunning, R. Hall, F. Woodberry, William H. South¬well, Rockwell International Science Center. Multiple-line

rugate filters have been fabricated by codeposition from two

rate-controlled sources. The resulting amorphous film close¬

ly approaches that of a monolithic structure, (p. 126)

7:55 PM

TuF4 Rugate Filters by Laser Flash Evaporation, C. S. Bar¬

tholomew, M. D. Morrow, W. J. Wild, H. T. Betz, N. P.

Murarka, IIT Research Institute. A deposition system forlaser flash evaporation was assembled and used to deposittwo notch ZnSxSey rugate filters with optical densities of 2 ormore and bandwidths as low as 7%. (p. 130)

8:00 PM

TuF5 Random Errors in Rugate Filters, Joseph E. Davison,U. Dayton Research Institute; Walter E. Johnson, Air Force

Wright Aeronautical Laboratories. Reflectance spectra forrugate filters having refractive-index profiles containing ran¬dom errors were calculated and compared with the spectrumof the ideal filter, (p. 134)

viii

TUESDAY, APRIL 12,1988 — Continued WEDNESDAY, APRIL 13, 1988

8:05 PM

TuF6 Design of Rugate Reflectors for P-Polarization atNon-Normal Incidence, Arnold L. Bloom, Coherent, Inc. A

computer simulation of sine wave indices is used to designreflectors for use at oblique angles. There are limitations at

large angles of incidence, (p. 138)

8:10 PM

TuF7 Rugate Index Profile Suppressing All Harmonic Stop-bands, William H. Southwell, Rockwell International Science

Center. Sinewave, Jacobian elliptic, and exponential sine-wave index profiles all exhibit some harmonic stopbands. Anew rugate index profile is derived which has no harmonic

stopbands. (p. 142)

8:15 PM

TuF8 Rugate Sidelobe Suppression Using Quintics and

Rugated Quintic Matching Layers, William H. Southwell,Rockwell International Science Center. Sinewave rugate in¬

dex profiles may be superimposed on a slowly varying

average index in such a way as to reduce sidelobes over

broad spectral regions, (p. 146)

8:20 PM

TuF9 New Approach to Design and Production of Inhomo-

geneous Optical Coatings, R. W. Bertram, M. F. Ouellette, P.Y. Tse, Cametoid, Ltd., Canada. A system is reported which

incorporates the design, refinement, and control of inhomo-

geneous optical coatings. An inhomogeneous single-layerhigh-efficiency antireflection coating for germanium is

shown, (p. 150)

8:25 PM

TuF10 Fabrication of Rugate Filters Using the Digital Tech¬

nique, R. L. Hall, William H. Southwell, W. J. Gunning, Rock¬well International Science Center. We discuss the fabrica¬

tion of rugate filters using the thin-layer equivalence ordigital technique. This technique uses very thin high- andlow-index layers to generate an effective index profile,

(p. 154)


8:30 PM-10:00 PM

CONTRIBUTED PAPER DISCUSSION/REFRESHMENTS

VIGAS ROOM


PALM ROOM



8:30 AM-9:00 AM

WA, OPTICAL PROPERTIES OF THIN FILMS: 1

Joseph H. Apfel, Optical Coating Laboratory, Inc.Paul Lissberger, Queen's University of Belfast, U.K.,Copresiders

8:30 AM (Invited Paper)WA1 Inhomogeneous Layers Revisited, F. Abeles, U. Pierreet Marie Curie, France. We examine cermets (metal-dielec¬tric mixtures) which in many respects behave like homo¬

geneous effective media, and stratified inhomogeneousmedia characterized by a dielectric function L(z). (p. 160)

9:00 AM-10:00 AM

WB, APPLICATIONS REVIEW: 2Joseph H. Apfel, Optical Coating Laboratory, Inc.Paul Lissberger, Queen's University of Belfast, U.K.

Copresiders

9:00 AM (Invited Paper)WB1 Research on Thin Film Anticounterfeiting Coatings atthe NRCC, J. A. Dobrowolski, F. C. Ho, A. Waldorf, NationalResearch Council of Canada. Work on coating materials,

deposition processes and equipment, and on multilayerssuitable for the construction of optical anticounterfeitingcoatings are discussed, (p. 162)

9:30 AM (Invited Paper)WB2 Coatings in the Infrared, Yi-Hsun Yen, Shanghai In¬stitute of Technical Physics, China, (p. 163)

CANYON ROOM

10:00 AM-12:15 PM SPECIAL EXHIBITION SESSION/

REFRESHMENTS

ix

WEDNESDAY, APRIL 13, WW—Continued WEDNESDAY, APRIL 13,1988—Continued

CANYON ROOM

10:00 AM-5:30 PM EXHIBITION

PALM & GOLD ROOMS



1:15 PM-3:45 PM

WC, OPTICAL PROPERTIES OF THIN FILMS: 2

Karl H. Guenther, University of Central Florida

Roger P. Netterfield, CSIRO Division of Applied Physics,Copresiders

1:15 PM (Invited Paper)WC1 Spectroellipsometry of Thin Films, D. E. Aspnes, BellCommunications Research. Thicknesses, compositions,microstructures, and densities are among the properties that

can be nondestructively determined from spectroellipsom¬

etry data on thin films. The current status is reviewed,

(p. 166)

1:45 PM (Invited Paper)WC2 Optical Characterization of Thin Films by GuidedWaves, E. Pelletier, Ecole Nationale Superieure de Physiquede Marseille, France. The study of guided waves in a thin

layer allows a precise characterization of refractive index

and thickness. Optical anisotropy can also be measured. Weshow how this technique can be used in the characterization

of a multilayer structure, (p. 170)

2:15 PM

WC3 Refractive-Index Determination Using an Orthogonal-ized Dispersion Equation, C. K. Carniglia, K. N. Schrader, P.A. O'Connell, S. R. Tuenge, Martin Marietta AstronauticsGroup. An orthogonal form of the Cauchy dispersion equa¬tion is useful in reducing spectroscopic ellipsometry data to

determine the refractive index of single-layer films,

(p. 174)

2:20 PM

WC4 Theoretical Models of the Relationship Between N

and P for Thin Films, Xue-Ren Wang, Harbin U. Science &

Technology, China; Xiu-Lin Zhou, South-West Technical

Physics Institute, China. A discussion of the theoretical rela¬tionship between refractive index and packing density for di¬

electric films deposited with ion assistance is given, (p. 178)

2:25 PM

WC5 Analytical Determination of the Complex RefractiveIndex of an Opaque Film Deposited on a Transparent Sub¬strate from the Pseudo-Brewster Angles of Internal and Ex¬ternal Reflection, Rasheed M. A. Azzam, U. New Orleans atLakefront. A new method is described for the explicit deter¬mination of the refractive index and extinction coefficient of

an opaque film deposited on a transparent substrate from

purely angular, nonpolarimetric measurements. Simulatedmeasurements on Ag and TiN films are presented to demon¬strate the method, (p. 182)

2:30 PM

WC6 Determination of Optical Constants by Angle Scann¬ing Reflectometry, Merritt N. Deeter, Dror Sarid, U. Arizona.Reflectance measurements on metal films are curve-fitted to

extract the metal's optical constants. Problems with over-layers are avoided by making the measurements through thesubstrate, (p. 183)

2:35 PM

WC7 Spectrophotometer Design for the Characterizationof Interference Coatings, Peter C. LaDelfe, D. B. Stahl, LosAlamos National Laboratory. The design of a spectropho¬tometer allowing accurate, direct measurement of transmit-tance and reflectance of coated components at arbitraryangles of incidence is discussed, (p. 187)

2:40 PM

WC8 Optical Characterization of Small Samples, Robert F.Edgerton, Pontiac, Ml. When samples are smaller than about

1 mm, traditional optical instruments such as spectrometersare not suitable as designed. An arrangement of optical

components has been developed that makes optical meas¬urements on samples comparable in size to the slit width of

the monochromator. (p. 191)

2:45 PM

WC9 Determination of the Extinction Coefficient of Dielec¬

tric Thin Films from Spectrophotometric Measurements, J.P. Borgogno, E. Pelletier, Ecole Nationale Superieure dePhysique de Marseille, France. Data obtained from reflec¬

tance and transmittance measurements are used to de¬

termine the extinction coefficient. We show that the ac¬

curacy is limited by the substrate quality and by the interfaceroughnesses of the layer, (p. 195)

2:50 PM

WC10 Determination of the Refractive Index and Thick¬

ness of a Thin Film Embedded in a Given Stratified Medium,G. Chabrier, J. P. Goudonnet, P. Vernier, U. Dijon, France. We

present a graphical method to discuss thin film characteriza¬tion by transmittance and reflectance measurements. Appli¬cation is made to very thin metallic films or dielectric films

(SiOx). (p. 199)

X

WEDNESDAY, APRIL 13,1988—Continued

2:55 PM

WC11 Determination of Principal Refractive Indices of Bi-

refringent Thin Films, F. Horowitz, H. A. Macleod, U. Arizona.A method for the characterization of an anisotropic dielectric

film with explicit consideration of its microstructure is con¬sidered. This is applied to an obliquely deposited zirconiumoxide film, and the results show good agreement with thosefrom a simple structural model, (p. 203)

3:00 PM

WC12 Method of Determining Optical Constants of ThinFilms Using an Infrared Ellipsometer, Y. Yen, K. Q. Zhang,

Shanghai Institute of Technical Physics, China. Optical con¬stants of weakly absorbed coatings of PbTe and Ge are de¬termined by IR ellipsometry combined with other measure¬ments, (p. 207)

3:05 PM

WC13 Ellipsometric Determination of the Optical Con¬stants of Gold and Anisotropic Bismuth in the Form of ThinFilms, R. Atkinson, P. H. Lissberger, L. A. S. Vallely, Queen's

U. Belfast, U.K. Optical constants of thin film gold and bis¬muth measured by ellipsometer over the visible spectrum arepresented with emphasis on the anisotropy of bismuth,(p. 210)

3:10 PM

WC14 Spectroscopic Ellipsometric Characterization of

Ti02/Ag/Ti02 Optical Coatings, K. Memarzadeh, J. A.Woollam, U. Nebraska; A. Belkind, BOC Group TechnicalCenter. The optical constants (300-400 nm) and layer thick¬nesses in a glass/Ti02/Ag/Ti02 system were determined us¬

ing spectroscopic ellipsometry. Spectral characteristics, ab¬sent in bulk silver data, were observed in (n,k) of the thin

silver layer (-100 A), (p. 211)

3:15 PM

WC15 Reality and Limits of Spectroscopic Ellipsometry, J.L. Stehle, F. Bernoux, O. Thomas, SOPRA, France. Thin filmsin various optical coatings have been characterized by aspectral ellipsometer that is described, and results are pre¬sented in terms of thickness and void fraction, (p. 215)

3:20 PM

WC16 Ellipsometric Measurement of Transverse Kerr Mag-netooptic Effects, V. W. Biricik, F. R. Nakatsukasa, NorthropResearch & Technology Center. A magneto-optic ellipsom¬eter has been developed for the accurate measurement of

the transverse Kerr effect in thin films. Magneto-optic con¬stants of ion beam sputtered films are measured and com¬pared with data in the literature, (p. 216)

WEDNESDAY, APRIL 13,1988—Continued

3:25 PM

WC17 Optical Constant Determination of MagnetoopticalThin Films Using the Surface Plasmon Resonance Phenom¬enon, Y. Mao, H. A. Macleod, K. Balasubramanian, U.

Arizona. We developed a method to measurethe optical con¬stants using the surface plasmon resonance phenomenon,which is based on the high sensitivity of that resonance tothe optical constants. Computer simulation has shown thatthe precision of optical constant measurement could be asgood as ±0.001. We present measurements made on TbFefilms deposited by rf sputtering, (p. 220)

3:30 PM

WC18 Optical Characterization of a Silver Film in the Pres¬ence of a Dielectric Layer Using the ATR Technique, L. E.Regalado, I. Cruz-Encinas, U. Sonora, Mexico. Study of thesystem Ag + MgF2 using attenuated total reflection allowsthe simultaneous determination of both dielectric and

metallic films. To do so, one must deposit two thicknessesof MgF2 on Ag, the second being the double of the first.Analytical and experimental results are presented, (p. 224)

3:35 PM

WC19 Studies of Optical Properties of Extremely ThinFilms Using ATR Techniques, Jing-Jiang Xu, Jin-Fa Tang,Zhejiang U., China. Optical properties of extremely thinmetallic and dielectric films have been measured by ATRmethods. Efforts have been made to understand the anom¬

alous behavior, (p. 225)

3:40 PM

WC20 Determination of the Optical Constants and Thick¬nesses of Thin Films by Measurement of Surface PlasmonResonances, F. S. Zhang, H. A. Macleod, R. A. Wang, M. R.Jacobson, U. Arizona. Surface plasmon resonances inmetallic and dielectric thin films can be measured to deter¬mine their optical constants and thicknesses. Some opticalconstants and thicknesses for Ag, Al, Cu, Ta205, Zr02, andSi02 films are presented, (p. 229)


3:45 PM-5:15 PM


REFRESHMENTS WITH SNACK

DESERT SITE

6:30 PM-9:30 PM CONFERENCE BANQUET

xi

THURSDAY, APRIL 14, 1988

VIGAS ROOM


PALM ROOM



8:30 AM-9:00 AM

ThA, APPLICATIONS REVIEW: 3Florin Abeles, Universite Pierre et Marie Curie, FranceIan J. Hodgkinson,, University of Otago, Copresiders

8:30 AM (Invited Paper)ThA1 Infrared Coatings, Hermann R. Dobler, Carl Zeiss,F. R. Germany. The main uses for IR coatings are in thermalimagers and laser systems. Some special topics concerningIRCs are discussed: substrates, coating materials, design,technology, and optical measurements, (p. 234)

9:00 AM-10:50 AM

ThB, DEPOSITION TECHNIQUES: 1

Florin Abeles, Universite Pierre et Marie Curie, France

Ian J. Hodgkinson, University of Otago, Copresiders

9:00 AM (Invited Paper)ThB1 Deposition of Optical Coatings by Molecular Beam

Techniques and Their Characterization, K. L. Lewis, I. T.Muirhead, A. M. Pitt, A. G. Cullis, N. G. Chew, A. Miller, T. J.

Wyatt-Davies, Royal Signals & Radar Establishment, U.K.Molecular beam techniques can be used to fabricate opticalcoatings with improved characteristics including high stabil¬ity, laser damage threshold, controlled microstructure, andsynthesized refractive index, (p. 240)

9:30 AMThB2 Molecular-Beam-Deposited Bistable Interference Fil¬ters, I. T. Muirhead, OCLI, U.K.; A. Miller, K. L. Lewis, J.Staromlynska, K. Welford, Royal Signals & Radar Establish¬ment, U.K. Optical bistability in molecular-beam-depositedfilters is reported, with assessment of key parameters atkrypton laserwavelengths, including switching powers, long-term stability and film microstructure. (p. 244)

9:35 AM

ThB3 Improved Oxide Coatings by Reactive Ion PlatingDeposition, Karl H. Guenther, U. Central Florida. Oxide coat¬

ings deposited by reactive ion plating show amorphousmicrostructure, surface roughness of 0.2 nm rms, and higherlaser-induced damage threshold, (p. 247)

THURSDAY, APRIL 14,1988—Continued

9:40 AM

ThB4 Ion Plating of Silicon Nitride Optical Thin Films, Ber-trand G. Bovard, U. Arizona; Jurgen Ramm, Ralf Hora, Fritz

Hanselmann, Balzers AG, Liechtenstein. Silicon nitride op¬tical films have been successfully synthesized in a Balzers800 coating system. Optical properties, stoichiometry, andhydrogen content are presented, (p. 251)

9:45 AM

ThB5 Reactive Plasma Plating of Multilayer Coatings, R. I.Seddon, M. D. Temple, R. E. Klinger, T. Tuttle Hart, Paul M.LeFebvre, OCLI. A standard box coater has been modified to

produce plasma-plated oxide films similar to those of Pulkeret al. The interaction between the plasma and the coating

process is described and the characteristics of the resultingsingle and multilayer films are analyzed, (p. 255)

9:50 AM

ThB6 Complex-Grid Ion Source and lon-Beam-AssistedDeposition of Thin Films, Xing-Yi Chen, Tianjin Electro-op¬tical Research Institute, China. The construction and opera¬tion of a complex-grid ion source is designed and described.Some effects on the properties of electrobeam evaporatedthin films produced by ion bombardment of the growingfilms are reported, (p. 259)

9:55 AM

ThB7 Effect of Oxygen Incorporation on the Structure oflon-Beam-Assisted Metal Fluoride Thin Films, James D. Tar-

gove, Air Force Institute of Technology; Linda J. Lingg, JohnP. Lehan, H. A. Macleod, U. Arizona. The nature of oxygen in¬

corporation into ion-beam-assisted metal fluoride films is ad¬

dressed, with an oxyfluoride phase observed in several lan-thanide fluoride materials, (p. 264)

10:00 AM

ThB8 Verification of Momentum Transfer as the Dominant

Densifying Mechanism in Ion-Assisted Deposition, James D.Targove, Air Force Institute of Technology; Linda J. Lingg, H.A. Macleod, U. Arizona. Measurements of ion-beam-assisted

lanthanum fluoride films bombarded with neon, argon, and

krypton ions indicate that momentum transfer is responsiblefor film densification. (p. 268)

10:05 AM

ThB9 Ion-Assisted Deposition of Thermally Evaporated AgFilms, C. K. Hwangbo, Linda J. Lingg, John P. Lehan, M. R.

Jacobson, H. A. Macleod, J. L. Makous, U. Arizona; S. Y. Kim,Pennsylvania State U. The effects of Ar-ion bombardment on

thermally evaporated Ag thin films were investigated; effectson optical, electrical, and structural properties are presentedin terms of the momentum flux density supplied to the filmby the bombarding ions. (p. 272)

xii

THURSDAY, APRIL 14,1988— Continued THURSDAY, APRIL 14, 1988— Continued

10:10 AM

ThB10 Effect of Ion-Assisted Deposition on the Crystallin-ity of Samarium Fluoride Films, Linda J. Lingg, C. K. Hwang-bo, B. G. Bovard, John P. Lehan, H. A. Macleod, U. Arizona.

We examine the influence of ion-assisted deposition and

deposition temperature on single layer coatings of SmF3.The samarium cation is both divalent and trivalent and the

trif luoride has two possible crystalline structures: hexagonaland orthorhombic. As a result, the two variations on deposi¬tion technique produce films of very different crystal struc¬ture and orientation, (p. 276)

10:15 AM

THB11 Comparison Between Classical and Ion-Assisted-

Deposited Ti02 Layers for Optical Coatings, M. Lottiaux, C.Boulesteix, F. Varnier, F. Flory, U. Marseille, France; E.

Pelletier, Ecole Nationale Superieure de Physique de

Marseille, France. Electron microscopy shows that the ob¬

served microstructure of titania films produced by ion-

assisted deposition strongly differs from that of films pro¬duced by classical evaporation, (p. 280)

10:20 AM

ThB12 Intermittent Ion-Assisted Deposition of Silica andTitania, M. Kaspar, R. Pfefferkorn, Bakers, AG, Liechten¬

stein. It is demonstrated that with intermittent ion bombard¬

ment similar results can be achieved for single films as re¬

ported for continuous IAD. (p. 281)

10:25 AM

ThB13 Surface Optical Coatings by lon-Assisted-Deposi-tion Techniques: Study of Uniformity, F. Flory, E. Pelletier, G.

Albrand, Ecole Nationale Superieure de Physique de

Marseille, France. Uniformity of layers produced by ion-

assisted deposition strongly depends on the characteristicsof the ion beam. Optical characterization is made by guidedwave measurements, (p. 284)

10:30 AM

ThB14 Effect of Ion-Assisted Deposition on Transition

Properties of Vanadium Dioxide Thin Films, Liying Han, Jian-cun Gao, Tsinghua U., China. The influence of different

deposition process conditions on the phase transition char¬acteristics of vanadium dioxide thin films has been inves¬

tigated and is described, (p. 287)

10:35 AM

ThB15 Optical Characteristics of Oxide Materials Depos¬ited at Low Temperature and High Temperature Using Ion-Assisted Deposition, Forrest L. Williams, L. L. Boyer, J. R.McNeil, U. New Mexico; J. J. McNally, U.S. Air Force

Academy. Ion-assisted deposition has been applied to oxidethin film materials: Ti02, Al203, Ta2Os, and Si02. In mostcases, film optical and mechanical properties are improved,(p. 290)

10:40 AM

ThB16 lon-Beam-Sputtered Magnesium Fluoride, ThomasH. Allen, OCLI; John P. Lehan, L. C. Mclntyre, Jr., U. Arizona.

We report on the composition, optical and mechanical prop¬erties of ion-beam-sputter deposited films of magnesiumfluoride. The refractive index, stress, and microstructure of

the films are also discussed, (p. 293)

10:45 AM

ThB17 Ultralow Loss Optical Interference Coating by Ion-Beam Sputtering, David T. Wei, Xerox Corporation, lon-beam-

sputtered interference coatings have extremely low scatter¬ing and absorption losses. Principle, method, analyses and

results are presented. Uses and improvements are explored,(p. 294)

CANYON ROOM

10:30 AM-&00 PM EXHIBITION


10:50 AM-12:20 PM


REFRESHMENTS

PALM & GOLD ROOMS



1:20 PM-1:50 PM

ThC, APPLICATIONS REVIEW: 4

William H. Southwell, Rockwell InternationalScience CenterJ. F. Tang, Zhejiang University, Copresiders

1:20 PM (Invited Paper)ThC1 Coatings for Ophthalmic Lenses, A. Colonna deLega, Essilor International, France. The several functions ofophthalmic coatings, their requirements, and the difficulties

they pose are discussed. Production technology is describedand some specific industrial examples presented, (p. 300)

xiii

THURSDAY, APRIL 14,1988—Continued


1:50 PM-3:10 PM

ThD, DEPOSITION TECHNIQUES: 2

William H. Southwell, Rockwell International Science Center

J. F. Tang, Zhejiang University, Copresiders

1:50 PM (Invited Paper)ThD1 Diamond Films — Optical Characterization and Ap¬plications, Russell Messier, K. Vedam, Y. Cong, W. A. Yar-brough, P. K. Bachmann, Pennsylvania State U. We will dis¬

cuss the range of materials (nominally called diamond) wehave prepared to date in relation to their crystal morphology,Raman spectra, optical scattering, and spectroscopic ellips-ometric modeling. This latter technique will be described in

detail since it gives quantitative information on second

phases in the bulk and potentially at the substrate/film inter¬face and also on the surface roughness. Potential applica¬tions and problems of diamond coatings for optics will be

discussed, (p. 304)

2:20 PM

ThD2 Stress Reduction in lon-Beam-Sputtered Films, B. J.

Pond, J. I. DeBar, C. K. Carniglia, T. Raj, Martin MariettaAstronautics Group. Films made by ion-beam-sputter depo¬sition have a high compressive stress. We present results onthe modification of stress by cosputtering two materials,

(p. 308)

2:25 PM

ThD3 Sputtering of Metal Oxides with an rf-lon Source, In-

go Kessler, Jurgen Muller, Leybold AG, F. R. Germany. Ti02,Si02, and Al203 layers were prepared by secondary ion-beam

sputtering using an inductively excited rf ion source. Opticaland mechanical properties of the layers are discussed.

(P. 311)

2:30 PM

ThD4 Transparent Conducting Indium-Doped ZnO Films bydc Reactive Magnetron Sputtering, Zhi-Zheng Ye, Jin-Fa

Tang, Zhejiang U., China. Indium-doped ZnO films withaverage transmittance >80% and electrical resistivity of

1.08 x 10E"3 ficm were produced using simple dc reactive

S-gun magnetron sputtering, (p. 313)

2:35 PM

ThD5 Experimental Study of Substrate Temperature, Yi-

Hsun Yen, Jian-Xin Shao, Pei-Zhong Xu, Shanghai Instituteof Technical Physics, China. Distribution of substrate tem¬

perature during deposition has been measured and calcu¬lated. Two kinds of heating method are compared, (p. 317)

2:40 PM

ThD6 Evaporative Property of Zr02-Ti02) Shuming Pang,Nanjing Institute of Technology, China. The evaporativeproperty of Zr02-Ti02 has been studied. The gradient-indexfilm can be obtained using a certain ratio of the mixture,

(p. 321)

THURSDAY, APRIL 14,1988— Continued

2:45 PM

ThD7 Deposition of Optical Thin Films by Pulsed Laser-

Assisted Evaporation, H. Sankur, W. Gunning, Rockwell In¬ternational Science Center. Thin films of ZrOz, Ti02, Ce02,Ta205, Hf02, and Ge were deposited by pulsed laser-assistedevaporation. The films had crystalline structure and good op¬tical properties, (p. 325)

2:50 PM

ThD8 Improvement of Abrasion Resistance of Si02/Ti02Multilayer Interference Filters, Yasunori Taga, Tadayoshi

Itoh, Toyota Central Research & Development Laboratories,

Inc., Japan. Attempts have been made to improve the abra¬sion resistance of a multilayer infrared reflection filter ofSiO/Ti02 stacks by forming Al203 layers at the interfaces,

(p. 328)

2:55 PM

ThD9 Optical Properties of Coatings Prepared from Laser-Fused Refractory Oxide Mixtures, Swarnalatha Mallavarapu,Alan F. Stewart, Arthur H. Guenther, Air Force Weapons Lab¬

oratory; Talak Raj, C. K. Carniglia, Martin Marietta Astro¬nautics Group. Mixtures of zirconia, hafnia, and yttria pow¬ders were fused using a C02 laser. Optical, chemical, andstructural properties of films deposited from these mixtureswere studied, (p. 332)

3:00 PM

ThD10 Antireflective Coatings on Very Large Substrates bythe Dip Coating Process, Eckart K. Hussmann, Nanning J.

Arfsten, Hans-Ulrich Heusler, Peter H. Roehlen, Hermann J.

Piehlke, Schott Glaswerke, F. R. Germany. The inherent prop¬erties of the dip coating process were used to produce uni¬form antireflective layer systems on both sides of large sub¬

strates, (p. 335)

3:05 PM

ThD11 Stability of Dielectric Multilayer Coatings Producedby Different Coating Technologies, R. Hermann, R. Goetzel-

mann, R. Schneider, Leybold Heraeus AG, F. R. Germany.The vacuum to air shift of all-dielectric filters produced by rf-

magnetron sputtering, e-beam evaporation, and ion-assisteddeposition is investigated and related to process technologyand process parameters, (p. 339)

xiv

THURSDAY, APRIL 14,1988—Continued THURSDAY, APRIL 14,1988—Continued


3:10 PM-3:25 PM

ThE, UNIFORMITY

William H. Southwell, Rockwell International Science CenterJ. F. Tang, Zhejiang University, Copresiders

3:10 PM

ThE1 Layer Uniformity Obtained by Vacuum Evaporation:Use in Fabry-Perot Filters, C. Grezes-Besset, R. Richier, E.Pelletier, Ecole Nationale Superieure de Physique deMarseille, France. We show how we can accurately measurethe uniformity of layer thickness for different materials ob¬tained by vacuum deposition. Generalization to multilayerstacks raises many difficulties due to time dependence ofevaporant distribution, (p. 342)

3:15 PM

ThE2 Large Area Coatings with Uniform Thickness Fabri¬cated in a Small Vacuum Chamber, C. J. Hayden, U.Rochester; E. Spiller, IBM Watson Research Center. Thin filmthickness uniformity can be improved by allowing atomsreflected from the chamber walls to contribute to the deposi¬tion. A 25-cm diam multilayer x-ray mirror with ±0.3% layerthickness uniformity was fabricated, (p. 345)

3:20 PM

ThE3 Thickness Distribution of Evaporated Films, AnthonyMusset, Ian Stevenson, Denton Vacuum, Inc. Experimentaldata were used to determine the evaporation source charac¬teristics in a coating chamber and thereby predict the thick¬ness distribution on coated substrates, (p. 349)


3:30 PM-&00 PMCONTRIBUTED PAPER DISCUSSION SESSION/REFRESHMENTS WITH SNACK

5:00 PM-8:00 PM DINNER BREAK


8:00 PM-9:00 PM

INTERFERENCE EFFECTS IN NATUREAlfred Thelen, Leybold Heraeus GmbH

3:25 PM-3:30 PM

ThF, SUBSTRATE FABRICATIONWilliam H. Southwell, Rockwell International Science CenterJ. F. Tang, Zhejiang University, Copresiders

3:25 PM

ThF1 Neutral Ion Beams in Optical Substrate Fabrication,S. R. Wilson, J. R. McNeil, U. New Mexico. The use of neutralion beams in the fabrication of optical surfaces is described.Ion beam and materials issues are discussed and experi¬mental results are presented, (p. 354)

XV

FRIDAY, APRIL 15, 1988 FRIDAY, APRIL 15, WW—Continued

VIGAS ROOM

7:30 AM-12:00 M REGISTRATION/SPEAKER CHECKIN

PALM ROOM



8:30 AM-10-.45 AM

FA, THIN FILM DESIGN

Ursula J. Gibson, University of Arizona

Anthony Musset, Denton Vacuum, Inc., Copresiders

8:30 AM (Invited Paper)FA1 Antireflection Coating Design: an Efficient Coating forGermanium in the 7.5-12.5-/un Region, I. Lubezky, I. Sza-franek, Rafael, Israel. An efficient four-layer AR coating wasdesigned for germanium for the7.5-12.5-^m region using Ge,ZnS and YF3. The results are explained in terms of the effec¬tive interface theory, (p. 360)

9:00 AM (Invited Paper)FA2 Uses for Equivalent Layers in Multilayer Design, PhilipBaumeister, Coherent, Inc. Equivalent layers, consisting ofsymmetrical groups of nonabsorbing films, are used in the

design of antireflection coatings, bandpass filters, heat re¬

flectors, and nonpolarizing beamdividers. (p. 364)

9:30 AM

FA3 Filter Design Considerations for the Visual Infrared

Mapping Spectrometer of NASA's Mars Observer Mission,Nasrat A. Raouf, James Duval, Jet Propulsion Laboratory.The design, fabrication and testing of nine pass-band filtersdeposited on two substrates to cover the 0.30 to 5.54-/imrange are considered. These filters are used to separate dif¬

ferent reflected orders of a diffraction grating, (p. 368)

9:35 AM

FA4 Three Layer Approximation of Thin Film Systems, T.

Skettrup, Technical U. Denmark. An arbitrary stack of thin

layers represented by the four elements of its characteristicmatrix is replaced by a three layer combination of two ma¬terials. Expressions are derived for three different thick¬

nesses of the layers, (p. 369)

9:40 AM

FA5 Cuton and Cutoff Edge Slopes of All-Dielectric CavityFilters, Margaret Kohin, Itek Optical Systems. Methods for

calculating the edge slopes of cavity filters are presented.Equations used to design three-cavity Chebyshev-type filtersare derived, (p. 373)

9:45 AMFA6 Use of a Characteristic Admittance for the Analysis ofMultilayer Films, Roger J. Becker, U. Dayton. A characteristic

admittance may be defined for a periodic section of an in-

homogeneous film and can be used for exact, compactdescriptions of film performance, (p. 377)

9:50 AM

FA7 Design of a Nonpolarizing Prism Beam Splitter, LinYong Chang, Sun Hsiao Mo, Beijing Institute of Technology,China. We discuss the design of a nonpolarizing prism beam

splitter in the broad visible spectral region at 45° incidenceand describe the design steps of a dielectric-metal-dielec¬tric three-layer film system. We also present some design re¬sults, (p. 381)

9:55 AM

FA8 Modified MacNeille Cube Polarizer for a Wide AngularField, J. Mouchart, J. Begel, E. Duda, Laboratoires de Mar-

coussis, France. With very simple optical considerations, we

design suitable coating structures that allow one to usecube polarizers in a wide angular field, typically ± 10° in air,when Tp > 0.97 and 7S < 10~3. However the spectral range isreduced, (p. 385)

10:00 AM

FA9 Theory, Design, and Preparation of Metal-DielectricNarrowband Spectral Filter Coatings Operating in Reflec¬tion, R. Gamble, P. H. Lissberger, Queen's U. Belfast, U.K.The theory, design, preparation, and photometry of narrow¬band metal-dielectric filter coatings operating in reflectionat wavelengths 1250-1600 nm are presented, (p. 386)

10:05 AM

FA10 General Synthesis with Layers of Equal OpticalThickness, Alfred Thelen, Leybold Heraeus GmbH, F. R. Ger¬many. Alter fitting a polynomial to a desired reflectance

function, Riblet's procedure is used to calculate the refrac¬tive indices from the coefficients of the polynomial, (p. 387)

10:10 AM

FA11 Design of High Rejection Filters by the InverseFourier Transform Method, P. G. Verly, J. A. Dobrowolski, Na¬tional Research Council of Canada; W. J. Wild, R. L. Burton,IIT Research Institute. Modifications to the method are de¬

scribed which permit the design of narrowband high rejec¬tion filters with minimum transmittances as low as 10~".

(p. 391)

10:15 AM

FA12 Merit Functions for More Effective Thin Film Calcula¬

tions, J. A. Dobrowolski, F. C. Ho, National Research Councilof Canada; A. Delkind, V. A. Koss, The BOC Group. Integralmerit functions facilitate the design of multilayers with pro¬perties that are complicated functions of the spectraltransmittance or reflectance. Numerical examples are given,(p. 395)

xvi

FRIDAY, APRIL 15,1988—Continued

10:20 AM

FA13 Experiments in Thin Film Optimization Procedures,Fred Goldstein, FTG Software Associates. Damped least

squares (DLS) and simplex refinement techniques are used

in optical multilayer design problems of varying complexity.DLS is more powerful and much faster, (p. 398)

10:25 AM

FA14 Design and Optimization of Optical Coatings by Sim¬ulated Annealing, B. Tirri, J. Danek, A. Turner, D. Zwieg,Perkin-Elmer Corporation. Simulated annealing is a statis¬tical optimization method for finding the global minimum ofa multivariable function. Design examples which demon¬

strate the discriminatory nature of this approach are shown,

(p. 402)

10:30 AM

FA15 Phase Shifting Thin Film Multilayers for MichelsonInterferometers, Susan H. C. Piotrowski, Gordon G.

Shephard, York U., Canada; J. A. Dobrowolski, National Re¬

search Council of Canada. Four high reflectance metal/di¬electric thin film multilayers were produced with phase

changes on reflection that differ by 900 over a range of wave¬

lengths, (p. 403)

10:35 AM

FA16 Optical Coatings with Radially Variable Reflectance,A. Piegari, G. Emiliani, ENEA, Italy. Multilayer coatings with

specified reflectance radial profiles have been designed andproduced by sputtering deposition of dielectric films. Their

employment in laser resonators is examined, (p. 406)

10:40 AM

FA17 Spectral Characteristics of an Optical Filter due toChanges at the Air-Film Interface, W. E. Johnson, Air Force

Wright Aeronautical Laboratories; J. E. Davison, U. DaytonResearch Institute. Both calculations and experiments showthat dramatic spectral changes occur in an interference filter

as a function of removing fractional film thicknesses at theair-film interface, (p. 409)

10:45 AM-10:50 AM

CLOSING REMARKS

H. Angus Macleod, University of Arizona


10:50 AM-12:20 PMCONTRIBUTED PAPER DISCUSSION SESSION/

REFRESHMENTS

PALM & GOLD ROOMS


1988 technical digest series, volume6tua5 characterization of vanadium oxide optical thin films by...

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