1 panel discussion on v&v/uq n. r. aluru. 2 v&v challenges approach: identify key phenomena...
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Panel Discussion on V&V/UQ
N. R. Aluru
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V&V Challenges
Approach: Identify key phenomena and rank their importance; Verification using tier-1 (single physics), tier-2 (coupled physics), and tier-3 (system level)Challenges: Lack of modules/codes/analytical expressions for some physical phenomena; Verification can be challenging for tier-2 and tier-3
Verification
Approach: Identify key phenomena and rank their importance; Validation using tier-1 (single physics), tier-2 (coupled physics), and tier-3 (system level); Use experimental data from literature, Sandia and in-house experiments Challenges: Lack of data for some physical phenomena; Validation can be challenging for many examples
Validation
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UQ ChallengesQuestions:What input uncertainties are the most important?How does uncertainty in microstructure affect macroscopic membrane response? Uncertainty in dimensions?How does uncertainty in microstructure propagate into the force-history response and thus into structural response?
Criterion for success: Comparison to uncertainty experiments
Challenges: Propagating uncertainty across scales and physics, computational size and cost, careful control of number of uncertain variables Young’s modulus for polysilicon as
measured by various research group over the years [J. V. Clark, Ph.D. thesis, 2005].
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Verification Techniques Structural-Thermal-ElectrostaticsStructural-Thermal-Electrostatics
Coupling Coupling Tier III ExampleTier III Example
FVM + MPM Solver:domain discretization; solution
algorithms; time-marching
ANSYS:domain discretization; solution
algorithm; time-marching
Verification:Define criteria
structureAssumptionsa. specified geometry;b. specified boundary conditions;c. specified applied voltaged. linear elastic materiale. heat generation in metal
Electrostaticfield
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Validation Techniques
Phenomena Source of Validation Data
Tier 3 (System-Level Validation)
1. Electro-mechanical response with dielectric charging and environmental effects
2. Shock response
3. Materials characterization and surface roughness evolution
1. Purdue experiments with actual RF MEMS in the range of 25-125C and different humidity levels
2. Purdue experiments on actual RF MEMS structures for a range of accelerations and temperatures from -55C to 75C.
3. Purdue experiments with TEM and AFM on evolution of grain size, orientation, defects, and surface roughness
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UQ Techniques
Generalized Polynomial Chaos
Stochastic Collocation Methods
+ Easy to implement
+ Minor changes to code
─ Not as efficient as Galerkin
─ Harder to implement
─ Significant changes to code
+ More efficient than collocation
Choice of inputs from collocation
Solver
Stochastic Galerkin Methods
Solver
Good solution for LAMMPS
Good starting point for other codes
Better for FVM / MPM codes
Optimization beyond collocation
realizations
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How we will use V&V and UQ to guide and set priorities for research activities
Identifying key phenomena and ranking their importance is largely driven by V&V and UQ
Sensitivity/UQ will determine what inputs are important to models – example: role of accomodation coefficients in rarefied gas damping
Modeled Phenomena Algorithm or Solver
Test Problems
Tier I (Individual)1. Drift diffusion charge transport
2. Atomistic-level computation of mechanics
FVM
MD/LAMMPS
Analytic solutions for drift -diffusion for known potential fieldComparison of wire/beam bending with in-house MD codes, GRASP
Tier II (Coupled)1. Electrostatics+linear mech. response2. Fluid-structure interaction
FVM+MPM
FVM+MPM
Published solutions (44 - 47)
Comparison with ADINA
Modeled Phenomena Importance Model Adequacy
Comments
1. Electrostatics High Adequate Large microelectronics literature and adequate data
2. Stiction:a. Roughness evolutionb. Capillary condensation
HighHigh
InadequateInadequate
Few detailed models or simulations for roughness evolution, condensation.
3. Electro-thermo-mech. response:
a. Linearb. Nonlinear
HighHigh
AdequateInadequate
Classical electro-mech. response well understood
Interaction of microstruct with continuum not well understood.
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Far-Reaching V&V/UQ Issues
Electrostatic pull-in in MEMS leads to discontinuities in the random domain; Need to develop efficient stochastic algorithms for non-smooth functions in the random domain
Explore easier ways of implementing UQ
New software paradigms for automating UQ implementation
Extensive experimental data is needed for UQ /Validation
Education, teaching and training new generation of students in V&V/UQ