1. basic corrosion

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    Basic corrosion

    (Oxidation & Aqueous)

    Prepared

    Nasrizal Mohd RashdiLecturer

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    Oxidation

    Direct atmospheric attack

    Generally metals and alloys form oxide

    compounds under expose to air at elevated

    temperature.

    Reactivity of metal with atmospheric oxygen

    (oxidation) is different.

    Some active and other passive

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    There are four mechanisms commonly identify

    with metal oxidation.

    (a) Unprotective porous oxide film

    Non porous film that are protective against O2

    (b) Cations diffuse

    (c) Anions diffuse

    (d) Both cations and anions diffuse

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    Unprotective porous film

    O2 can continuously pass and react at metal-oxide

    interface.

    O2Atmosphere

    Metal

    Oxide

    film

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    Non porous film (Protective againt O2

    permeation).

    Cations diffuse through the film reacting with

    oxygen at the outer surface.

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    Non porous film

    Which O2- ions diffuse in order to react with the

    metal at the metal-oxide interface.

    O2Atmosphere

    Metal

    Oxide film

    2O2-

    4e-

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    Non porous film

    Which both cations and O2- anions diffuse at

    roughly the same rate.

    Oxidation reaction occur within the oxide film

    rather than interface.

    O2Atmosphere

    Metal

    Oxide film

    2O2-

    Mn+

    (4 + n)e-

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    Mechanism

    For (b) (d)

    Metal-oxide interface

    M Mn+ + ne-

    Air-oxide interface

    O2 + 4e- 2O2-

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    Growth Rate

    Case (a) unprotective oxide

    Where yis the thickness of the oxide film, tthe

    time and C1 a constant.

    Integration of equation (1)

    1C

    dt

    dy (1)

    21ctcy (2)

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    Where c2 is a constant representing film

    thickness at t=0.

    This time dependence is appropriately termed

    a linear growth rate law.

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    y

    x

    cCO

    2

    y

    1

    dt

    dy12

    2

    ory

    J

    y

    cD

    x

    cDJ

    O

    O

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    For film growth that is limited by ionic

    diffusion, the growth rate diminishes as the

    film thickness grows. Growth rate;

    Where C3

    is constant different, from those in

    eq. 1 and 2. Integration gives

    54

    2ctcy (4)

    yc

    dt

    dy 13

    (3)

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    Where c4 and c5 are two additional constants.

    c4 = 2c3 , c5 is the square of the film thickness

    at t=0

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    Pilling-Bedworth

    The tendency of a metal to form a protective

    oxide coating is indicated by an especially

    simple parameter known as the pilling-

    Bedworth ratio, R, given as

    M is molecular weight of the oxide, D density of oxide

    m is a atomic weight of the metal, d density of metal

    amD

    MdR

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    For R1, the oxide tends to be

    protective.

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    Problem 1

    A nickel based alloy has a 100 nm thick oxide

    coating at time (t) equals zero, upon being

    placed in an oxidizing furnace at 600C. After

    1 hour, the coating has grown to 200 nm inthickness. What will be the thickness after 1

    day, assuming a parabolic growth rate law.

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    Problem 2

    Given that the density of Cu2O is 6.00Mg/m3 ,

    calculate the Pilling-Bedworth ratio for copper.

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    Aqueous

    Dissolution of a metal into an aqueous

    environment.

    The metal atoms dissolve as ions.

    A simple model of this aqueous corrosion is

    given in figure below.

    An electrochemical cell in which chemical

    change is accompanied by an electrical

    current.

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    Concentration cell

    Anode

    (corrosion)

    Cathode

    (electroplating)

    High Fe2+

    concentration

    Low Fe2+

    concentration

    Fe Fe

    Porous membrane

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    The metal bar on the left side of the

    electrochemical cell is an anode.

    Anode will dissolves or corrodes and supplies

    electrons to the external circuit.

    The anodic reaction as below;

    Fe Fe2+ + 2e-

    The reaction is driven by an attempt to

    equilibrate the ionic concentration.

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    The porous membrane allows the transport of

    Fe2+ ions between the two halves of the cell

    while maintaining a distinct difference in

    concentration level.

    A metal bar on the right side of

    electrochemical cell is a cathode.

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    Cathode accepts the electrons from the

    external circuit and neutralizes ion in a

    cathodic reaction;

    Fe2+ + 2e- Fe

    At cathode, metal builds up as opposed to

    dissolving.

    This process is known as electroplating.

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    An electrochemical cell consisting of iron and copper electrodes,

    each of which is immersed in a 1M solution of its ion. Iron corrodes

    while copper electrodeposits.

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    Pure iron immersed in a solution containing

    Fe2+ ions of 1M concentration.

    The other side of the cell consists of a pure

    copper electrode in a 1M solution of Cu2+ions.

    The cell halves are separated by a membrane,

    which limits the mixing of the two solutions.

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    If the iron and copper electrodes areconnected electrically, reduction will occur forcopper at the expense of the oxidation of iron,

    as follows:Cu2+ Fe Cu Fe2+

    Cu2+ ions will deposit (electrodeposit) as

    metallic copper on the copper electrode, Iron dissolves (corrodes) on the other side of

    the cell and goes into solution as Fe2+ ions.

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    Thus, the two half-cell reactions are

    represented by the relations

    Fe Fe2+ + 2e-

    Cu2+ 2e- Cu

    When a current passes through the external

    circuit, electrons generated from the oxidation

    of iron flow to the copper cell in order that

    Cu2+ be reduced.

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    The driving force for the overall cell is the

    relative tendency for each metal to ionize.

    The net flow of electrons from the iron bar to

    the copper bar is a result of the tendency of

    ionize.

    A voltage of 0.777 V is associated with the

    overall electrochemical process.

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