vertex system

8
“Ion angular distribution can now be measured at the substrate position” VERTEX | SYSTEM

Upload: impedans-ltd

Post on 25-Jun-2015

318 views

Category:

Technology


5 download

DESCRIPTION

The Vertex is a plasma characterisation instrument that measures the ion angular distribution of Ions arriving at a surface inside a plasma chamber. It can also measure ion energy, ion flux, negative ions, temperature and Vdc at a surface inside a plasma. The Vertex System is increasingly used in many applications in industry and research, such as plasma etching, ion beams, and plasma sputtering for plasma characterisation and plasma interaction analysis. The Vertex System saves the user valuable time in confirming models, developing new processes and in experiments that use plasma, plasma tool design and plasma research.

TRANSCRIPT

Page 1: Vertex System

“Ion angular distribution can now be measured at the substrate position”

VERTEX | SYSTEM

Page 2: Vertex System

VERTEX | SYSTEM

The Vertex Single Sensor is placed at any location inside a plasma reactor and measures

the ion angular distribution hitting a surface using a single

sensor.

The Vertex Multi Sensor also measures the uniformity of ion

angle distribution hitting a surface inside a plasma reactor

from multiple locations.

Page 3: Vertex System

VERTEX | SYSTEM

Plasma ParametersIon Angle Distribution

Ion Energy Distribution • Ion FluxNegative Ions • Temperature

Bias Voltage (Vdc)

Measurement FunctionalityTime Averaged • Time Resolved • Time Trend

SolutionsThe Vertex measures the angular distribution

of ions hitting a surface inside a plasma chamber. These plasma diagnostics help with

common issues such as:

Feature damageBeam divergenceElastic scattering

The system also measures the ion energy distribution and ion flux at each angular

distribution

Page 4: Vertex System

VERTEX | SYSTEM

Installation Setup

Vertex ElectronicsGenerator Match Plasma Reactor

Computer

Vertex Sensor

Page 5: Vertex System

VERTEX | SYSTEM

How It Works

The first grid prevents the plasma entering the analyser

The second grid is biased with a negative potential to repel any electrons

A third grid is biased with a positive potential sweep. This creates a potential barrier for the

positive ions

An aperture is located directly below the third grid which allows through ions of a specific angle

A second aperture is biased with a potential to modify its ion acceptance angle

A collector plate collects the current of ions which cross the potential barrier set by the third grid

Page 6: Vertex System

VERTEX | SYSTEM

Applications

The Vertex finds uses where ion angular distribution is of interest.

The Vertex System can be used in the following applications:Dusty Plasma

Plasma EtchingHiPIMS Plasma

Ion Beam PlasmaPECVD

Space PlasmaPlasma Sputtering

Page 7: Vertex System

VERTEX | SYSTEM

Applications

For further information on the Vertex System visitimpedans.com/vertex-sensor

To request a quote visitwww.impedans.com/contact

Page 8: Vertex System

Chase HouseCity Junction Business Park

Northern CrossMalahide Road

Dublin 17Ireland

Ph: +353 1 842 8826Fax: +353 1 891 6519

Web: www.impedans.comEmail: [email protected]