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Unique Microlithography Results Using Maskless Lithography Jay Sasserath, PhD Intelligent Micro Patterning LLC St. Petersburg, Florida, USA September, 2010

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Page 1: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Unique Microlithography Results Using Maskless Lithography

Jay Sasserath, PhDIntelligent Micro Patterning LLC

St. Petersburg, Florida, USASeptember, 2010

Page 2: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Agenda

• Maskless Lithography Technology• Greyscale Processing• 3D Lithography• Summary

Page 3: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Who is IMP?

• Exclusive Global License for Smart Filter Technology (DLP for Litho) from USF.

• Global HQ in St. Petersburg, FL• Formed in 2001• Privately Held

Page 4: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Intelligent Micro Patterning LLC Microlithography Systems

SF-100 XPRESSSF-100 XCEL

SF-100 XTREME SF-100 XTEND

Page 5: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Basic System Operation

•Pattern an Area With Each Exposure•Operation is Similar to Wafer

Stepper• 1024 x 768 Array (>750K

Pixels/Exposure)• 255 Levels of Greyscale is

Standard.

Page 6: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

SF-100 Maskless Lithography

Optics

BeamSplitter

Mercury Arc Lamp

Optics

Computer

Smart Filter

Substrate

Stage

Camera

Filter Wheel

Reduction Lens

Page 7: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Greyscale Lithography

Why Greyscale Lithography?1. Large, Controlled Resist Slopes2. Vary Resist Height Locally

% C

onve

rsio

n%

Con

vers

ion

EnergyEnergy

Page 8: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Greyscale Lithography

Mic

roM

irror

Beam Splitter

Substrate

White or “On”

Micr

oMirr

or

Beam Splitter

Substrate

Black or “Off”

Page 9: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Greyscale Lithography

• The Mask– Start with Design File (DXF, GDSII, CIF)– Convert to 24 bit BMP File

Page 10: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Greyscale Lithography

Page 11: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Greyscale Lithography

Why Smart Filter Technology (SFT) for Greyscale Lithography?

• Compare to Mask Aligners/Steppers:• Masks are Expensive ($8K each or more)• Light Uniformity over Entire Surface is Critical for

Slope/Height Control• SFT Allows for Individual Alignment of Substrate

• Compare to Laser Writers• SFT Much Faster (More Pronounced for Large

Features)• SFT Supports Thicker Resists, up to 1mm, with

Single Exposures

Page 12: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Non-Flat Surface Lithography

Collimated Light &Advanced Lens Design

Allows Projected ImagesTo Remain in Focus Over

Deep Topology in aSingle Exposure

QuickTime™ and a decompressor

are needed to see this picture.

QuickTime™ and a decompressor

are needed to see this picture.

Page 13: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Non-Flat Surface Lithography

Page 14: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Non-Flat Surface Lithography

Additional Integrated Stage forCylindrical Substrate Processing

Page 15: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Non-Flat Surface Lithography

…and the Optical Design Comes in Handy forDoing Thick Films too (200 um SU8 Above)

Page 16: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Non-Flat Surface Lithography

• Ping Pong Balls Aren’t the OnlyNon-Flat Substrates to be Patterned:– Thin Plastics Never Lie Flat– Cut AlTiC Maybe Bowed– Cover Traces Between Mechanical

Parts in Drive (ex. TFH and Suspension Assembly)

Page 17: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

Non-Flat Surface Lithography

Why Smart Filter Technology (SFT) for Non-Flat Lithography?

• Compare to Mask Aligners/Steppers:• Substrate Fixturing is Not Easy• Mask/Substrate Gap is Typically Only a Few

Millimeters• Fixed Microscope Objectives for Viewing Are

Suitable for Large Substrates.• Compare to Laser Writers

• SFT Much, Much, Much Faster• Static Substrate During Exposure Simplifies the

Process• Short Wavelength Lasers Don’t Support Topology

Page 18: Unique Microlithography Results Using Maskless LithographyPowerPoint Presentation Author Jay Sasserath Created Date 9/13/2010 10:24:30 AM

• Unique Maskless Lithography Technology is Proven for– Greyscale Applications– 3D and High Topology Samples.

• Feel Free to Contact Me at– Tel: 727-522-0334, x1– [email protected]

• Thank You for Your Attention!!!