semiconductor/ polymer integrated fabrication facility cleanroom
TRANSCRIPT
Semiconductor/PolymerIntegratedFabricationFacility
CLEANROOM
WHAT TO EXPECT(OUTLINE)
• Why a cleanroom?
• What is it?
• Facilities
• Procedures
WHY?• IT’S A DIRTY WORLD!
– UNCOUNTABLE PARTICLES IN AIR– ALL SIZES, SHAPES, PROPERTIES
• NANOTECH– SMALLLLLLL
– FRAGILE
WHATis a cleanroom?
• A room, enclosure, and or environment in which you move the air by way of supply and return locations to control the airborne particle levels and in some cases temperature and humidity. Courtesy of http://www.mcr-1.com/definitions.html
• A place where harmful junk is kept away from sensitive items or materials.
CLEANROOM CLASSIFICATION
Class limits [maximum allowable particles per cubic foot (SI/209) or meter (ISO)]
ISO SI Fed Std 209 0.1 micron 0.2 micron 0.3 micron 0.5 micron 5 micron
3 M 1 1 100 35 35 1
M 1.5 1 35 7 3 1 0
M 2 10 99.1 2.83 4 M 2.5 10 10,000 345 75 30 352 10 0
M 3 100 991 28.1
5 M 3.5 100 100,000 3,450 750 300 3520 100 0
6 M 4.5 1,000 1,000,000 34,500 N/A N/A 35,200 1,000 7
7 M 5.5 10,000 345,000 N/A N/A 352,000 10,000 70
8 M 6.5 100,000 3,450,000 N/A N/A 3,520,000 100,000 700
Courtesy of http://www.mcr-1.com/class.html
CLEANROOM FACILITIES
2003 July 15
Class 10,000 by airflow designUpgradable to Class 1,000Tested (empty) as Class 1,000 (~780 actual counts)
Mat
X-Ray 2
X-Ray 1OpticalTable
FileCab
SumpPump
Horizontal LaminarFlow Hood
Frig
Chille
r
Chiller
4 Feet
ChemicalCabinet
WeighStation
Shoes
ShoeBrush
FumeHood
ChemicalCabinet
ChemicalCabinet File Ca
bTe
chnic
ianDe
sk
Stairwell
ComputerDesk
ComputerDesk
Cabinet
MatMat
Work Bench
Work Bench
Wire
Bonde
r Benc
h
OpticalTable
ShoesMat
Cabinet
Acid/SolventCabinets
Cabinet
CabinetWireRack
Wire
Rack
Cabin
et
Mat
Mat
FileCab
SolvCab
AcidCabChemicalPreparation
CharterizationHall
ENTRY INTO THE CLEAN WORLD
>>> STOP <<<NO
FOOD OR BEVERAGESBEYOND THIS POINT
STAY ON THE MATS
PAST THIS POINT
SHOES OR BOOTIES
Booties
Shoes
Shoes
NOW YOU CROSS THE LINE
CHEMICAL PREPARATION
SolventsAcids
THE CLEANROOM
THE GOWNING ROOM
• Follow the sequence of bouffant (hairnet), shoe covers, gloves, and frock.
• If you are only stepping out for a short time reuse the same items.
• If you are carrying something into the cleanroom wipe it down with the presoaked wipes.
• The reason for gowning is to expose a minimum of flaking skin, hair, etc. that could harm your work.
CLEANROOM ENTRANCE
GOWNINGSTEPS
REVERSE THE STEPSWHEN REMOVING THE
APPAREL
COMMON GOWNING ERRORS
• Hair protruding from bouffant.• Ears not covered.• Open collar on frock.• Gloves rolled up and/or frock sleeves
pulled back from gloves. The gloves should be fully extended up the forearms.
• Once again, the reason for gowning is to expose a minimum of flaking skin, hair, etc. that could harm your work.
WHITE ROOM
• 4’ Fume Hood
• In process of obtaining additional equipment.– Reactive Ion Etcher– Deposition System(s)
• Will be adding Emergency Eye Wash / Shower.
WHITE ROOM
Acid
YELLOW ROOM
• Exhausted Laminar Flow Hood– Photolithography
• Sink, Spinner, Hot Plate, Oven– ISO 5 (Class 100) environment
• Vertical Laminar Flow Hood– MJB 3 Mask Aligner– Microscope– ISO 5 (Class 100) environment
• If the room is occupied use the telephone’s intercomm from the White Room to verify it’s safe to open the door and enter.
YELLOW ROOM
PHOTOLITHOGRAPHY
Sink
Spinner
ContaminateWaste
Hot Plate
Oven
HORIZONTAL LAMINAR HOOD
OLDMask Aligner
Microscope(No DIC)
MJB 3Mask Aligner
MASK ALIGNER
MUST be trained before use
MICROSCOPE
MUST be trained before use
CHARACTERIZATION HALL• X-rays
– Scintag X’trA XRD: powder/low angle– Philips XRD: High Resolution
• Wiring Stations– Ball Bonder– Indium Soldering Station
• Horizontal Laminar Flow Hood– pH– Anodization Station
• Optical Tables (a work in progress)– Mid-IR Photoluminescence
• C-V Analysis• Coming Soon
– FIB– Hall Effect
X-RAYS
Philips XRD Scintag X’trA XRD
WIRING STATIONS
MEI 1204B Ball Bonder
Home Built Indium Soldering Station
pH and ANODIZATION
pH
Anodization
SOME GENERAL INFO
• You must be trained before using it unassisted.• Clean up and put away.
– Leaving your work area in better condition than you found it is a good habit to develop.
• If you have any doubts or questions, ASK.– Harm to you and / or equipment can result from
improper procedures.
• Using / operating available facilities / equipment is a privilege not a right.– Your privilege can be restricted or revoked if you
refuse to follow accepted practices or rules.
Some Useful References
• UCLA Nanoelectronics Research Facility– http://nanolab.ucla.edu/new_users.htm– http://nanolab.ucla.edu/pdf/Orient.ppt
• University of California at Berkeley– http://microlab.berkeley.edu/
• Georgia Tech– http://www.mirc.gatech.edu/facilities/
• University of Alabama in Huntsville– http://www.licos.uah.edu/nmf.html
• Cornell Nanofabrication Facility– http://www.cnf.cornell.edu/cnf/– http://www.cnf.cornell.edu/cnf/CNFSafetyManual8.html