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Prismo D-BlueTM, a New MOCVD Platform f G N b d HB LED P d tifor GaN-based HB LED Production

Yingbin Liu, Shiping Guo & Zhiyou Du

Advanced Micro-Fabrication Equipment Inc.d a ced c o ab cat o qu p e t c

© 2009 AMEC. The information contained herein is subject to change without notice.

AMEC Productive Innovation

Our MissionTo advance technology, increase productivity and reduce costs for manufacturers

Copyright © 2013 AMEC, All Rights Reserved 2

of semiconductors and emerging energy-related devices like LEDs

Fast Facts

Profile−Founded in 2004, AMEC provides advanced micro-fabrication equipment and associated

process expertise to global semiconductor manufacturers and leading companies in adjacent l t d t lik lid t t li htienergy-related sectors like solid-state lighting.

−Privately held & supported by global investors, including Walden International, Lightspeed Venture Partners, Goldman Sachs, Shanghai Venture Capital Company Ltd. and others.

Markets Served−Semiconductor front end [advanced dielectric etcher for critical and non-critical applications]−Semiconductor back end & beyond [TSV etcher for wafer-level packaging, MEMS & 3DIC

applications].−Solid-state lighting [MOCVD tool for HB-LED manufacturing].


Fast Facts cont/d…..

Technology & Products−Powered by advanced technology, AMEC’s products feature a common platform design

optimized for ultra-high productivity and low CoO. The portfolio includes: Primo D-RIETM, Primooptimized for ultra high productivity and low CoO. The portfolio includes: Primo D RIE , Primo AD-RIETM and the Primo SSC AD-RIETM dielectric etch systems; the Primo TSV200TM etcher, and the new Prismo D-BlueTM MOCVD platform.

Leadership Pedigree−100+ IC process technology experts, including 40 from Silicon Valley.

IP Portfolio−Robust patent position

I t ll d BInstalled Base−209 Etch stations in production at 17 tier-one fab sites across every region in Asia. − Includes tier-one foundries and IDMs, as well as packaging companies.

Global PresenceGlobal Presence−R&D HQ in Shanghai. Business operations, sales and support offices in Japan, Korea and

Singapore. New manufacturing hub in Taiwan. Soon to establish US presence. Headcount

−350+ employees worldwide.


A Foundation in Advanced Etch ProductsC iti l Di l t i t hi f 2X d b dCritical Dielectric etching for 2Xnm and beyondDecoupled dual frequency (60MHz & optional 2 or 13MHz) RF CCP technology, and very high pumping conductanceSingle Station Chamber cluster technology

Primo SSC AD-RIE

Primo DSC AD-RIE

Single Station Chamber cluster technology(up to 6 process chambers)

Dielectric etching for 2Xnm and beyondDecoupled dual frequency (60MHz & switchable 2 or 13MHz)Decoupled dual frequency (60MHz & switchable 2 or 13MHz) RF CCP technologyDual-station Chamber cluster technology(up to 6 process stations)

Primo D-RIE

( p p )

Dielectric etching for advanced Logic and MemoryDecoupled dual frequency (60MHz & 2MHz) RF CCP technologytechnologyDual-station chamber cluster technology(up to 6 process stations)

Th h Sili Vi t hiPrimo TSV200EPrimo TSV300E

Through-Silicon-Via etchingICP technologyDual-station chamber cluster technology(up to 6 process stations)

Copyright © 2013 AMEC, All Rights Reserved

(up to 6 process stations)300mm/200mm wafer processing available

5

Shanghai Hub Expands for Growth

AMEC Manufacturing StandardsISO 14001 / 9001 CertifiedOSHAS 18001 Certified

R&DBuilding 1

HQ & Operation Building 2

66

R&D Building 1 of 6,500m² Class 100 R&D Lab in operation since 2005 HQ and Operation Building 2 for high-volume manufacturing $1B capacity50,000m² adjacent lot reserved for future expansion


j pAdditional Manufacturing of 218m2 Class 1000 area in Taiwan since 2011

The Prismo D-BlueTM MOCVD Platform

A New Class of MOCVD Tool For Today’s LED Fab ~ Enabling High-Quality HB-LED Devices


High productivity & high yields with low cost-of-ownership benefits

Prismo D-Blue MOCVD Platform

Copyright © 2013 AMEC, All Rights Reserved 8 8

Prismo D-BlueTM : Superior Process Flexibility

1 chamber

direct add on

2 chambers n-GaN p-GaN

Process Flexibility

n-GaN

p

MQW3 chambers

Can process in sequential mode or parallel full-stack runs

4 chambers

p

Flexible system configuration with independent chamber control


Capable of running processes in parallel or sequentially

9

Prismo D-BlueTM : Excellent Footprint Efficiency

AMEC MOCVD Reactor

tprin

t 30%

Foot Single Reactor


30% footprint advantage over competitive single-reactor tools

Prismo D-BlueTM : Superb Process Performance

Uniformity Within-wafer 1.2nm, wafer-to-wafer 1.3nm were achieved for MQW wavelength uniformitywavelength uniformity

− Multiple zone gas injection system− Specially designed gas distribution injector− Multiple zone heating system

RepeatabilityWith no recipe adjustments during marathon run 0 6nm (STDEV) run-to-With no recipe adjustments during marathon run, 0.6nm (STDEV) run torun repeatability was achieved

− No particle or deposition on showerheadN l i i t b t− No cleaning or maintenance between runs

− Stable temperature control system Run-to-run repeatability demonstrated during customer demos and at the p y gbeta site


Prismo D-BlueTM : High Reliability and Serviceability

Reliability

Zero-failure during marathon test, enabled by:− AMEC’s industrial-proven software− Maturity of system automation and control

Maturity of transfer module− Maturity of transfer module− SEMI standards implemented on Design, Integration and Testing

Serviceability

Easy serviceability enabled by:− A specially designed MO vacuum line for bubbler change− Fully automated and programmable reactor open/close − Sophisticated architecture that matches stringent SEMI-equivalent

standards


Uniformity of 49X2’’: 2mm Edge Exclusion

Average=5.98μmWafer-to-wafer uniformity: 0.4%Within-wafer uniformity: 1.0%

Average=454nmWafer-to-wafer uniformity: 1.3nmWithin-wafer uniformity: 1.2nm


y y

13


Average=5.69μmWafer-to-wafer uniformity: 0.66%Within-wafer uniformity: 1.0%

Average=460.7nmWafer-to-wafer uniformity: 1.2nmWithin-wafer uniformity: 1.2nm



14X4’’ Demo MQW structure: 14X4’’ Demo MQW structure:Average wavelength: 460.8nmWafer-to wafer uniformity: 1.1nmWithin wafer uniformity: 1.4nm (max: 1 6nm min: 1 0nm)

Average thickness: 5.4umWafer-to wafer uniformity : 1.7%Within wafer uniformity : 1.5% (max: 1 8% min: 0 9%)


1.6nm, min: 1.0nm) (max: 1.8%, min: 0.9%)

Marathon Run Sequence

PM Coating run with susceptor A

1st run with susceptor B

2nd run with susceptor A

3rd run with susceptor B......15th run with

susceptor B16th run with susceptor A susceptor Bsusceptor Bsusceptor A

18th run with susceptor A

PM Coating run with susceptor B

19th run with susceptor B

......22st run with susceptor Ap

1. Identical recipe without any changes during Marathon run2. A/B two susceptors alternative for marathon run


3. A/B two susceptors baked in another MOCVD chamber

16

Marathon Run : Wavelength of MQW

10

11

461

463Peak wavelength trend

8

9

10

457

459

461

n(nm

)

e(nm

) 16 Runs 5 Runs

5

6

7

451

453

455

er d

evia

tion

ngth

ave

rag

3

4

5

447

449

451

afer

to w

afe

ak w

avel

en

PM PM

1

2

443

445

Wa

Pea

T t l 21 R (f ll l d) ith i d l th ithi / 2

04411 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 18 19 20 21 22

Run #


Total 21 Runs (full load) with same recipe and wavelength range within +/- 2nm

Marathon Run: Thickness of GaN


Total 21 Runs (full load) with same recipe and U% of GaN Thickness << 2%

MOCVD Reactor Match Data

Alpha Reactor A

Alpha Reactor B

Beta Reactor 1 Spec Range

Thickness(average um) 3.505 3.342 3.187 3.177 - 3.512

Wavelength( ) 464.0 462.3 464.3 458.5 - 468.5(average nm) 464.0 462.3 464.3 458.5 468.5

Both layer thickness and PL wavelength from 3 reactors are within ±5% MRS spec.


Beta Tool Single Layer Performance

Item General spec AMEC result @ customer

Undoped GaN

Growth rate > 2 μm/hr 2.37μm/h

Within-wafer uniformity <2% 0.6%1

Undoped GaN（无掺杂氮化镓）

Within wafer uniformity 2% 0.6%

W-W uniformity <2% 0.3%

Mobility @RT >350cm2/Vs 541 cm2/Vs

18 3 18 3

2 Si doped GaN（N型氮化镓）

Doping level >2X1018 cm-3 2.7X1018 cm-3

Mobility @RT >250 cm2/Vs 292 cm2/Vs

Mg doped GaNdoping level >1X1017 cm-3 2.8X1017 cm-3

3 Mg doped GaN（P型氮化镓）

p g

Mobility >5 cm2/vs 7 cm2/vs

4 AlGaN（铝镓氮）

Al composition 15%-20% 17.6% （铝镓氮） Alloy uniformity Max-min <2% 1%

5InGaN /GaN MQW

（铟镓氮/氮化镓多层

Wavelength range 450-460 nm 459.2 nm

Within-wafer uniformity <2 nm 1.09 nm5 （铟镓氮/氮化镓多层

量子阱） W-to-W uniformity <2 nm 1.23 nm

Run-to–run uniformity <2 nm 0.44 nm (3 runs)

6 u-GaN crystalline (002) FWHM <300 arcsec 223 arcsec


6 y（无掺杂氮化镓晶格） (102) FWHM <400 arcsec 258 arcsec

Beta Tool LED Production Performance

8X20 chip Vf(V)@ 20 mA

VZ(V)@-10uA

IR(uA) @ -10V

IV(mW)@ 20 mA WLD(nm) ESD(%)

>4000V

AMEC tool 3.01 49.9 0.03 25.3 458.1 100

Other production tools 3.05 49.9 0.02 25.0 455.6 >95

Production LED 2 8 3 3 >40 <0 1 >24 447 5 467 5 >90specs 2.8-3.3 >40 <0.1 >24 447.5-467.5 >90

10X30 chip Vf(V)@ 60 mA

VZ(V)@-10uA

IR(uA) @ -8V

IV(mW)@ 60 mA WLD(nm) ESD(%)

>4000V@ 60 mA @ 10uA @ 8V @ 60 mA >4000V

AMEC tool 3.08 57.03 0.01 61.65 456.6 100

Other 3 12 52 2 0 01 66 4 455 1 95Other production tools 3.12 52.2 0.01 66.4 455.1 >95

Production LED specs 2.95-3.3 >20 <0.2 >60 450-460 >90

• Qualified for two LED products by a beta customer. Overall performance matched their existing production reactors – the same ones used by most LED manufacturers.

• Achieved brightness equivalent of ~130 lm/W for a “middle power” white-color packaged LED


g q p p g- based on the customer’s measurement standard.

Summary

AMEC is a leading provider of advanced technology to manufacturers of semiconductors and LEDs

In Q1 2013, the company introduced its MOCVD (Prismo D-BlueTM) platformIn Q1 2013, the company introduced its MOCVD (Prismo D Blue ) platform

The first Beta system has already passed Beta evaluation and is running Epi production at a customer LED production line in China

With innovations that distinguish the tool from other MOCVD contenders, the Prismo D-BlueTM tool has demonstrated the superb process performance required for a mature production-worthy MOCVD tool. It consistently shows excellent p y ysystem uniformity and breakthrough repeatability, as well as high reliability

The Prismo D-BlueTM is simply a better class of MOCVD tool offering:E ti l f t i fl ibilitExceptional manufacturing flexibilitySuperb production efficiency & process performanceEasy serviceabilityCompact footprint

AMEC strives to provide customers worldwide with products that are optimized for technology innovation & performance as well as unmatched service & support


technology innovation & performance, as well as unmatched service & support

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Thank You!Thank You!


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