outline - cornell university
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CHESS ERL workshop 1
ESRFFocusing X-ray beams below 50 nm using bent multilayers
O. Hignette Optics groupEuropean Synchrotron Radiation Facility (FRANCE)
ESRF
Outline
• Graded multilayers resolution limits • 40 nanometers focusing• Fabrication and metrology processes• projection microscopy • Perspectives
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CHESS ERL workshop
ESRFgraded multilayer resolution limits
Are volume diffraction – scattering effects limiting factors ?
LfΛ1.7
maxNAλ0.44FWHM ≅=diffraction limited
full width half maximum
Λ d-spacingλ Wavelengthf focal lengthL mirror lengthNA numerical aperture
Ultimate FHWM ≅ 4 nm
Energy independant
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CHESS ERL workshop
ESRF
Multilayer comparison with metal coated mirrors
cθλ1.3
NAmaxλ0.44FWHM ≅=
For Platinum FWHM = 21 nm
θsinΛ2λ = angle of incidence 5X larger than Pt for 20 Angstrom d-spacing
Small focal length with large acceptance possible
High energy applications
Metallic mirror width limit
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CHESS ERL workshop
ESRFPushing the limits : double reflections
and annular type architectures
Wolter II NAMAX X 8 FWHM ≅ 0 .5 nm
4 mirrors KB
NAMAX X 2 FWHM ≅ 2 nm
Ellipsoid NA ≅ 2θNAMAX X 4 FWHM ≅ 1 nm NA
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CHESS ERL workshop
ESRFLimiting factors
Alignment ,vibrations, T drifts mirror figure errors and roughnessMultilayer fabrication inaccuraciesVolume effects (evanescent wave, phase shifts, scattering)
Diffraction limited figure tolerances
51327 .sinΛ
==θ
λσz
Λ multilayer d-spacing
λ Wavelength
θ incidence angle
σz= 0.22 nm rms for Λ=3 nm σz= 0.8 nm rms for Platinum
sub-angstrom roughness for multilayers
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CHESS ERL workshop
ESRFID19 line nanofocusing multilayer experiment
Mirror bender
Graded MLFocus detection
Dynamical bender
Aperture slits
Beam
Energy 24 Kev focal length 80mm incidence angle 5.5 mrd vertical 25 μm FWHM source at 150 m
ΔE − 6%E
[W/B4C]25
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CHESS ERL workshop
ESRFNanowire fluorescence linewidth measurement
18 nm thickness9 mrd incidence beam
1.9 μ m Ruthenium ribbon
Carbon substrate
piezo translation
fluor
esce
ntvo
lum
e
equivallent fluo-nanowire function
FWHM 18 nm
Piezo translation
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CHESS ERL workshop
ESRF
Line profile measurements
Raw data nanowire volume deconvolution
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CHESS ERL workshop
ESRFLinesize versus acceptance
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CHESS ERL workshop
ESRFMirror figure errors limitations ?
line size vs acceptance
Wavefront phase errorFrom Xray in situ metrology
Estimated error 25 nrd rms(Pencil beam method )
Figure error 0.75 nm PV
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CHESS ERL workshop
ESRFVibrations measurements
BPM XCCD camera Integration time <1 ms
3nm rms position noise estimate
20
Vibrations environment was not adequate for this test
New design to be tested ≅ 20 nm
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CHESS ERL workshop
ESRFManufacturing – Metrology
ESRF nanofocusing platform ( 6 KB systems - 40 nm)
Process steps
Substrate figuring – (bender attachment)optical metrology
deterministic finishingmultilayer sputtering, In situ Xray metrology
multilayer phase correction
Start from (nearly) available technologies. incremental improvements
Closed loop figuring – metrology process
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CHESS ERL workshop
ESRFFabrication processes used
ProcessesComputer control polishing Differential Width profiling
Stressed polishing Differential- profile coating
Ion beam figuring (IBF) Partners
APS optics groupZeiss
General optics Crystal scientific
Winlight
Smooth initial figuring deterministic correction with limited spatial resolution
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CHESS ERL workshop
ESRF
Stressed polishing
Figuring processes
Lapping / PolishingComputer Controlled
Ion Beam FiguringComputer Controlled
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CHESS ERL workshop
ESRFZeiss IBF capability
Zeiss D100 measurement
face to the side
Flat mirror for SPring8
Results: Zeiss D100 BESSY NOMSlope error 0.10 µrad rms 0.13 µrad rmsResidual figure error 0.21 nm rms 0.56 nm rms
1.4 nm pv 2.3 nm pvRadius 60 km 61.2 km
Agreement in the sub-nm range !!!
Flat mirrors
Bessy NOM
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CHESS ERL workshop
ESRFAPS- ESRF profile coating KB project
R.Conley
37 X 77 mm focal length mirrors
L.Assoufid
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CHESS ERL workshop
ESRF
Dynamic KB : starting from existing designs
ID19 low beta source at 150 mEnergy 15 to 24 keV
ID22 60 m high beta sectionslitted source Energy 17 kev
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CHESS ERL workshop
ESRFShrinked design for dynamic KB
ImprovementsReduce focal length Mirror figure errors System vibrations Temperature induced drifts - feedback
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CHESS ERL workshop
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Available metrology instrumentation for strong aspheres
New commercial stitching interferometers ADE phase shift , QEDEvaluated by L. Assoufid at APS
LTP accuracy being evaluated(Round Robin)
ESRF In situ Xray metrology(many other wavefront methodscoming along)
Need : 0.1 nm rms accuracy
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CHESS ERL workshop
ESRF
ESRF pencil beam In situ metrology (wavefront derivative )
δα
L
Focal plane deviations = 2 δα L
80 mm FL multilayer (41 nm FWHM)
20 nanoradian rms slope precision
figure error repeatabilty over 36 mm :0.15 nm PV (0.03 nm rms)
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CHESS ERL workshop
ESRFMedium- long term perspectives
Static multilayers mirrors preferred
Substrate figuring : Zeiss, OSAKA U (JTEC) , TINSLEY capability already at the nanometer level - Roughness to be confirmed
Multilayers : Very steep gradients and phase correction feasability to be proven
Metrology : Xray wavefront methods necessary and probably sufficientmuch beamtime needed.
In situ figuring an attractive option
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CHESS ERL workshop
ESRFPooling of synchrotron sources resources ?
European FP7 initiative
Europe -US collaborations
Rely on what will be commercially available (OSAKA-JTEC)
Synchrotrons ChallengeEstablish a predictable secure procurement for all process operations
keep control especially for metrology
Market is small with respect to needed investments
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CHESS ERL workshop
ESRF
Application : projection microscopy
Magnification: (z1 + z2)/z1 = 3Defocus: z1 z1/(z1 + z2) = 22 mm
M = 9D = 29 mm
M = 18D = 31 mm
Energy = 19 keV
10 µm
2D detector2 μm resolution
KB
z1
z2
objectfocus
Defect of grating on a 100 nm scale revealed
P. Cloetens, O. Hignette
Fresnel diffraction pattern - Spot size limited resolution
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CHESS ERL workshop
ESRF
D = 45 mm
10 μm
Rel. Phase Map
5distances
Neuron cell
Phase RetrievalPossible single shot imaging with a priori information
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CHESS ERL workshop
ESRF
R Mokso et al, submitted to Appl. Phys. Lett
Inside φ = 1 mm sample → local tomography!E = 20.5 keVX-ray magnification ~ 80 (voxel size = 90 nm)
Al / Si alloytomographic slice
75 μm
SiPoreAl5FeSi
Application example : Magnified Tomography on ID19(projection imaging)
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CHESS ERL workshop
ESRFConclusions
Reflective optics technology is now a serious candidatefor < 10 nm nanofocusing
Acknowledgements C.Morawe, P.Cloetens, R.Baker, A.Seifert, L Assoufid, R.Conley
How and where to put resources to establish
Full processes control
1 nm goal needs huge (coordinated) efforts but not a total dream
Most needed technologies have been proven at a research level
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CHESS ERL workshop
ESRF
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CHESS ERL workshop
ESRF
Technologies developped at ESRFShort term KB nanofocusing projects
50 X 50 10 – 14 37 X 77Ptstatic
200 X 1002.5 - 7.5 60 X 150Nistatic
200 X 20010 - 14 80 X 177Ptdynamic
300 X 4050 - 100240 X 100multilayerdynamic
300 X 20010 - 14 160 X 360multilayerdynamic
50 X 5013 - 2583 X 180multilayerdynamic
spot size(nanometers)
energy range kev
focal lengthHXV(mm)
coating system type