modern methods in heterogeneous catalysis research: theory and experiment photons: in situ...
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![Page 1: Modern Methods in Heterogeneous Catalysis Research: Theory and Experiment Photons: In situ spectroscopy in the soft X-ray energy range Axel Knop-Gericke](https://reader033.vdocuments.mx/reader033/viewer/2022051516/56649f285503460f94c418cc/html5/thumbnails/1.jpg)
Modern Methods in Heterogeneous Catalysis Research:
Theory and Experiment
Photons:
In situ spectroscopy in the soft X-ray energy range
Axel Knop-Gericke
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Outline
Photons for the investigation of heterogeneous catalytic processes
Synchrotron radiation
diffraction : single slit, double slit, grating
in situ XAS in the soft energy range
examples: methanol oxidation over copper
n-butane oxidation over VPO catalysts
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Spectrum of electromagnetic radiation
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UV-vis : A. Brückner 6.12.2002
Vibrational spectroscopy (IR spectroscopy, Raman: G. Rupprechter 13.12.2002 )
Electron spectroscopy: R. Schlögl 20.12.2002
X-ray diffraktion: I. Erran 10.1.2003
EXFAS/NEXAFS in the hard X-ray range: T.Ressler 17.1.2003
Other lectures in this field:
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Synchrotron radiation
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Synchrotron radiation
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Synchrotron radiation
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Synchrotron radiation
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Synchrotron radiation
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Synchrotron radiation
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Synchrotron radiation
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Synchrotron radiation
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Synchrotron radiation
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Undulator
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Synchrotron radiation
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Synchrotron radiation
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Single Slit Diffraction
Princip of Huygens
Minimum: g= k k=1,2,3,...<a/
sin k= g/a ; tan k =dk/l
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Diffraction Pattern
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Double Slit Diffraction
Expected diffraction pattern:Actually observed diffraction pattern
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Double Slit Diffraction
l>>a : waves normals related to Pk on the screen are parallel,
sin k = g/a, tan k = dk/l
k < 8 : sin k = tan k = dk/l = g/a dk= gl/a
Maximum (g= 0, , 2, 3,...) dk= kl/a k= 0,1,2,3..
Minimum (g= /2, 3/2 , 5/2 ,...) dk=(2k+1) l/2a k=0,1,2,3,..
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From single slit to grating: Diffraction pattern
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XAS in the soft energy rangeXAS in the soft energy range
Soft energy range: 250 - 1000 eV
which elements: C(1s), N(1s), O(1s), transition metal (2p)....
• L edge / 2p XPS peaks of transition metal are sensitive to details of chemical
•XAS is a local process not restricted to material with long range order
•surface sensitive when applied in electron yield mode
pellets can be investigated under reaction conditions
•orientation of molecules on single crystal surfaces can be estimated
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•Anregung von Rumpfniveauelektronen mittels Röntgenstrahlung
•Relaxation mittels Fluoreszenzstrahlung oder durch Aussenden eines Auger-Elektrons (TEY, PEY, AEY)
•Untersuchung der unbesetzten Zustände
•Anregung von Rumpfniveauelektronen mittels Röntgenstrahlung
•Relaxation mittels Fluoreszenzstrahlung oder durch Aussenden eines Auger-Elektrons (TEY, PEY, AEY)
•Untersuchung der unbesetzten Zustände
Spektroskopische Methode
Prinzip derRöntgenabsorptionsspektroskopie (XAS)
2ipfI
Auger-Elektron
Fluoreszenz
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Mean free path of electron in solids
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Experimental TechniqueExperimental Technique
In situ methods are required to investigate heterogeneous catalytic reactions since the structure of a catalyst estimated ex situ might differ from the structure revealed by in situ
studies
Material gapsingle crystal vs
real catalystPressure gap
UHV vs p > 1bar
XAS in the soft energy range represent surface sensitive spectroscopic methods, which can be
applied in the mbar pressure range
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0 2000 4000 6000 8000 100000.0
0.2
0.4
0.6
0.8
1.0
Tra
nsm
issi
on
Energy (eV)
Transmission of 20 cm air
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•heating up to 900 K
•pressure up to 20 mbar
•batch- and flow-through-mode
•angular dependent measurements
•heating up to 900 K
•pressure up to 20 mbar
•batch- and flow-through-mode
•angular dependent measurements
Experimental Set-Up
Plattenventil
mass spektrometer
gas inlet by MFC
process pump
turbo pump
manipulator
sample
UHV-valve
butterfly-valve
150 m
m150
mm
100 mm
properties of the set-up
heating
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In situ XAS Detector systemIn situ XAS Detector system
Simultaneous detection of gas phase- and sample signal
Simultaneous detection of gas phase- and sample signal
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Gas phase subtractionGas phase subtraction
520 540 560
Photon Energy / eV
0
0.5
1
1.5
2
2.5
Inte
nsi
ty (
a.
u.)
Idet- )* 3(
O K-edge
530.8 eV
539.2 eV541.4 eV
532.8 eV
537.3 eV
534.0 eV
C u2O
*
*O 2
C H 3O H
Igas
Idet
C H 3O H + O 2
Igas
NEXAFS of the O K-edge
Analysis of the Near Edge X-ray Absorption Fine Structure (NEXAFS)
• Total electron yield of the gas phase dominates all signals, therefore only small differences in the detector signals
•Substraction allows to separate the absorption signal of the surface of the catalyst
• Total electron yield of the gas phase dominates all signals, therefore only small differences in the detector signals
•Substraction allows to separate the absorption signal of the surface of the catalyst
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2 CH3OH + O2 2 CH2O + 2 H2O
CH3OH CH2O + H2
2 CH3OH + 3 O2 2 CO2 + 4 H2O
oxidative dehydrogenation
dehydrogenation
total oxidation
Methanol oxidation
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Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Cu L3- NEXAFS
Increased activity for gas flow ratios:O2 / CH3OH 0.5
Increased activity for gas flow ratios:O2 / CH3OH 0.5
0.2 0.4 0.6 0.8 1
Flow ratio O 2 / CH 3O H
40
60
80
100
Con
vers
ion
CH
3OH
(%
)
Catalytic Activity NEXAFS at the Cu L3-edge
Transition from an oxidic copper-phase to the metallic state
Transition from an oxidic copper-phase to the metallic state
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•NEXAFS of the active state is completly different from the NEXAFS of the known copper-oxides
• 2 oxidic- and 1 suboxidic species can be distinguished
•NEXAFS of the active state is completly different from the NEXAFS of the known copper-oxides
• 2 oxidic- and 1 suboxidic species can be distinguished
520 530 540 550 560 570
Photon Energy / eV
0
2
4
6
8
10
Tota
l Ele
ctro
n Y
ield
(a
. u.)
O K-edge
Reference Cu2O
300 K
570 K
670 K
Tem perature
532.8 eV
531.6 eV
536.6 eV
Flow ratio O 2 / C H 3O H
670 K
0.6
0.2
0.2
NEXAFS at the O K-edge
less active
very active
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•Intensity of the suboxide species increases with increasing temperature
•Intensity of the suboxide species is positively correlated to the yield of CH2O and CO
•Intensity of the suboxide species increases with increasing temperature
•Intensity of the suboxide species is positively correlated to the yield of CH2O and CO
Variation of temperature at O2 / CH3OH = 0.2
Correlation between the SuboxideSpecies and CH2O
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•Intensity of the oxidic species Oxsurf decreases with increasing CO2-yield
•2 areas of activity can be distinguished
•Intensity of the oxidic species Oxsurf decreases with increasing CO2-yield
•2 areas of activity can be distinguished
Correlations between oxidic species and CO2
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Model
CO +H O2 2
CH O+H2 2O
O+ O
CH OH3
CH OH3
CH OH3
CO+H2
CH O+H2 2
O2
Cu 0
Oxsurf
Ox
bulk
Subox
Ovol
Proposed model of the copper surface under reaction conditions for methanol oxidation
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Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
nn-Butane Oxidation to MA-Butane Oxidation to MAby Vanadium Phosphorus Catalystsby Vanadium Phosphorus Catalysts
+ 3,5 O2 + 4 H2O
1,5 Vol% air
C4H10 + 6,5 O2 4 CO2 + 5 H2O
C4H10 + 4,5 O2 4 CO + 5 H2O
VPO
400 °C, 1 bar O
O
O
Maleic Anhydride (MA)
Active phase: highly ordered vanadyl pyrophosphate (VO)2P2O7) ?
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Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
The VPO V LThe VPO V L33-NEXAFS-NEXAFS
512 514 516 518 520
Photon Energy / eV
0
2
4
6
Tot
al E
lect
ron
Yie
ld (
norm
. u.
) V L3-edge
V1
V2
V3
V5
V4 V6
V7
Analysis of spectral shape by unconstrained least squares fit
V valenceV valence
Details of the local chemical bonding
Details of the local chemical bonding
Local geometric structure
Local geometric structure
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Interpretation of V LInterpretation of V L33 NEXAFS NEXAFS
1.6 1.8 2 2.2 2.4 2.6 2.8
Bond Length / †
-1
0
1
2
3
Rel
ativ
e R
eson
ance
Pos
ition
/ e
V
Å
V1*
Å1.6 1.8 2 2.2 2.4 2.6 2.8
Bond Length /
-1
0
1
2
3
Rel
ativ
e R
eson
ance
Pos
ition
/ e
V
V2O5
V6V1
V2
V3
V4
VPO
V4*
V2*
V3*
V5*
V6*
NEXAFS resonances appear in a sequence of V-O bond lengths
NEXAFS resonances appear in a sequence of V-O bond lengths
Experimental finding:
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Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Changes of NEXAFSChanges of NEXAFSwhile heatingwhile heating
Relative spectral Intensity of V5 at V L3-edge
512 514 516 518 520
Photon Energy / eV
0
2
4
6
Tot
al E
lect
ron
Yie
ld (
norm
. u.
) V L3-edge
Proportion of in
t. intensity of V
5
Spectra number
V5
RT RT RT400°C 400°C
Decrease w
hile activeD
ecrease while active MA Yield (a. u.)
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Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Interpretation of V LInterpretation of V L33 NEXAFS NEXAFS
O(1a)
O(2)
O(2)
O(1b)
O(3)
O(3)
V
V2O5 as model substance for VPO
V2O5: Close relationship between geometric and electronic structure at V L3-absorption edge
V2O5: Close relationship between geometric and electronic structure at V L3-absorption edge
DFT calculation of DOS (V2O5 !)*:
DFT calculation of DOS (V2O5 !)*:
V6: O(1a) V5: ? (estimated value of bond length between O(2) and O(1a): 1.72 Å)
V6: O(1a) V5: ? (estimated value of bond length between O(2) and O(1a): 1.72 Å)
Identification of resonances (V5, V6):
main contributions to NEXAFS resonances appear in a sequence ofV-O bond length
main contributions to NEXAFS resonances appear in a sequence ofV-O bond length