metallurgical

2
A A DISTILLATION HCl(g) Mole % 21.42 H2SiCl2 14.29 SiCl4 64.29 H2 100 % HSiCl3 REACTOR Metallurgical-grade silicon is purified to electronic grade for use in the semiconductor industry by chemically separating it from its impurities. The Si metal react in varying derees with hydrogen chloride gas at 3000 C to form several polychlorinated silanes. Trichlorosilane is liquid at room temperature and easily separated by fractional distillation from the other gases. If 100 kg of silicon is reacted as shown in this figure, how much triclhorosilane is prodiced ? 100 28 =3. 5714 100 28 =3.5714 REACTOR REACTOR

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Page 1: Metallurgical

A

A

A

DISTILLATION

HCl(g)

Mole %21.42 H2SiCl2 14.29 SiCl4 64.29 H2

100 % HSiCl3

REACTOR

Metallurgical-grade silicon is purified to electronic grade for use in the semiconductor industry by chemically separating it from its impurities. The Si metal react in varying derees with hydrogen chloride gas at 3000 C to form several polychlorinated silanes. Trichlorosilane is liquid at room temperature and easily separated by fractional distillation from the other gases. If 100 kg of silicon is reacted as shown in this figure, how much triclhorosilane is prodiced ?

10028

=3.5714

10028

=3.5714

10028

=3.5714

REACTOR

REACTOR

REACTOR

Page 2: Metallurgical

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10028