matrix effects in sims: ion yield enhancement in copper sulfide films on copper and copper alloys

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Matrix effects in SIMS: Ion yield enhancement in copper sulfide films on copper and copper alloys G. E. Hammer Citation: Journal of Vacuum Science & Technology 20, 403 (1982); doi: 10.1116/1.571477 View online: http://dx.doi.org/10.1116/1.571477 View Table of Contents: http://scitation.aip.org/content/avs/journal/jvst/20/3?ver=pdfcov Published by the AVS: Science & Technology of Materials, Interfaces, and Processing Articles you may be interested in Note: Measuring effects of Ar-ion cleaning on the secondary electron yield of copper due to electron impact Rev. Sci. Instrum. 83, 066105 (2012); 10.1063/1.4729379 Electrical properties and stability of p-type ZnO film enhanced by alloying with S and heavy doping of Cu Appl. Phys. Lett. 97, 142101 (2010); 10.1063/1.3496038 Ion-beam-induced nanosmoothening and conductivity enhancement in ultrathin metal films Appl. Phys. Lett. 86, 063108 (2005); 10.1063/1.1861953 Reply to ’’Comment on ’A unified explanation for secondary ion yields’ and ’Mechanism of the SIMS matrix effect’’’ J. Appl. Phys. 52, 530 (1981); 10.1063/1.328452 Comment on ’’A unified explanation for secondaryion yields and ’’mechanism of the SIMS matrix effect’’ J. Appl. Phys. 52, 527 (1981); 10.1063/1.328451 Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 130.239.20.174 On: Sat, 22 Nov 2014 22:01:07

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Page 1: Matrix effects in SIMS: Ion yield enhancement in copper sulfide films on copper and copper alloys

Matrix effects in SIMS: Ion yield enhancement in copper sulfide films on copper andcopper alloysG. E. Hammer Citation: Journal of Vacuum Science & Technology 20, 403 (1982); doi: 10.1116/1.571477 View online: http://dx.doi.org/10.1116/1.571477 View Table of Contents: http://scitation.aip.org/content/avs/journal/jvst/20/3?ver=pdfcov Published by the AVS: Science & Technology of Materials, Interfaces, and Processing Articles you may be interested in Note: Measuring effects of Ar-ion cleaning on the secondary electron yield of copper due to electron impact Rev. Sci. Instrum. 83, 066105 (2012); 10.1063/1.4729379 Electrical properties and stability of p-type ZnO film enhanced by alloying with S and heavy doping of Cu Appl. Phys. Lett. 97, 142101 (2010); 10.1063/1.3496038 Ion-beam-induced nanosmoothening and conductivity enhancement in ultrathin metal films Appl. Phys. Lett. 86, 063108 (2005); 10.1063/1.1861953 Reply to ’’Comment on ’A unified explanation for secondary ion yields’ and ’Mechanism of the SIMS matrixeffect’’’ J. Appl. Phys. 52, 530 (1981); 10.1063/1.328452 Comment on ’’A unified explanation for secondaryion yields and ’’mechanism of the SIMS matrix effect’’ J. Appl. Phys. 52, 527 (1981); 10.1063/1.328451

Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 130.239.20.174 On: Sat, 22 Nov 2014 22:01:07

Page 2: Matrix effects in SIMS: Ion yield enhancement in copper sulfide films on copper and copper alloys

Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 130.239.20.174 On: Sat, 22 Nov 2014 22:01:07

Page 3: Matrix effects in SIMS: Ion yield enhancement in copper sulfide films on copper and copper alloys

Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 130.239.20.174 On: Sat, 22 Nov 2014 22:01:07

Page 4: Matrix effects in SIMS: Ion yield enhancement in copper sulfide films on copper and copper alloys

Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 130.239.20.174 On: Sat, 22 Nov 2014 22:01:07