lect 2 basics of si technology - yonsei universitytera.yonsei.ac.kr/class/2015_2_2/lecture/lect 2...
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![Page 1: Lect 2 Basics of Si Technology - Yonsei Universitytera.yonsei.ac.kr/class/2015_2_2/lecture/Lect 2 Basics of Si Technolo… · Wet Etching Semiconductor Solution Film Products Reaction](https://reader033.vdocuments.mx/reader033/viewer/2022052614/605d6f40eeb4de743a360022/html5/thumbnails/1.jpg)
W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Unit processes
Thin Film Deposition
Etching
Ion Implantation
Photolithography
Chemical Mechanical Polishing
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
1. Thin Film Deposition
Layer of materials ranging from fractions of nanometer to several micro-meters in thickness
- Types of Thin Film Deposition
• Physical Vapor Deposition (PVD)
- Vaporized materials bombard onto substrate
• Chemical Vapor Deposition (CVD)
- Gaseous materials react on substrate
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
• Evaporation (Thermal, E-beam)
• Sputtering (DC, RF, Ion beam)
• Aluminum, Copper, Titanium,
Tungsten silicide
Physical Vapor Deposition (PVD)
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Chemical Vapor Deposition (CVD)
• Gases react on the substrate
to form the desired thin films
• LPCVD (Low Pressure)
PECVD (Plasma Enhanced)
LACVD (Laser Assisted)
MOCVD (Metal Organic) …
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
- SiO2 etching by HF- Si3N4 etching by H3PO4- Si etching by KOH
-Wet etching avoided if possible: hazard materials, undercut
2. Etching
Wet Etching
Semiconductor
Solution
Film
ProductsReaction
Reactants
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
- Dry etching: chemical reaction with gases to eliminate desired material- RIE (Reactive Ion Etching), ICP (Inductive Coupled Plama) , IBE (Ion Beam Etching)
Typical parallel-plate reactive ion etching system
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2) 7
3. Ion Implantation
Ion implantation for dopoing
Ex) p+, n+, p-well, n-well etc.
Ions are accelerated by potential difference and implanted into the substrate
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
PR coating
Exposure
Developing
Etching
PR strip
Deposition
Produces patterns on substrate by transferring mask patterns onto the substrate.
Basically lithographic printing
<Flow of Photolithography>
4. Photolithography
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
5. Chemical Mechanical Polishing (CMP)
Makes the wafer surface flat for better lithography
• Chemical Mechanical Planarization(CMP) combines chemical action with
mechanical abrasion to achieve selective material removal through polishing
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Metal 1
GateSource Drain
Invertor
CMOS inverer●
Layout●
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
P-substrate
N-well
SiN Spacersilicide
Metal 1
Dielectric
P+ N+STI
Gate Oxide
Polysilicon
CMOS Structure●
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Active region
SiO
Shallow Trench Isolation(STI)
Silicon dioxide
●
P-substrate
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Well Formation●
P-substrate
N-well
Active region
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Gate
Drain &Source
Poly Silicon Thin Gate Oxide
N+P+
P-substrate
N-well
Gate and Source/Drain Formation●
Gate Oxide Formation Photolithography Ion implantation
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
P-substrate
N-well
Metal 1
SiN Spacersilicide
Metal 1
Dielectric
Contacts and Metallization●
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
P-substrate
N-well
SiN Spacersilicide
Metal 1
Dielectric
P+ N+STI
ThinGateOxide
Polysilicon
CMOS Fabrication Result●
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
- CMOS Circuit Design Process
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Design examaple: CMOS inverter●
<Inverter schematic>
● Schematic Simulation(Synopsis HSPICE, Cadence SPECTRE)
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
● Layout(Cadence VIRTUOSO)
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
● Rule Checking (Mentor CALIBRE, Synopsis HERCULES, Cadence ASSURA)
- Design Rule Checking (DRC)
- Layout vs. Schematic (LVS)
Check no design rules for a given process is violated during layout
Make sure layout is identical to schematic
- These rule checking must be satisfied before fabrication can start
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
● Parasitic RC extraction(Synopsis StarRC)
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
● Post Layout Simulation
Pre-simPo-sim
Pre-simPo-sim
- Modify your design if needed
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
- Complicated Digital Circuit Design
- Impossible to do transistor-level simulation- Impossible to layout by hands
Behavior-level design using Hardware Description Language (Mentor ModelSim)
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
- Automatic Gate-level Synthesis (Synopsis Design_Vision)
-Auto Layout(Synopsis Astro)
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
● Example
<Layout>
<Fabricated chip>
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
SOI (Silicon on Insulator): A thin layer of silicon crystal on top of insulator on the top on insulator
< SOI Wafer >
Silicon Substrate
Buried Oxide
Thin Film Silicon Layer
Why SOI wafer?
MOS devices on SOI is more robust again many short channel effects, leading to faster operation with less power consumption
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
< SOI Wafer >
Silicon Substrate
Buried Oxide
Thin Film Silicon Layer
Used by IBM and Freescale for high-performance microprocessors but lost to Intel's bulk Si technology
Widely used in Si Photonics
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
SIMOX (Separation by Implantation of Oxygen)
1. Deep implantation of a high dose oxygen into silicon wafer the synthesis of BOX 0.2-0.4 μm thick underneath a thin silicon film
2. Low and high temperature annealing low temperature: inhomogeneous silicon film high temperature: improving and simplifying the vertical SOI structure
Silicon Substrate
Oxygen ion implantation
Annealing
Silicon Substrate
Buried Oxide
Silicon overlayer
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
BESOI (Bond-and-Etch-back SOI)
1. Bonding of two oxidized silicon wafer2. Polishing/etching back of one of the wafer
Two bulk wafers are required to achieve one SOI wafer
Si-handle wafer
SiO2
Si wafer(future SOI layer)
SiO2
Bonding
Silicon Substrate
Buried Oxide
Etch-back
Polishing/etching
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Combined two technology Smart-Cut process
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W.-Y. Choi
Lect. 2: Basics of Si Technology
Si Photonics (15/2)
Smart-Cut Process
Surface Oxidation onto wafer
Implantation of hydrogen into wafer
Deposition of a thick layer or bonding wafer to another wafer
Heat treatment inducing splitting
Polishing and cutting
Wafer
Wafer
Wafer
H implant
Reuse
Reuse
SOI Wafer
Handle Wafer
Handle Wafer
Surface Oxidation
Flip and bond to handle wafer
Break
CMP and cut