INDEXES

Manufacturers Index

AEI Scientific Apparatus Ltd General pumping units, 297 Hot cathode ionization gauge control units, 257 Penning gauges, 241 Residual gas analysers (magnetic deflection), 268 Sorption pumps, 135 Sputter-ion pumps, 138 Thermal conductivity gauge control units, 215 Thermocouple gauge heads, 213 Titanium sublimation pumps, 152 Vacuum accessories, 187 Vacuum evaporation systems, accessories and

ma terials, 321 Vacuum valves, 168

APV Mitchell (Dryers) Ltd Vacuum degassing equipment, 298 Vacuum drying and freezing equipment, 297

Aeroquip Corporation Vacuum accessories, 187

Aerovac Corporation Mass spectrometer leak detectors, 277 Penning gauges, 241 Residual gas analysers, 275 Residual gas analysers (magnetic deflection), 268-9 Sorption pumps, 135 Sputter-ion pumps, 138

Airco Temescal Deposition plant, 308,309 Electron beam welding equipment, 298, 299 Environmental chambers, 296 General pumping units, 297 Melting and alloy preparation equipment, 299 Quartz crystal monitors, 286 Rate meters, 289 Sputtering plant, 322 Thickness monitors, 288 Titanium sublimation pumps, 152 Turbomolecular pumps, 155 Vacuum accessories, 188 Vacuum evaporation systems, accessories and

materials, 321 Vacuum valves, 168

Alba Engineers Sputtering plant, 322

Alcatel Vacuum Techniques General pumping units, 297 Mass spectrometer leak detectors, 277 Penning gauges, 241-2 Positive displacement pumps, 88 Roots pumps, 130 Sputtering plant, 323 Thermocouple gauge heads, 213 Vacuum accessories, 188 Vacuum evaporation systems, accessories and

materials, 321 Alley Compressors Ltd

Positive displacement pumps, 88 Anaconda American Brass Co.

Vacuum accessories, 188 Analytical Instruments Ltd

Leak detection instruments, 283 Andonian Cryogenics Inc.

Cryopumps, 85 Environmental chambers, 296 General pumping units, 297 Vacuum accessories, 188 Vacuum valves, 169

Apiezon Products Ltd Vacuum accessories, 188-9

Atlas Copco (Great Britain) Ltd Positive displacement pumps, 89

Charles Austen Pumps Ltd Positive displacement pumps, 90

BDH Chemicals Ltd Vacuum evaporation accessories and materials, 321

BTl: Brad Thomson Industries Inc. Electron beam welding equipment, 298, 307

Henry Balfour & Co. Ltd Vacuum distillation equipment, 298 Vacuum drying and freezing equipment, 297

Balzers A.G. Bayard Alpert gauge heads, 246 Cryopumps, 85-6 Deposition plant, 308, 309-10 Electron beam welding equipment, 298, 307 Environmental chambers, 296 General pumping units, 297

411

412 MANUFACTURERS INDEX

Balzers A.G.-cont. Heat treatment equipment, 299 Hot cathode ionization gauge control units, 257 Leak detection instruments, 285 Melting and alloy preparation equipment, 299 Optical mm thickness monitors, 291 Penning gauges, 242 Pirani gauge heads, 209 Positive displacement pumps, 90-91 Quartz crystal monitors, 286 Rate meters, 289 Roots pumps, 130-1 Sputtering equipment, 322 Surface analysis instruments, 294 Thermal conductivity gauge control units, 215-7 Thermocouple gauge heads, 213 Thickness monitors, 288 Titanium sublimation pumps, 152 Triode gauge heads, 255 Turbomolecular pumps, 155 UHV metallurgy equipment, 299 Vacuum accessories, 189 Vacuum brazing equipment, 298 Vacuum degassing equipment, 298 Vacuum evaporation systems, accessories and

materials, 321 Vacuum furnaces, 300 Vacuum impregnation equipment, 297 Vacuum switching and relay units, 292 Vacuum valves, 169-71 Vapour pumps, 156

Barlow Whitney Ltd Environmental chambers, 296 Vacuum degassing equipment, 298 Vacuum impregnation equipment, 297 Vacuum ovens, 306

Bingham Willamette Co. Positive displacement pumps, 92

S. Blickman Inc. Vacuum dry boxes, 298

Borax Consolidated Ltd Vacuum evaporation accessories and materials,

321 Bosch & Noltes Apparaten

Positive displacement pumps, 92 Sas Ing. Brizio Basi & Co.

McLeod gauges, 229 Mechanical gauges, 232 Pirani gauge heads, 209 Positive displacement pumps, 92 Roots pumps, 131 Thermal conductivity gauge control units, 217 Thermistor gauge heads, 212 Thermocouple gauge heads, 213 Vacuum valves, 171 Vapour pumps, 156

Burckhardt Engineering Works Positive displacement pumps, 92-98

Biittner-Schilde-Hass Aktiengesellschaft Vacuum distillation equipment, 298

Vacuum drying and freezing equipment, 297 Vacuum impregnation equipment, 297

evC: Consolidated Vacuum Corporation Bayard Alpert gauge heads, 246

Cahn Division, Ventron Corporation Vacuum microbalances, 290

Cajon Co. Vacuum accessories, 189

Carbolite Company Ltd Vacuum furnaces, 300

Carrier Engineering Co. Ltd Environmental chambers, 296

Cenco, Central Scientific Co. Bayard Alpert gauge heads, 247-8 Deposition plant, 308,310 General pumping units, 297 Getter-ion pumps, 86 Hot cathode ionization gauge control units, 257 McLeod gauges, 229 Penning gauges, 242 Positive displacement pumps, 98-99 Sputter-ion pumps, 139 Thermal conductivity gauge control units, 217-8 Thermocouple gauge heads, 213 Triode gauge heads, 256 U-tube manometers, 231 Vacuum accessories, 190 Vacuum valves, 171-2 Vapour pumps, 157-8

Centorr Associates Inc. General pumping units, 297 Heat treatment equipment, 299 Melting and alloy preparation equipment, 299 UHV metallurgy equipment, 299 Vacuum brazing equipment, 298 Vacuum furnaces, 301

Ceramaseal Inc. Vacuum accessories, 190

Commonwealth Scientific Corporation Sputtering plant, 322

Cooke Vacuum Products Inc. Bayard Alpert gauge heads, 248 Deposition plant, 308, 310-1 Electron beam welding equipment, 299 Environmental chambers, 296 General pumping units, 297 Hot cathode ionization gauge control units, 258 Leak detection instruments, 284 McLeod gauges, 230 Penning gauges, 243 Pirani gauge heads, 209 Sorption pumps, 136 Sputtering plant, 322,323 Thermal conductivity gauge control units, 218 Thermocouple gauge heads, 213 Triode gauge heads, 256 UHV metallurgy equipment, 299 Vacuum accessories, 190 Vacuum degassing equipment, 298

Vacuum distillation equipment, 298 Vacuum drying and freezing equipment, 297 Vacuum evaporation systems, accessories and

materials, 321 Vacuum impregnation equipment, 297 Vacuum valves, 172 Vapour pumps, 158

The Crawford Fitting Co. Vacuum accessories, 191

Datametrics Mechanical gauges, 232-5

Davis and Wilder Inc. Deposition plant, 311

Dawson McDonald and Dawson Ltd Positive displacement pumps, 99

Denton Vacuum Inc. Deposition plant, 308, 311-3 General pumping units, 297 Heat treatment equipment, 299 Hot cathode ionization gauge control units, 258 Sputtering plant, 323 Vacuum accessories, 191 Vacuum brazing equipment, 298 Vacuum drying and freezing equipment, 297 Vacuum evaporation systems, accessories and

ma terials, 321 Vacuum furnaces, 301

Ditric Corporation Vapour pumps, 158

Diversey Corporation Vacuum accessories, 191

Dresser Industries Inc. Positive displacement pumps, 100 Roots pumps, 131

Dunellen Ltd Mechanical gauges, 235

Durco, The Duriron Co. Inc. Vacuum valves, 173

Edwards High Vacuum Aluminizing carts, 296 Bayard Alpert gauge heads, 248-9 Deposition plant, 308, 313-4 Deposition process controllers, 292 Environmental chambers, 296 General pumping units, 297 Getter-ion pumps, 86 Heat treatment equipment, 299 Hot cathode ionization gauge control units, 259 Leak detection instuments, 284 Mass spectrometer leak detectors, 278 McLeod gauges, 230 Mechanical gauges, 235 Melting and alloy preparation equipment, 299 Molecular distillation equipment, 298 Optical fIlm thickness monitors, 291 Penning gauges, 243 Pirani gauge heads, 210 Positive displacement pumps, 101-2

MAN U F ACT U R E R SIN 0 EX 413

Rate meters, 289 Residual gas analysers (magnetic deflection), 270 Roots pumps, 132 Sorption pumps, 136 Sputter-ion pumps, 139 Sputtering equipment, 322, 323 Thermal conductivity gauge control units, 219-20 Thermocouple gauge heads, 213 Thickness monitors, 288 Vacuum accessories, 191-2 Vacuum brazing equipment, 298 Vacuum degassing equipment, 298 Vacuum distillation equipment, 298 Vacuum drying and freezing equipment, 297 Vacuum evaporation systems, accessories and

ma terials, 321 Vacuum furnaces, 301-2 Vacuum impregnation equipment, 297 Vacuum switching and relay units, 292 Vacuum valves, 173-4 Vapour pumps, 159-60 Water-jet pumps, 167

Eisler Engineering Co. Aluminizing carts, 296

Electrical Research Association Sputtering plant, 322, 324

Electrotech Associates Deposition plant, 308 Rate meters, 289 Vacuum evaporation systems, accessories and

materials, 321 Elphiac S.A.

Melting and alloy preparation equipment, 299 Vacuum furnaces, 302

Evaporation Apparatus Vacuum evaporation systems, accessories and

materials, 321 Extranuclear Export Corporation

Residual gas analysers (quadrupole), 272

Ferrofluidics Corp. Vacuum accessories, 193

Fisons Scientific Apparatus Vacuum accessories, 193

Flextube Ltd Vacuum accessories, 193

Foster Cambridge Ltd Mechanical gauges, 236

Foxboro-Yoxall Ltd Mechanical gauges, 236

Furness Controls Ltd Leak detection instruments, 284 Mechanical gauges, 236

GEC Elliott Control Valves Ltd Vacuum valves, 173

GEC Ltd, Hirst Research Centre Bayard Alpert gauge heads, 249 McLeod gauges, 230

414 MANUFACTURERS INDEX

GTE Sylvania Inc. Vacuum evaporation systems, accessories and

materials, 321 Officine Galileo

Positive displacement pumps, 102 Gast Manufacturing Corp.

Positive displacement pumps, 102-5 Apparatebau Gauting GMBH

Positive displacement pumps, 105 Gelman Instrument Co.

Positive displacement pumps, 105 General Electric Company

Vapour pumps, 160 The General Engineering Co.

Deposition plant, 308 Environmental chambers, 296 General pumping units, 297 Heat treatment equipment, 299 Mechanical gauges, 237 McLeod gauges, 230 Melting and alloy preparation equipment, 299 Penning gauges, 243 Pirani gauge heads, 211 Positive displacement pumps, 106-9 Roots pumps, 132 Thermal conductivity gauge control units, 220 Thermocouple gauge heads, 213 Vacuum accessories, 193 Vacuum brazing equipment, 298 Vacuum degassing equipment, 298 Vacuum drying and freezing equipment, 297 Vacuum evaporation systems, accessories and

materials, 321 Vacuum furnaces, 303 Vacuum impregnation equipment, 297 Vacuum valves, 174 Vapour pumps, 160

S.A.E.S., Getters SpA Getter-ion pumps, 87

Granville-Phillips Co. General pumping units, 297 Getter-ion pumps, 86 Hot cathode ionization gauge control units, 259 Mechanical gauges, 237 Pirani gauge heads, 211 Thermal conductivity gauge control units, 221 Titanium sublimation pumps, 152 Vacuum accessories, 193 Vacuum valves, 174-5

Gresham & Craven Ltd Vacuum valves, 175

Hastings Raydist McLeod gauges, 230 Thermocouple gauge heads, 214 Thermal conductivity gauge control units, 221

Hattersley Newman Hender Ltd Mechanical gauges, 238

Hewlett Packard Ltd Leak detection instruments, 285

Hick Hargreaves Co. Ltd Positive displacement pumps, 109 Roots pumps, 13 2 Steam ejector pumps, 146 Vapour pumps, 160

High Vacuum Equipment Corporation Environmental chambers, 296

High Voltage Engineering Ltd Bayard Alpert gauge heads, 249 Environmental chambers, 296 Vacuum accessories, 194 Vacuum valves, 175

Hoke International Ltd Vacuum accessories, 194 Vacuum valves, 175-6

Hotpack Corporation Vacuum drying equipment, 297

Hull Corp. Deposition plant, 308 Vacuum drying and freezing equipment, 297 Vacuum evaporation systems, accessories and

materials, 321 Vacuum impregnation equipment, 297

Huntington Mechanical Laboratories Inc. Vacuum accessories, 194

Industrial Electron Beams (BOC) Electron beam welding equipment, 298, 299, 307

Ingersoll Rand Co. Ltd. Positive displacement pumps, 109

International Vacuum Inc. Deposition plant, 308, 314 Electron beam welding equipment, 298, 299, 307 Environmental chambers, 296 General pumping units, 297 Heat treatment equipment, 299 Melting and alloy preparation equipment, 299 Sputtering plant, 322,324 UHV metallurgy equipment, 299 Vacuum brazing equipment, 298 Vacuum drying and freezing equipment, 297 Vacuum evaporation systems, accessories and

materials, 321 Vacuum furnaces, 303 Vacuum impregnation equipment, 297

Ion Beam Systems Sputtering plant, 322,324-5

Ion Equipment Corp. Deposition plant, 308, 314 Residual gas analysers (quadrupole), 272 Sorption pumps, 136 Sputter-ion pumps, 139-40 Sputtering plant, 322,325-6 Titanium sublimation pumps, 152 Vacuum accessories, 194 Vacuum valves, 176

Ipsen Industries Heat treatment equipment, 299 Vacuum brazing equipment, 298 Vacuum furnaces, 303

The Jet-Vac Corp. Steam ejector pumps, 146

Jigtool High Vacuum Positive displacement pumps, 109

o. Jiinker GMBH Melting and alloy preparation equipment, 299 Vacuum furnaces, 303

Kinney Vacuum Co. Deposition plant, 308,315 General pumping units, 297 McLeod gauges, 230 Penning gauges, 243 Positive displacement pumps, 109-12 Roots pumps, 133 Thermal conductivity gauge control units, 221 Thermistor gauge heads, 212 Thermocouple gauge heads, 214 Vacuum accessories, 194 Vacuum degassing equipment, 298 Vacuum distillation equipment, 298 Vacuum impregnation equipment, 297 Vacuum valves, 176-7 Water-jet pumps, 167

The Kraissl Co. Inc. Positive displacement pumps, 112

Kronos Inc. Deposition process controllers, 292 Quartz crystal monitors, 286-7 Rate meters, 289 Thickness monitors, 288

LKB-Produkter AB Pirani gauge heads, 211 Thermal conductivity gauge control units, 221

Larson Electronic Glass Vacuum accessories, 195

Laser Optics Ltd Optical mm thickness monitors, 291

Leybold-Heraeus GMBH & Co. KG Aluminizing carts, 296 Bayard Alpert gauge heads, 250 Deposition plant, 308 Electron beam welding equipment, 298, 299, 307 Environmental chambers, 296 General pumping units, 297 Heat treatment equipment, 299 Hot cathode ionization gauge control units, 260 Leak detection instruments, 285-6 Mass spectrometer leak detectors, 278 McLeod gauges, 230 Mechanical gauges, 238 Melting and alloy preparation equipment, 299 Molecular distillation equipment, 298 Penning gauges, 243 Pirani gauge heads, 211 Positive displacement pumps, 113-5 Residual gas analysers, 276 Roots pumps, 134-5 Sorption pumps, 136

MANUFACTURERS INDEX 415

Sputter-ion pumps, 140 Sputtering plant, 322 Steam ejector pumps, 146 Thermal conductivity gauge control units, 222-3 Titanium sublimation pumps, 153 Triode gauge heads, 256 Turbomolecular pumps, 155 UHV metallurgy equipment, 299 U-tube manometers, 231 Vacuum accessories, 195-7 Vacuum brazing equipment, 298 Vacuum degassing equipment, 298 Vacuum distillation equipment, 298 Vacuum drying and freezing equipment, 297 Vacuum evaporation systems, accessories and

materials, 321 Vacuum impregnation equipment, 297 Vacuum valves, 177-9 Vapour pumps, 161-3 Water-jet pumps, 167

Lucifer AG Vacuum valves, 179

Ch. Lumpp & CIE Positive displacement pumps, 115-6 Vacuum valves, 179

MKS Instruments Inc. Mechanical gauges, 239

Materials Research Corporation Sputtering plant, 322, 326 Vacuum accessories, 197 Vacuum valves, 179

Metals Research Ltd Heat treatment equipment, 299 Melting and alloy preparation equipment, 299 Vacuum brazing equipment, 298 Vacuum furnaces, 303

Mettler Instruments AG Vacuum microbalances, 290

Microtol Engineering Corporation General pumping units, 297

Mill Lane Engineering Co. Inc. Bayard Alpert gauge heads, 250 Deposition plant, 308 Environmental chambers, 296 General pumping units, 297 Sputtering plant, 322 Triode gauge heads, 256 Vacuum evaporation systems, accessories and

materials, 321 Vacuum valves, 179

Monsanto Co. Vacuum accessories, 197

J. Montz GMBH Vacuum distillation equipment, 298

NGNLtd Penning gauges, 244 Pirani gauge heads, 212 Positive displacement pumps, 116

416 MANUFACTURERS INDEX

NGN Ltd -cont. Thermal conductivity gauge control units, 223 Vacuum accessories, 198 Vacuum valves, 180 Vapour pumps, 163

Nanotech (Thin Films) Ltd Deposition plant, 308, 315 Environmental chambers, 296 General pumping units, 297 Penning gauges, 244 Pirani gauge heads, 212 Thermal conductivity gauge control units, 224 Vacuum accessories, 198 Vacuum degassing equipment, 298 Vacuum evaporation systems, accessories and

materials, 321 Vacuum impregnation equipment, 297 Vacuum valves, 179-80

The Nash Engineering Co. Positive displacement pumps, 117-8

Neslab Instruments Inc. Vacuum accessories, 198

Neuman & Esser Positive displacement pumps, 118-9

New Jersey Machine Corporation Positive displacement pumps, 119

Neyrpic Vacuum valves, 180

Nordiko Ltd Sputtering plant, 322, 326-7 Vacuum accessories, 198

Northey Rotary Compressors Ltd Positive displacement pumps, 120-2

Nuclide Corporation Electron beam welding equipment, 298, 307 Hot cathode ionization gauge control units, 260 Melting and alloy preparation equipment, 299 Residual gas analysers (magnetic deflection), 270 Thermal conductivity gauge control units, 224 Vacuum furnaces, 303

Nupro Co. Vacuum valves, 180

Ormandy & Stollery Ltd Thermal conductivity gauge control units, 224 Thermocouple gauge heads, 214

Oxy Metal Finishing (Great Britain) Ltd Heat treatment equipment, 299 Vacuum brazing equipment, 298 Vacuum furnaces, 304

Penberthy Division, Houdaille Industries Inc. Steam ejector pumps, 146-9

Penn walt Corporation Deposition plant, 316 McLeod gauges, 231 Penning gauges, 244 Positive displacement pumps, 122 Roots pumps, 135 Vacuum degassing equipment, 298

Vacuum drying and freezing equipment, 297 Vacuum impregnation equipment, 297

A. Pfeiffer Vakuumtechnik GMBH McLeod gauges, 231 V-tube manometers, 231

Phonix Armaturen-Werke Vacuum valves, 181

Physical Electronics Industries Inc. Surface analysis instruments, 294

GV Planer Ltd Deposition plant, 308, 316-7 Sputtering plant, 322

Pope Scientific Inc. General pumping units, 297 McLeod gauges, 231 V-tube manometers, 231 Vacuum accessories, 198 Vapour pumps, 164

Precision Scientific Corporation Positive displacement pumps, 123 Vapour pumps, 164

Printa Inks & Paints Ltd Vacuum evaporation coating materials, 321

Ralet-Defay Water-jet pumps, 168

Red Point Corporation General pumping units, 297 Positive displacement pumps, 123 Vacuum autoclaves, 298 Vacuum impregnation equipment, 297 Vacuum ovens, 306

RIBER Bayard Alpert gauge heads, 251 Environmental chambers, 296 General pumping units, 297 Hot cathode ionization gauge control units, 260-1 Residual gas analysers (quadrupole), 272-3 Sorption pumps, 136 Sputter-ion pumps, 140 Titanium sublimation pumps, 153 Vacuum accessories, 198 Vacuum evaporation systems, accessories and

materials, 321 Vacuum valves, 181

Ricor Ltd General pumping units, 297 Vacuum furnaces, 304

Sadla Vac Ltd General pumping units, 297 Penning gauges, 244 Pirani gauge heads, 212 Thermal conductivity gauge control units, 225 Thermocouple gauge heads, 214 Vacuum accessories, 199

Sargent-Welch Scientific Co. Positive displacement pumps, 124 Turbomolecular pumps, 155

Schut Armaturen GMBH Vacuum valves, 182

Schutte and Koerting Co. Steam ejector pumps, 149-51 Water-jet pumps, 168

Shawfrank Engineering Corporation Aluminizing carts, 296

Sigma Laboratories Inc. Vacuum accessories, 199

Sihi GMBH and Co. General pumping units, 297 Positive displacement pumps, 125-7 Roots pumps, 135

Sloan Technology Corporation Deposition plant, 308, 317 Deposition process controllers, 292 Ionization monitors, 291 Quartz crystal monitors, 287 Rate meters, 289 Thickness monitors, 288 Vacuum accessories, 199

Smith-Dennis Ltd Mechanical gauges, 239

Spirax Sarco Ltd. Vacuum accessories, 199

G. Springham and Co. Ltd Vacuum accessories, 199-200

Stanton Redcroft Vacuum microbalances, 290

Technics Inc. Sputtering plant, 322

Teltron Ltd General pumping units, 297 Positive displacement pumps, 127 Vacuum valves, 182 Vapour pumps, 164

Tenney Engineering Inc. Environmental chambers, 296

Thelco Vacuum ovens, 306

Thermo Electron Engineering Corporation Heat treatment equipment, 299 Vacuum brazing equipment, 298 Vacuum furnaces, 304

ThomsonCSF Residual gas analysers (magnetic deflection), 270

Torr Vacuum Products Bayard Alpert gauge heads, 251 Environmental chambers, 296 Hot cathode ionization gauge control units, 261 Sorption pumps, 136 Thermal conductivity gauge control units, 226 Vacuum accessories, 200-1 Vacuum valves, 182 Vapour pumps, 164

Torvac Ltd Electron beam welding equipment, 298, 299, 307 Heat treatment equipment, 299 Vacuum accessories, 201

MANUFACTURERS INDEX 417

Vacuum brazing equipment, 298 Vacuum evaporation systems, accessories and

materials, 321 Vacuum furnaces, 304

Twentieth Century Electronics Ltd Hot cathode ionization gauge control units, 262 Mass spectrometer leak detectors, 279-80 Residual gas analysers (quadrupole), 273

U.H.V. Ltd Bayard Alpert gauge heads, 251 Environmental chambers, 296 General pumping units, 297 Hot cathode ionization gauge control units, 262 Penning gauges, 244 Sorption pumps, 136 Thermal conductivity gauge control units, 226 Vacuum accessories, 201 Vacuum degassing equipment, 298 Vacuum drying and freezing equipment, 297 Vacuum evaporation systems, accessories and

materials, 321 Vacuum impregnation equipment, 297 Vacuum valves, 182

Ultek Division, Perkin Elmer Corporation Bayard Alpert gauge heads, 251 Deposition plant, 308, 318 Environmental chambers, 296 General pumping units, 297 Heat treatment equipment, 299 Hot cathode ionization gauge control units, 262 Leak detection instruments, 286 Melting and alloy preparation equipment, 299 Quartz crystal monitors, 287 Rate meters, 289 Residual gas analysers, 276 Sorption pumps, 137 Sputter-ion pumps, 141-2 Sputtering plant, 322,327 Thickness monitors, 288 Titanium sublimation pumps, 153 UHV metallurgy equipment, 299 Vacuum accessories, 201-2 Vacuum evaporation systems, accessories and

materials, 321 Vacuum valves, 182-3

Union Carbide Corp. Vacuum evaporation accessories and materials, 321

VG Micromass Ltd Residual gas analysers (magnetic deflection), 270-1

VacTorr General pumping units, 297 Hot cathode ionization gauge control units, 263 Thermal conductivity gauge control units, 226 Vacuum accessories, 204-5 Vacuum drying and freezing equipment, 297

Vactronic Laboratory Equipment Inc. Bayard Alpert gauge heads, 252

418 MANUFACTURERS INDEX

Vactronic Laboratory Equipment Inc.-cont. Deposition plant, 308 Environmental chambers, 296 General pumping units, 297 Hot cathode ionization control units, 263 Sputtering plant, 322 Thermal conductivity gauge control units, 227 Vacuum accessories, 202 Vacuum evaporation systems, accessories and

materials, 321 Vacuum impregnation systems, 297 Vacuum valves, 183 Vapour pumps, 165

Vacudyne Corporation Environmental chambers, 296 Vacuum degassing equipment, 298 Vacuum distillation equipment, 298 Vacuum drying and freezing equipment, 297 Vacuum impregnation equipment, 297

Vacuum Accessories Corporation of America Vacuum accessories, 202 Vacuum valves, 183-4

Vacuum Barrier Corporation General pumping units, 297 Vacuum accessories, 202

Vacuum Engineering (Scotland) Ltd Heat treatment equipment, 299 Melting and alloy preparation equipment, 299

Vacuum Generators Ltd Bayard Alpert gauge heads, 252 Deposition plant, 308 General pumping units, 297 Hot cathode ionization gauge control units, 263 Pirani gauge heads, 212 Sorption pumps, 137 Sputtering plant, 322 Surface analysis instruments, 295 Thermal conductivity gauge control units, 227 Titanium sublimation pumps, 153 UHV metallurgy equipment, 299 Vacuum accessories, 203-4 Vacuum evaporation systems, accessories and

materials, 321 Vacuum valves, 184-5

Vacuum Industries Inc. Deposition plant, 308,319 General pumping units, 297 Heat treatment equipment, 299 Melting and alloy preparation equipment, 299 Sputtering plant, 322,328 Vacuum brazing equipment, 298 Vacuum evaporation systems, accessories and

materials, 321 Vacuum furnaces, 304

Vacuum Research Manufacturing Co. Vacuum accessories, 204

Varian Bayard Alpert gauge heads, 252-3 Deposition plant, 308,319 Heat treatment equipment, 299

Hot cathode ionization gauge control units, 264-5 Mass spectrometer leak detectors, 280-1 Melting and alloy preparation equipment, 299 Penning gauges, 244 Positive displacement pumps, 127 Quartz crystal monitors, 287 Rate meters, 289 Residual gas analysers (quadrupole), 274 Sorption pumps, 137 Sputter-ion pumps, 143-4 Sputtering plant, 328-9 Surface analysis instruments, 295 Thermal conductivity gauge control units, 227-8 Thermocouple gauge heads, 214 Thickness monitors, 288 Titanium sublimation pumps, 154 Triode gauge heads, 256 UHV metallurgy equipment, 299 Vacuum accessories, 205-6 Vacuum brazing equipment, 298 Vacuum freezing and drying equipment, 297 Vacuum furnaces, 304-5 Vacuum process controllers, 293 Vacuum switching and relay units, 293 Vacuum valves, 185 Vapour pumps, 165-6

Veeco Instruments Inc. Bayard Alpert gauge heads, 254 Deposition plant, 308, 319-20 General pumping units, 297 Getter-ion pumps, 87 Hot cathode ionization gauge control units, 266-7 Leak detection instruments, 285 Mass spectrometer leak detectors, 282 Penning gauges, 245 Positive displacement pumps, 128 Residual gas analysers, 276 Residual gas analysers (magnetic deflection), 271 Sorption pumps, 137 Sputter-ion pumps, 144-5 Sputtering plant, 322, 329-30 Surface analysis instruments, 296 Thermal conductivity gauge control units, 229 Thermocouple gauge heads, 214 Titanium sublimation pumps, 154 Triode gauge heads, 256 Turbomolecular pumps, 155 Vacuum accessories, 206-8 Vacuum evaporation systems, accessories and

materials, 321 Vacuum furnaces, 305 Vacuum impregnation equipment, 297 Vacuum process controllers, 293 Vacuum valves, 185-6 Vapour pumps, 166

Ventron Corporation Vacuum evaporation systems, accessories and

materials, 321 J. M. Voith GMBH

Positive displacement pumps, 128-30

Vir tis Co. McLeod gauges, 231 Vacuum drying and freezing equipment, 297

Wallace & Tiernan Ltd Mechanical gauges, 239-40 Vacuum valves, 186

K. Weiss-Giessen Environmental chambers, 296

Wentgate Engineers Ltd Electron beam welding equipment, 298, 299, 307 Heat treatment equipment, 299

MANUFACTURERS INDEX 419

Vacuum brazing equipment, 298 Vacuum furnaces, 305

Westinghouse Positive displacement pumps, 130

Whitey Co. Vacuum valves, 186-7

Weigand Apparatebau GMBH Steam ejector pumps, 151

Wild Barfield Ltd Heat treatment equipment, 299 Melting and alloy preparation equipment, 299 Vacuum brazing equipment, 298 Vacuum furnaces, 305-6

Equipment Index

Auger spectrometers (see surface analysis instruments) Autoclaves (see vacuum autoclaves)

Baffles (see vacuum accessories) Base plates (see vacuum accessories) Bayard Alpert gauge heads, 246-54 Bell jars (see vacuum accessories) Bourbon gauges (see mechanical gauges)

Capsule gauges (see mechanical gauges) Coating materials (vacuum evaporation), 321 Cold cathode ionization gauges, 241-5 Cold traps (see vacuum accessories) Collars (see vacuum accessories) Compression manometers, 229-31 Couplings (see vacuum accessories) Cryopumps, 85-6

Deposition plant, 308-20 Deposition process controllers, 292 Diaphragm gauges (see mechanical gauges) Diffusion pumps, 156-66

Ejector pumps, 156-66 Electron beam welding equipment, 298-9, 307 Electron diffraction units (see surface analysis

instruments) Environmental chambers, 296 Exhaust carts, 296

Feed-throughs (see vacuum accessories) Flanges (see vacuum accessories)

Gaskets (see vacuum accessories) General pumping units, 296-7 Getter-ion pumps, 86 Greases (see vacuum accessories)

Heat treatment equipment, 299 HEED equipment (see surface analysis instruments) Hot cathode ionization gauges,

control units, 257-67 heads, 246-56

Ion probes (see surface analysis instruments) Ionization monitors, 291

420

Leak detectors mass spectrometer leak detectors, 277-82 search gas leak detectors, 283-6

LEED equipment (see surface analysis instruments) Liquid-ring pumps, 88-130

Magnet-less ion pumps, 87 Magnetron gauges (see Penning gauges) Mass spectrometer leak detectors, 277-82 McLeod gauges, 229-31 Mechanical gauges, 232-40 Melting and alloy preparation equipment, 299 Metallurgy equipment, 298-307 Microbalances, 290 Molecular distillation equipment, 298

Non-evaporable getter pumps, 87

Oils and pump fluids (see vacuum accessories) Optical film thickness monitors, 291

Penning gauges, 241-5 Pirani gauge heads, 209-12 Piston pumps (see positive displacement pumps) Positive displacement pumps, 88-130 Process controllers, 293

Quartz crystal surface density monitors, 286-7

Rate meters, 289 Relay units, 292-3 Residual gas analysers, 268-76 RHEED equipment (see surface analysis instruments) Roots pumps, 130-5 Rotary pumps, 88-130 Rotary piston pumps, 88-130 Rough vacuum pumps, 88-130

Search gas leak detectors, 283-6 SHEED equipment (see surface analysis instruments) Sliding vane rotary pumps, 88-130 Sorption pumps, 135-7 Sputter-ion pumps, 138-45 Sputtering plant, 322-30 Steam ejector pumps, 146-51

Strip or roll coating systems, 321 Substrate cleaning systems, 321 Surface analysis instruments, 294-6

Thermal conductivity gauges, control units, 215-29 heads, 209-14

Thermistor gauge heads, 212 Thermocouple gauge heads, 213-4 Thickness monitors, 288 Titanium sublimation pumps, 151-4 Triode gauge heads, 255-6 Turbomolecular pumps, 154-5

UHV metallurgy equipment, 299 U-tube manometers, 231

Vacuum accessories, 187-208 Vacuum autoclaves, 298

EQUIPMENT INDEX 421

Vacuum brazing equipment, 298 Vacuum degassing equipment, 298 Vacuum distillation equipment, 298 Vacuum drying equipment, 297 Vacuum evaporation systems, 321 Vacuum freezing equipment, 296 Vacuum furnaces, 300-6 Vacuum impregnation equipment, 297 Vacuum metallurgy equipment, 298-307 Vacuum micro balances, 290 Vacuum ovens, 306 Vacuum valves, 168-87 Vapour pumps, 156-66 Vapour sources, 319 Viewing ports (see vacuum accessories)

Water-jet pumps, 167-8 Waxes (see vacuum accessories)

Subject Index

Accommodation coefficient of ion, 376 Aluminium, sputtering of, 390, 396, 397,398 Apiezon, 59, 61, 63 Arochlor, 59, 63 Aston's equations for glow discharge, 389 Atmosphere, partial pressures of gases in the, 13 Atomic Mass Unit, 17 Auger electron emission, 355, 356,358,360 Auger electron spectrometer, 356, 357

Back-diffusion, 1 Backscattering,

of ions, 361,362,363,370,376 of neutrals, 376 of nitrogen, 376

Back-streaming, 1 from diffusion pumps, 80 from dry stage pumps, 69 from positive displacement pumps, 337 from pumps (general), 56, 80, 82 from rotary oil, 66, 68, 70, 80, 82 of lubricants, 405 reduction by trapping, 54

Bias sputtering, 400 Blocking, 362, 363, 371 Booster pump fluids, 63

Cellulube,68 Ceramics, 5

alumina, 5, 6 beryllia,6 magnesia, 6 zircon, 5

Channelling, 362, 371 Chemisorption, 2 Chlorinated hydrocarbon oils, 63 Chlorotrifluoroethylene pump oil, 68 Clausing coefficient, 31, 32 Clophen, 59, 63 Cold cathode discharge, 368 Condensation,

coefficient of, 57 in vacuo, ra te of, 57

Conductance between two cross sections, 19

422

entrance, 20, 22 laminar flow, 26, 27 molecular flow (see Conductance, molecular flow) orifice, 20 transition flow, 28 turbulent flow (circular cross section), 24

Conductance, Molecular Flow, composite system, 38 long cylindrical tubes, 29 pumps and components, 41 short tubes, annulus, 33 short tubes, circular, 31 short tubes, rectangular, 35 short tubes, short slit, 35

Convaclor,63 Convalex, 59 Convoil, 59, 63 Copper, sputtering of, 373, 376,378,379,390,393,396 Critical pressure ratio (high speed flow), 25 Cryopumps, 347 Cryosorption panels, 347 Cryosublimation trap, 348

Degassing, 2 maximum temperatures for metals and graphite, 7

Density of gas, 17, 54 Dillelen,62 Diffusion pumps (see vapour stream pumps) Diode sputtering systems, 381, 395 Dry stage pumps,

backstreaming from, 69 lubrication of, 69

Elastomers, 6 outgassing rates of, 6 permea tion constants for, 12 polyimide, 6 vapour pressures of, 10 Viton A, 6

Electron diffraction, 352, 353 Electron microprobe, 358, 359, 360 Electron spectroscopy for chemical analysis, 360,361 Ellipsometer instrument, 351, 352 Energy analysers, 356, 357, 360, 361 Enthalpy controlled flow, 25

Equation of State, 17 ESCA, 360, 361 Esters,

as pump oils, 70 composition of, 71 properties of, 71 trade names of, 71

Evaporation, coefficient of,S 7 in vacuo, rate of, 57

Evaporation rates of metals in vacuo, 9

Flow regimes, 22 Fluoropolyether oils,

mass spectra of, 78 properties of, 68, 70, 78 resistance to polymerization, 79

Fluorosilicone oils, 68, 77 Fomblin,77 Friction factor, 24 Fyrquel,68

Getter-ion pumps, 342 electrostatic, 344 sputter-ion types, 342

differential, 342 Getter pumps, 342

non-evaporable, 345 titanium sublimation, 345

use of surface at liquid nitrogen temperature, 345 use of titanium-molybdenum, 345

Getter sputtering, 381,404 Glasses, 2

aluminosilicate, 14 effect on gas evolution of bake-out, 3 gases from unbaked, 3 maximum bake-out temperatures for, 3 permeation of gases through, 13, 14

Glow discharge, sputtering in, 368 Gold, sputtering of, 371, 375, 376, 390,400,401 Graflon,338 Greases,

Apiezon,63 Fomblin,80 Krytox,80 Lithelen, 64 silicone, 77

HEED, 354 High speed flow, 25

Implantation of neutrals, 398,400 Ion blocking pattern, 362, 363, 371 Ion channelling, 362, 371 Ion imaging (SIM), 365 Ion implantation, 370 Ion microprobe, 365 Ion scattering microscope, 362, 363 Ion scattering spectrometer, 361, 362 Ionization gauge sensitivities,S 2, 53

Knudsen number, 22

Laminar flow, 23, 26 Leakage, 1 LEED,353

SUBJECT INDEX 423

LEED instrument for Auger electron spectrometry, 356

Mass flow rate, 19 Maxwell's distribution, 15 Mean free path, 16, 54 Mechanical booster, 338 Mica, 6, 14 Mineral oils,

for lubrication, 65, 69 for diffusion pump use, 61, 62 oxygen reaction with, 68 vapour pressures of, 59, 67

Molecular density, 18,20,21 Molecular diameter, 16,54 Molecular drag pumps, 348

characteristics, 403 turbomolecular pump (test), 47 tubomolecular types of, 338

vertical design of, 339 Molecular flow,

conductance (see Conductance) flow pattern, 37 intensity distribution, 36

Molecular flux, 19, 20, 21 Molecular velocities, 15 Molecular weight, 17,54

Octoil,71 Outgassing, 1, 2

from various materials in vacuo, 4 of untreated refractory materials,S rates from polymers, 6 within uhv systems, 7

Partial pressure measurement in sputtering, 403 Penning sputtering system, 382, 386 Per mea tion, 1

coefficient (or constant), 11 coefficients for some elastomers and polymers, 12

for mica, 14 for various gas-metal combinations, 12

of gases through glasses, 13 solids, 11

Petroleum distillates, 61 (see also mineral oils)

Photoelectron spectroscopy, 361 Physical constants, 51 Physical properties of gas,S 2 Physisorption, 2 Plasma anodization, 401 Polymers,S

Araldite, 4, 5 Nylon, 4 outgassing of, 6 permeation coefficients for, 12

424 SUBJECT INDEX

Polymers-cont. polytetrafluoroethylene (ptfe), 4 polyvinyl chloride (pvc), 4 vapour pressures of, 10

Polyphenylether oils, mass spectra of, 72 properties of, 71

Positive displacement pumps, 337 dry or oil-free mechanical rotary types, 338 oil-sealed mechanicalrotary types, 337

back-streaming from, 337 traps for, 338

test dome and test for, 47 trochoid rotary pumps, 338 Wankel type, 338

Pressure measurement in sputtering, 389, 403 Pressure units,S 0 Pump down time, 43 Pump oils,

bond strengths of, 60 chemical types of, 58 frictional degradation of, 54, 66, 68 molecular weight of,54 thermal degradation of, 54 vacuum performance of, 54

Pumping speed (or volume rate of flow), 1, 18, 21,42, 44,45

Quantity of gas, amount of substance, 17 amount of substance conversion table, 50 pressure volume product, 17

Radio frequency, plasma formation, 384 sputtering, 384, 394,403,404 sputtering, electron bombardment in, 399

Reactive sputtering, 370, 377, 403 RHEED, 353, 354 Rotary pump oils,

fluid degradation of, 54, 68 mass spectra of, 66

Santovac 5, 71,72 Scanning electron microscopy (SEM), 357,358 Scanning electron diffraction, 354 Sealing compounds, 54,61,64,65,77 Secondary electron emission, 355, 388 Secondary ion emission, 364, 388 Secondary ion mass spectrometer, 364 Secondary ion microprobe, 365 SEM, 357, 358 Silica, sputtering of, 373, 386, 390, 392, 394,403 Silicone,

chemical composition of, 72, 73, 74 lubricants, 74 optical properties of, 77 pump oils, 72 vapour pressures of, 73, 74, 75, 76 viscous oils, 76

SIMS, 364

Space simulation chamber pumping, 345, 346 Sputter-ion pumps, pumping speed test, 45 Sputter-ion pumps, test dome, 46 Sputtered film thickness distribution, 394 Sputted particles,

emission laws for, 391, 394 energy distribution of, 376, 380 reaction force of, 378 transport in gas of, 369, 391,393

Sputtering, alloys, 369 chemical, 370 collision sequences in target, 371 critical energy for, 372 ion energy release, 371 physical, 370 polymers, 370, 372 target contamination, 397, 402 transmission in target, 371,372

Sputtering systems, 381 cold cathode, 381 crossed field, 382 diode, 381, 395 ion beam, 386 plasma probe, 383 r.f., 383,394 triode, 383

Sputtering yield, 388 effect of gas adsorption on, 402 effect of ion incidence on, 373 effect of target temperature on, 375 effect of topography on, 392 preferred emission angle, 373 values of, 390

Static S1M, 364 Steel, stainless, 2

effect of bake-out on gas evolution from, 3 evolution of gases from, 6 gases from unbaked, 3 permeation of hydrogen from the atmosphere

through, 11 STEM,358 Sublimation pumps (see Getter pumps)

Tantalum, sputtering of, 375,388, 390, 398, 401

onPTFE,402 Thermal spikes, 375 Throughput, 1,18, 22,51 Throughput conversion table, 51 Time constant for vacuum system, 43 Transition and slip flow, 23, 27, 28 Transmission probability, 20, 38, 39 Triode sputtering system, 383 Turbomolecular pumps (see molecular drag pumps) Turbulent flow, 23, 24

Ultimate pressure, 1 Ultimate pressure,

of oil pump, 83 measurement of, 45, 55

Vacuum pumps; recent developments, 337 Vacuum system design for sputtering, 403, 404 Vapour pressures,

of mercury at various temperatures, 9 of oils, 59

dependence on temperature, 58 measurement of, 56

of some gases, 10 of some organic liquids, 9 of some outgassed plastics and elastomers, 10 of water at various temperatures, 9 of water, mercury and carbon dioxide at the tempera­

ture of various refrigerants, 10 saturated values of for elements, 8

Vapour pumps, pumping speed test, 44

SUB J E C TIN D EX 425

Vapour pumps, test dome, 44 Vapour stream pumps,

backing pressure, 60 boiler temperature,S 8, 60

Viscosity of gas, 16, 54 Viscous laminar flow, 23, 26 Volume rate of flow, 18 Volume rate of flow conversion table, 50

Water vapour pumping capacity, 48 Water vapour tolerance, 48 Waxes, 63, 64

Zinc sulphide, sputtering of, 390,403

INDEX TO ADVERTISERS

Balzers Chapman and Hall Ltd Edwards High Vacuum Leybold-Heraeus Ltd MKS Instruments, Inc Montedison S.p.A. Perkin-Elmer Ultek, Inc Shell Chemicals Torvac Ltd Twentieth Century Electronics Ltd

Advertising agents: T. G. Scott & Son Ltd 1 Clements Inn London WC2A 2ED

facing page 169 facing pages 168, 238

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Back of jacket facing page 200 facing page 279

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