Grautonlithographie-2019.indd4 5 6
F R A U N H O F E R I N S T I T U T E F O R A P P L I E D O P T I C S A N D P R E C I S I O N E N G I N E E R I N G I O F
GRAYSCALE LITHOGRAPHY ON PLANAR AND NONPLANAR SURFACES
4 200 mm master wafer carrying
Fresnel lenses.
chromatic aberration control.
writing grayscale photo-lithography enables
microstructures for the implementation
solutions for micro refractive and diffractive
optical elements, even on non-standard or
non-fl at surfaces, can be realized in close
collaboration with design and integration.
Technical data
- High dynamic dosage control at 405 nm
exposure wavelength
- Maximum writing fi eld size: 0.5 × 0.5 m2
Realization of
data for various applications
photo resist:
diverse materials
Typical applications
regular or chirped arrangement
- Micro-prism, Fresnel lenses, kinoforms
- Diffractive correcting elements for
spherical and chromatic aberrations
every substrate geometry
Albert-Einstein-Straße 7
07745 Jena
robert.leitel@iof.fraunhofer.de
www.iof.fraunhofer.de
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