塾. N1戸戸口N IくAYAKU [ニロ,[:「ロ..゛,"即脱0"紅 0"印に心"臼.、'.0脚0",臼

UV CURABLE RESINS

for FPD MATERIALS

NIPPONKAYAKU CO., LTD.

Functional chemicals R&D Labolatories Group l

31-12, shim03・chome, Kita・ku, Tokyo,115-8588, Japan

FAX :+81-3.3598-5431TEL :+81-3-3598.5100

C叩"冷hloNIPPON KAYA刈CO. L"

20IV4/26

Con力'denti引

や. NIPP口N IくAYAKU 区口,に「ロ.^^ FUNC「10N貞L CH走MIC真1.S 武E3. L轟"0"'T0角作S

Uv curable Resins for FPD

Process

Exposure

Development

Demand

Characteristics

Post cure

R日liab11ity of film

Sensitivlw

Line width of marginResidue

Rate ofresldua1 例m

Tg

Heat Reslstance

Adheslon(Humid卿Resi5tanC田

2011/4126

Con力dentlal

Materials

Key Mat引ials

MU川functional

Monomers

.01四omers

CO0"司hloNIPPONKAYA凧Ico ud

Binderresins

0

0Developing evaluationDMA、TG/DTA (Film)

0

2

◎

◎

◎

0

◎ 0

や.NIPP口N IくAYA141仁口,ι:m.^^ FU"crloN貞L CM走MIC轟L$"モ$. LA凹OHATOHIE5

Multifunctional

Monomers

C叩"冷hloNIPPON KAYA風.1CO,.LW

201ν4126

Conガden力冷1

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3

MU能ifunctional Monomers

DPHA

Acryloyl equivalent

(theorical valU田

Tg (DMA)

Vvater

absorption ratio

96 gleq

43゜C

Formula

3.6%

DPCA60

211 gleq

68 ゜C

Feature$

C叩卸01、t NIPPONICAYA脚Co ud

201ν4126

Con打denガal

0.8%

DPEA・12

185 gleq

65 ゜C

. High

Sensitivity

No data

4

FM、700

・ Flexibility

.water

resistance

105 gleq

89 ゜C

No data

^、1

・Good

d巳νelopabiliw

Confidential

・High resolution

.Adheslon lo

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MU龍ifunctional Monomers

Developing evaluation

CompositionMethacrylic copolymer

侶ZMNMMNMA(AA), MW=15,000, AV=160mgKOH/g)Monomer

Irgacure 184Irgacure oxE・02

Process Coating (Glass, applicator,20~30μ m)

Prebake (80゜C12min.)

Exposure (10omJ/cm2)

DeV巳10pment(1% Na.CO. aq.)

Postbake (20O C11min.)

C叩Yr19hlo NIPPONKAYAκⅡCO. ud

201ν4/26

Conガdenガal

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7

Multifunctional Monomers

Developing evaluation -Break point-

DPHA

50

67

DeV巳10ping tlme(S)

Rate of residualfilm

(EXPOS山e area ,%)

PE丁一30

Developin宮 time (S)

Rate ofresidua1州m

(Exposure area ,%)

100

FM-700

40

COOYrohl

201ν4尼6

Conガdential

RP-1040

NIPPON KAYAlnloo L峠

100

100

GPO-303

DPCA-60

40

100

100

DPHA-40H

8

DPEA-12

100

100

KU-201-M20

20

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Multifunctional Monomers

High resolution !

201114126

Conガdentlal

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Acryloyl equivalent (g/eq.)

(= sensitivi

9

Oligomers(pevelopable

201ν4126

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ZAR- series (Multifunctional Bis-A )

ZFR- series (Multi兪"1nctional Bis-F )

Acid value (m底KOH/宮) 98

Diluting solvent PGMEA

C010r (Gardner)

MW 8,000

Acryloyl equivalent (且/eq.) 450

ΦMA,10HZ,Film)、 94゜CTg

①SC, Liquld) 34゜C

* These results are obtained from cured 行lm.

The aboV6 打宮Ur6S ar6 for r6ferenC6 Purposes only 且nd ar6 not $poci5Cauon valueβ

14

C卯Yf肺t NIPPON ,ζAYA111CO.山

201ν4126

Confidential

1.゜ZAR-1494H ZAR-200IH

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CCR・ series (cresol novolak type)

13

98

PGMEA

10.000

550

80゜C

ZFR-1491H

98

PGMEA

11,000

500

65゜C

28゜C

CCR-1171H

Acid value (mgKOH/套) 98

Dilutin且 Solvent PGMEA

C010r (Gardner)

MW 6,500

Acryloyl equivalent (g/eq.) 400

(DMA.10HZ,Film) 120゜CT宮

ΦSC, Liquid) 35゜C

士 These results are obtained from cured 打lm.

入

CCR-1307H

60

PGMEA

2

5,700

350

152゜C

41゜C

The aboV6 "宮UreS 討6 for refer6nC6 Purp05as only and ヨr6 not 5Peci行oa虹on valU8S.

CM"叩ht NIPPON 1くAYAI0,1CO..山

201ν4126

Conf耐ential

0 OH

"Y

入0

H0

01R

1f{,

201114/26や.N1戸戸口N 1くAYAKU に口,ι:m. Confidential.゛,""0"0"乢 0"'"'0山"臼.、'.0"',0"作. 15

UXE-30oo series (Alkali-developable urethane (Meth)aC四late、虹"、1tl、 C

De、elopablEFlexible paHS 写.........巨.

' He'1tre"st'1ntPnr6

Con力den力al

140

Acid value (m昌KOH/g)

DⅡUtin目 Solvent

C010r (Gardner)

MW

AC則10yl equivalent (g/eq.)

(DMA,10HZ,Film)*T宮

(DSC, Liquid)

史 These results are obtained from cured 側m.

Th日 aboV6 "且Ur.5 ヨro for r.ference purposes only and ar. not speci介oauon values

......'...urethane bond

UXE-3002

100

PGMEA

2

フ,500

550

103゜C

畔・・t・・・.

.

,゛ゆhl NIPPONKAYA肌Ico tld

C叩γ,ゆhlo NIPPON ,〔AYA,11CO, Lld

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OligomersHeat Resistance 、T留一DMA-

Tg cc)

UXE-3024

60

PGMEA

10,000

450

126゜C

40゜C

PobEF

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OligomersDevelo in evaluation -Break point-

Oli"omers

Monomers

DPHA I0%

DPHA 20%

ZCR-

1761H

(56%)(70%)(50%)(0%)

(82%)DPHA 20% (75%)20S 30S30S 30S

(): Rate ofresidualfilm (Exposure area,60s dev,)

Developmentspeed uxE 3002 > CCR 1171H > UXE-3024, ZFR-1491H> ZAR-1494H> ZAR-200IH > ZCRーシリーズ

Monomers

DPHA I0%

Oli宮omers

> 120S > 120S > 120S > 120S

ZOR-

1664H

ZCR-

1642H

Copyr,9hl NIPPON KAYA岨、1CO.ud

201ν4126

Confldentlal 20

201114126

Conガdential 19

ZAR-

200IH

ZCR-

1569H

ZAR-

1494H

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OligomersPaせeming

ZFR-

1491H

CCR-

1171H

UXE-

3024

UXE30241DPHA=80120 B.P30S

UXE-

3002

US=50μm150μ mUS=50μm/50μ m

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ZAR・200IHIDPHA=80120 B.P.30S

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