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Electronic Supplementary Information (ESI)

Conformal phase masks made of polyurethane

acrylate with optimized elastic modulus for 3D

nanopatterning

Junyong Park,ab Dongha Tahk,cd Changui Ahn,ab Sung Gap Im,be Se-Jin Choi,c Khap-Yang Suh,d

and Seokwoo Jeonab

aDepartment of Materials Science and Engineering, Graphene Research Center, KAIST, Dajeon

305-701, Republic of Korea. E-mail: jeon39@kaist.ac.kr

bKAIST Institute for NanoCentury, KAIST, Dajeon 305-701, Republic of Korea

cR&D Center, Minuta Technology Co., Ltd., Gyeonggi-do, 447-210, Republic of Korea

dSchool of Mechanical and Aerospace Engineering, The WCU Program for Multiscale

Mechanical Design, Seoul National University, Seoul, 151-742, Republic of Korea

eDepartment of Chemical and Biomolecular Engineering, KAIST, Dajeon 305-701, Republic of

Korea

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2014

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SUPPORTING TABLE AND CAPTION

Table S1 The basic properties of c-PUA monomer (20wt% TMP(EO)15TA).

Property Value Unit

Color 154 APHA

Viscosity (at 25 °C) 2639 cPs

Refractive index 1.479 -

Specific gravity (at 25 °C) 1.1111 -

Moisture content 0.034 %

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2014

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SUPPORTING FIGURES AND CAPTIONS

Fig. S1 (a) Two different liquid PUA monomers containing the releasing agents of UV-3530 and TEGO Rad2200N (Inset: A chemical structure of TEGO series).[1] (b) Comparison of light distributions diffused from haze of cured PUA films.

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2014

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Fig. S2 A calculated critical elastic modulus for (a) line and space patterns (b) square dot arrays (duty cycle: ~50%).

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2014

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Fig. S3 Comparison of replication capability between h-PDMS and c-PUA. The used pattern includes line structures with a width of ~150 nm and a height of ~200 nm.

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2014

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Fig. S4 Optical images of contact propagation between a c-PUA phase mask supported by a thick slide glass (~2 mm) and a substrate.

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2014

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