ASML Introduces the Industry's Highest NA Immersion Tool ... ?· ASML Introduces the Industry's Highest…

Download ASML Introduces the Industry's Highest NA Immersion Tool ... ?· ASML Introduces the Industry's Highest…

Post on 25-Feb-2019




0 download

Embed Size (px)


ASML Introduces the Industry's Highest NAImmersion Tool for Volume Chip Productionat 45 nm Node13 July 2005

ASML Holding NV (ASML) today announced a newlithography system with the highest numericalaperture (NA) 1.2 in the semiconductorindustry. The ASML TWINSCAN XT:1700i systemis a 193 nm immersion scanner capable of volumechip production at the 45 nm node. The newsystem has a NA that jumped from 0.93 to 1.2,skipping the perceived, pre-immersion barrier of1.0. The first shipment to a customer, a leadingsemiconductor manufacturer ordering its secondASML immersion system, will take place in Q12006.

The XT:1700i allows chip makers to improveresolution by 30 percent, the largest improvementin decades. Better resolution means more chipsper wafer or more functionality per chip, thusincreasing the value of each wafer. Additionally,the XT:1700i has the highest throughput currentlyavailable, 122 wafers per hour, for the 45 nm node.

The XT:1700i is a milestone for thesemiconductor industry. The continuation ofMoores Law depended on either adapting existingor introducing new technology. ASML was able toenhance its fourth-generation immersion systemswith a NA that is unchallenged in the market, saidMartin van den Brink, executive vice president,marketing and technology, ASML.

Additional customer benefits found in the XT:1700iinclude:

-- A new catadioptric lens design which combinesrefractive components with mirrors to create ahyper NA lens that is cost effective to manufactureand a consistent size with other ASML systems.Co-designed with ASMLs optics partner, CarlZeiss SMT AG, the new lens will also extend tolarger NAs in future products;

-- A maximum field size of 26 by 33 mm, thelargest in the industry;

-- A polarized illumination system for improvedcontrast and exposure latitude at full throughput.With an NA of 1.2, polarization enhances resolutionby 5 nm, from 50 to 45 nm;

-- A fourth-generation, dual-stage immersion tool.All previous generation tools are being used by realcustomers to produce real chips.

1 / 2

APA citation: ASML Introduces the Industry's Highest NA Immersion Tool for Volume Chip Production at45 nm Node (2005, July 13) retrieved 25 February 2019 from

This document is subject to copyright. Apart from any fair dealing for the purpose of private study or research, nopart may be reproduced without the written permission. The content is provided for information purposes only.

Powered by TCPDF (

2 / 2


View more >