eels (electron energy loss spectroscopy): electron populations and excitations involved

ECParticipants:

UPS, UCAM, UMIL, UoS,SU, FZR, LiU, MTA

Angström

Participants:E.Coronel,S.Valizadeh, F.Ericson etc.

Museum ofNatural History

Participants:U.Hålenius

Arrhenius

Participants:G.Svensson, Terasaki

Fysikum SU: S.Csillag,S.Nyquist,S.Wachtmeister,A.Zobelli

Samples

Samples

NETWORK SHORT TITLE: NEW FULLERENE LIKE MATERIALS

Part A - The Participants

The Principal Contractor

1. Stockholm University [SU] Sweden

The Members

2 Linköping University [LiU] Sweden 3 University of Newcastle upon Tyne [UNEW] United Kingdom4 Forschungszentrum Rossendorf [FZR] Germany5 Université Paris Sud [UPS] France6 The Chancellor, Masters and Scholars of the University of Cambridge [UCAM-DENG] United Kingdom7 Technische Universitet Dreseden [TUD] Germany8 University of Milano [UMIL] Italy9 University of Sussex [UoS] United Kingdom10 Research Institute for Technical Physics and Materials Science of the Hungarian Academy of Sciences [MTA MFA] Hungary

EELS (electron energy loss spectroscopy): electron populations and excitations involved

0 100 200 300 400 5000

0.5

1.0

1.5

2.0

2.5

Energy loss (eV)

Inte

nsity

(nb

er o

f cou

nts

x 10

6 )

600 700

x50 x106

Low lossCore loss

CK

MnL2,3

EF

unoccupiedconduction

states

1s corestates

Core loss(K edge)

250 300 400 350

CK

Energy-loss (eV)

Low loss

0 10 20 30 40Energy-loss (eV)

Plasmon mode

2p corestates

Core loss(L edge)

690630 640 650 660 670 680

c)

Energy-loss (eV)

MnL2,3

I I I I

250 300 350 400

0-

40-

(nm)

Energy Loss (eV)

Spectrum line

A

B

HADF image

20 nm

450400350300Energy Loss (eV)

EELS spectrum

AB

Specimen

Magnetic spectrometer

Field emission gun

E

E -E

o

o

CameraCCD

HADF detectors

Spectrum

Probe• 0.1 to 1nA• in 0.5 to 1 nm

Scanning coils

100 keV

0.5 to 0.8 eV1ms to 10s

The spectrum image mode

4

IntroductionIntroduction

Growing interest in FIBGrowing interest in FIB

What are the drivers of this ?What are the drivers of this ? Smaller critical dimensionsSmaller critical dimensions Fewer and smaller critical sitesFewer and smaller critical sites More reliance on TEMMore reliance on TEM Interest in micro and nano machiningInterest in micro and nano machining Greater variety of materials from: biologicalGreater variety of materials from: biological

sciences, astro-geology, superconductors,sciences, astro-geology, superconductors,ceramics, metallurgy, …..ceramics, metallurgy, …..

10

The DualBeam Advantage:The DualBeam Advantage:

TheCoincidencePoint

Introduction

Large stage systems:200mm stage DualBeam300mm stage DualBeam

Ga+ ions are rastered across a specimen and secondary electron / ion signals are

collected by a detector.

Liquid Metal Ion Source (LMIS) is used to generate an ion beam.

The ion beam is focused through a series of lenses and concentrated at a focal point

through an aperture.

13

Strata DB235: Optimized GeometryStrata DB235: Optimized Geometry

DetectorDetector

HexalensHexalens

GISGIS

MagnumMagnum

SampleSample

EDXEDX

Single coincident point:Single coincident point:

SEMSEM

FIBFIB

Gas ChemistryGas Chemistry

Chemical AnalysisChemical Analysis

Eucentric stage-tiltEucentric stage-tilt

No compromise forNo compromise forelectron or ionelectron or ioncolumncolumn

5mm WD5mm WD

Introduction

Chemical reactions can be induced between adsorbed gas and substrate particles

Gas-enhanced etching is efficient for removing large volumes of material and is chemistry-specific

Conductors and insulators can be deposited by using different gases.

12

GISGIS

EDSEDS

MagnumMagnum

HexalensHexalens

StageStage

27

Site specific sample prepSite specific sample prep