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Applied Materials Characterization
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
MATERIALS RESEARCH SOCIETY SYMPOSIA PROCEEDINGS
ISSN 0272- 9172
Volume 1—Laser and Electron-Beam Solid Interactions and Materials Processing,J. F. Gibbons, L. D. Hess, T. W. Sigmon, 1981
Volume 2—Defects in Semiconductors, J. Narayan, T. Y. Tan, 1981Volume 3—Nuclear and Electron Resonance Spectroscopies Applied to Materials
Science, E. N. Kaufmann, G. K. Shenoy, 1981Volume 4—Laser and Electron-Beam Interactions with Solids, B. R. Appleton,
G. K. Celler, 1982Volume 5—Grain Boundaries in Semiconductors, H. J. Leamy, G. E. Pike,
C. H. Seager, 1982Volume 6—Scientific Basis for Nuclear Waste Management, S. V. Topp, 1982Volume 7—Metastable Materials Formation by Ion Implantation, S. T. Picraux,
W. J. Choyke, 1982Volume 8—Rapidly Solidified Amorphous and Crystalline Alloys, B. H. Kear,
B. C. Giessen, M. Cohen, 1982Volume 9—Materials Processing in the Reduced Gravity Environment of Space,
G. E. Rindone, 1982Volume 10—Thin Films and Interfaces, P. S. Ho, K.-N. Tu, 1982Volume 11—Scientific Basis for Nuclear Waste Management V, W. Lutze, 1982Volume 12—In Situ Composites IV, F. D. Lemkey, H. E. Cline, M. McLean, 1982Volume 13—Laser Solid Interactions and Transient Thermal Processing of Materials,
J. Narayan, W. L. Brown, R. A. Lemons, 1983Volume 14—Defects in Semiconductors II, S. Mahajan, J. W. Corbett, 1983Volume 15—Scientific Basis for Nuclear Waste Management VI, D. G. Brookins, 1983Volume 16—Nuclear Radiation Detector Materials, E. E. Haller, H. W. Kraner, W. A.
Higinbotham, 1983Volume 17—Laser Diagnostics and Photochemical Processing for Semiconductor
Devices, R. M. Osgood, S. R. J. Brueck, H. R. Schlossberg, 1983Volume 18—Interfaces and Contacts, R. Ludeke, K. Rose, 1983Volume 19—Alloy Phase Diagrams, L. H. Bennett, T. B. Massalski, B. C. Giessen,
1983Volume 20—Intercalated Graphite, M. S. Dresselhaus, G. Dresselhaus, J. E. Fischer,
M. ]. Moran, 1983Volume 21—Phase Transformations in Solids, T. Tsakalakos, 1984Volume 22—High Pressure in Science and Technology, C. Homan, R. K. MacCrone,
E. Whalley, 1984Volume 23—Energy Beam-Solid Interactions and Transient Thermal Processing,
J. C. C. Fan, N. M. Johnson, 1984Volume 24—Defect Properties and Processing of High-Technology Nonmetallic
Materials, J. H. Crawford, Jr., Y. Chen, W. A. Sibley, 1984
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
MATERIALS RESEARCH SOCIETY SYMPOSIA PROCEEDINGS
Volume 25—Thin Films and Interfaces II, J. E. E. Baglin, D. R. Campbell, W. K. Chu,1984
Volume 26—Scientific Basis for Nuclear Waste Management VII, G. L. McVay, 1984Volume 27—Ion Implantation and Ion Beam Processing of Materials, G. K. Hubler,
O. W. Holland, C. R. Clayton, C. W. White, 1984Volume 28—Rapidly Solidified Metastable Materials, B. H. Rear, B. C. Giessen, 1984Volume 29—Laser-Controlled Chemical Processing of Surfaces, A. W. Johnson,
D. J. Ehrlich, H. R. Schlossberg, 1984Volume 30—Plasma Processing and Synthesis of Materials, J. Szekely, D. Apelian,
1984Volume 31—Electron Microscopy of Materials, W. Krakow, D. Smith, L. W. Hobbs,
1984Volume 32—Better Ceramics Through Chemistry, C. J. Brinker, D. E. Clark, D. R.
Ulrich, 1984Volume 33—Comparison of Thin Film Transistor and SOI Technologies, H. W. Lam,
M. J. Thompson, 1984Volume 34—Physical Metallurgy of Cast Iron, H. Fredriksson, M. Hillerts, 1985Volume 35—Energy Beam-Solid Interactions and Transient Thermal Processing/1984,
D. K. Biegelsen, G. Rozgonyi, C. Shank, 1985Volume 36—Impurity Diffusion and Gettering in Silicon, R. B..Fair, C. W. Pearce,
J. Washburn, 1985Volume 37—Layered Structures, Epitaxy and Interfaces, J. M. Gibson, L. R. Dawson,
1985Volume 38—Plasma Synthesis and Etching of Electronic Materials, R. P. H. Chang,
B. Abeles, 1985Volume 39—High-Temperature Ordered Intermetallic Alloys, C. C. Koch, C. T. Liu,
N. S. Stoloff, 1985Volume 40—Electronic Packaging Materials Science, E. A. Giess, K.-N. Tu,
D. R. Uhlmann, 1985Volume 41— Advanced Photon and Particle Techniques for the Characterization of
Defects in Solids, J. B. Roberto, R. W. Carpenter, M. C. Wittels, 1985Volume 42—Very High Strength Cement-Based Materials, J. F. Young, 1985Volume 43—Coal Combustion and Conversion Wastes: Characterization, Utilization,
and Disposal, G. J. McCarthy, R. J. Lauf, 1985Volume 44—Scientific Basis for Nuclear Waste Management VIII, C. M. Jantzen,
J. A. Stone, R. C. Ewing, 1985Volume 45—Ion Beam Processes in Advanced Electronic Materials and Device
Technology, F. H. Eisen, T. W. Sigmon, B. R. Appleton, 1985Volume 46—Microscopic Identification of Electronic Defects in Semiconductors, N. M.
Johnson, S. G. Bishop, G. D. Watkins, 1985
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
MATERIALS RESEARCH SOCIETY SYMPOSIA PROCEEDINGS
Volume 47—Thin Films: The Relationship of Structure to Properties, C. R. Aita, K. S.SreeHarsha, 1985
Volume 48—Applied Material Characterization, W. Katz, P. Williams, 1985Volume 49—Materials Issues in Applications of Amorphous Silicon Technology,
D. Adler, A. Madan, M. J. Thompson, 1985Volume 50—Scientific Basis for Nuclear Waste Management IX, L. O. Werme, 1985
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
MATERIALS RESEARCH SOCIETY SYMPOSIA PROCEEDINGS VOLUME 48
Applied Materials Characterization
Symposium held April 15-18, 1985, San Francisco, California, U.S.A.
EDITORS:
W. KatzGeneral Electric Company, Schenectady, New York, U.S.A.
P. WilliamsArizona State University, Tempe, Arizona, U.S.A.
IMIRFSI MATERIALS RESEARCH SOCIETYPittsburgh, Pennsylvania
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
cambridge university press Cambridge, New York, Melbourne, Madrid, Cape Town, Singapore, São Paulo, Delhi, Mexico City
Cambridge University Press32 Avenue of the Americas, New York ny 10013-2473, USA
Published in the United States of America by Cambridge University Press, New York
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Materials Research Society506 Keystone Drive, Warrendale, pa 15086http://www.mrs.org
© Materials Research Society 1985
This publication is in copyright. Subject to statutory exceptionand to the provisions of relevant collective licensing agreements, no reproduction of any part may take place without the written permission of Cambridge University Press.
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First published 1985 First paperback edition 2012
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www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
Contents
Preface x l
Acknowledgments Xlll
PART I: ATOMIC ORDERING OF MATERIALSAND CHEMICAL BONDING ANALYSIS MATERIALS
THE USE OF LEED FOR THE CHARACTERIZATION OF SURFACE DAMAGEFROM PULSED-LASER IRRADIATION
Aubrey L. Helms, Jr., Chih-Chen Cho, Steven L. Bernasek, andClifton W. Draper 3
REFRACTORY METALS GROWTH ON MBE GaAsJ. Bloch and M. Heiblum 13
ELECTRON SPECTROSCOPIC STUDIES OF SUBSTOICHIOMETRICTANTALUM CARBIDE
G.R. Gruzalski, D,M, Zehner, and G.W. Ownby 19
CATION SOLUTE SEGREGATION TO SURFACES OF MgO and a-Al2O3
Robert C. McCune 27
PROPERTIES OF SINGLE-CRYSTAL SILICON FILMS ON AMORPHOUS SiO2ON SINGLE-CRYSTAL CUBIC ZIRCONIA SUBSTRATES
I. Golecki, R.L. Maddox, H.L. Glass, A.L. Lin, andH.M. Manasevit 37
ATOMIC INTERACTIONS IN SILICON-METAL COMPLEXES ON W(110)John D. Wrigley and Gert Ehrlich 47
THE THICKNESS EFFECT ON THE MICROSTRUCTURE OF SPUTTEREDFILMS STUDIED BY A NEW X-RAY DIFFRACTION METHOD
M. Hecq 55
SURFACE ELECTRONIC FUNCTION PROPERTIES FROM DEFECT HETEROGENEITYDOMINATED SPECULAR/GLANCING/GRAZING VERSUS BULK TRANSMISSIONSMALL-ANGLE SCATTERING (SAS) DIFFRACTION-PATTERN VIA THE STATICSYNERGETICS ALGORITHM/EXPERIMENTAL MODEL
Edward Siegel 63
CORE-LEVEL ELECTRON BINDING-ENERGY CHANGE OF EVAPORATED PdShigemi Kohiki 71
DEPTH OF PENETRATION OF THE PLASMA FLUORINATION REACTIONINTO VARIOUS POLYMERS
Eve A. Wildi, Gerald J. Scilla, and Alan DeLuca 79
SURFACE COMPOSITION OF CARBURIZED TUNGSTEN TRIOXIDEAND ITS CATALYTIC ACTIVITY
Masatoshi Nakazawa and H. Okamoto 85
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Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
INSTANTANEOUS IMPEDANCE OF ALUMINIUM IN ANODICPOLARIZATION STATUS
Zhu Yingyang, Wang Kuang, Zhu Rizhang, andZhang Wengi 91
PART II: MICROSTRUCTURES OF MATERIALS ANDELEMENTAL ANALYSIS
PROGRESS AND PROSPECTS OF MATERIALS CHARACTERIZATION ATSUBNANOMETER SPATIAL RESOLUTION USING FINELY FOCUSSEDELECTRON BEAMS
Michael Issacson 107
TRANSMISSION ELECTRON MICROSCOPE INVESTIGATION OF SPUTTEREDCo-Pt THIN FILMS
P. Alexopoulos, R.H. Geiss, and M. Schlenker 117
CHARACTERIZATION OF THE Ni/NiO INTERFACE REGION INOXIDIZED HIGH-PURITY NICKEL BY TRANSMISSION ELECTRONMICROSCOPY
Howard T. Sawhill and Linn W. Hobbs 127
INTERFACE STUDY OF Mo/GaAsPeiching Ling, Jyh-Kao Chang, Min-Shyong Lin, andJen-Chung Lou 137
DETERMINATION OF THE COMPOSITION AND THICKNESS OF THINPOTASSIUM POLYPHOSPHIDE FILMS
Klara Kiss and Paul M. Figura 145
DEFECTS IN PLATINUM SILICIDE FORMATIONMichael J. Warburton 159
AUGER ELECTRON ANALYSIS OF OXIDES GROWN ON A DILUTEZIRCONIUM/NICKEL ALLOY
R.A. Ploc, R.D. Davidson, and J.A. Roy 169
AUGER SPUTTER DEPTH PROFILING APPLIED TO ADVANCEDSEMICONDUCTOR DEVICE STRUCTURES
D.K. Skinner, C. Hill, and M.W. Jones 179
SURFACE SEGREGATION OF Ni-Cr ALLOYN.Q. Chen, Q.J. Zhang, and Z.Y. Hua 185
THE EFFECT OF OXYGEN ON DIFFUSION AND COMPOUNDINGAT Ni-GaAs (100) INTERFACES
J.S. Solomon, D.R. Thomas, and S.R. Smith 191
THE CHARACTERIZATION OF ALLOYED NiGeAuAgAu OHMIC CONTACTSTO AlInAs/GalnAs HETEROSTRUCTURE BY AUGER ELECTRONSPECTROSCOPY AND WAVE LENGTH DISPERSIVE X-RAY ANALYSIS
P.M. Capani, S.D. Mukherjee, L. Rathbun, H.T. Griem,G.W. Wicks, L.F. Eastman, and J. Hunt 203
EXPERIMENTAL INVESTIGATION OF GaAs SURFACE OXIDATIONS. Matteson and R.A. Bowling 215
viii
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Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
PART III: MATERIALS CHARACTERIZATIONWITH ION BEAMS
ON THE USE OF SECONDARY ION MASS SPECTROMETRY INSEMICONDUCTOR DEVICE MATERIALS AND PROCESS DEVELOPMENT
Charles W. Magee and Ephraim M. Botnick 229
SIMS CHARACTERIZATION OF THIN THERMAL OXIDE LAYERSON POLYCRYSTALLINE ALUMINIUM
F. Degreve and J.M. Lang 241
SIMS, SAM, AND RBS STUDY OF HIGH-DOSE OXYGEN IMPLANTATIONINTO SILICON
W.M. Lau, P. Ratnam, and C.A.T. Salama 263
IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANAYLSISRichard T. Lareau and Peter Williams 273
SECONDARY ION MASS SPECTROSCOPY OF CERAMICSJenifer A.T. Taylor, Paul F. Johnson, andVasantha R.W. Amarakoon 281
SIMS ANALYSIS OF PURE AND HYDRATED CEMENTSErich Naegele and Ulrich Schneider 289
APPLICATION OF SIMS DEPTH PROFILING TO CERAMICMATERIALS
Jenifer A.T. Taylor, Paul F. Johnson, andVasantha R.W. Amarakoon 299
ULTRASENSITIVE ELEMENTAL ANALYSIS OF MATERIALS USINGSPUTTER-INITIATED, RESONANCE-IONIZATION SPECTROSCOPY
J.E. Parks, D.W. Beekman, H.W. Schmitt, and M.T. Spaar 309
MICROFOCUSSED ION BEAMS FOR SURFACE ANALYSIS ANDDEPTH PROFILING
David R. Kinghan, P. Vohralik, D. Fathers, A.R. Waugh,and A.R. Bayly 319
SOME APPLICATIONS OF SIMS AND SSMS IN MATERIALSCHARACTERIZATION
J. Verlinden, R. Vlaeminck, F. Adams, and R. Gijbels 331
CHARACTERIZATION OF THIN METAL FILMS BY SIMS, AUGER,AND TEM
B.K. Furman, J.P. Benedict, K.L. Granato,R.M. Prestipino, and D.Y. Shih 341
TITANIUM SILICIDE FORMATION ON HEAVILY DOPEDARSENIC-IMPLANTED SILICON
S.L. Dowben, D.W. Marsh, G.A. Smith, N. Lewis,T.P. Chow, and W. Katz 355
THE CHARACTERIZATION OF INTENTIONAL DOPANTS INHgCdTe USING SIMS, HALL-EFFECT, AND C-V MEASUREMENTS
L.E. Lapides, R.L. Whitney, and C.A. Crosson 365
ix
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Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
PART IV: HIGH ENERGY METHODS AND MATERIALSCHARACTERIZATION USING PHOTON BEAMS
HYDROGEN MEASUREMENT OF THIN FILM SILICON: HYDROGENALLOY FILMS TECHNIQUE COMPARISON
Gary A. Pollock 379
HYDROGENATION DURING THERMAL NITRIDATION OF SiO2A.E.T. Kuiper, F.H.P.M. Habraken, and James T. Chen 387
GROWTH AND COMPOSITION OF LPCVD SILICON OXYNITRIDE FILMSF.H.P.M. Habraken and A.E.T. Kuiper 395
MeV HELIUM MICROBEAM ANALYSIS: APPLICATIONS TO SEMICONDUCTORSTRUCTURES
R.A. Brown, J.C. McCallum, C D . McKenzie, andJ.S. Williams 403
CONCENTRATION MEASUREMENTS AND DEPTH PROFILING OFPHOSPHORUS AND BORON BY MEANS OF (p, ) RESONANTREACTIONS
M.J.M. Pruppers, F. Zijderhand, F.H.P.M. Habraken,and W.F. van der Weg 409
MATERIALS CHARACTERIZATION WITH INTENSE POSITRON BEAMSI.J. Rosenberg, R.H. Howell, M.J. Fluss, and P. Meyer 419
EFFECTS OF AMBIENT GAS ON THE OUT-DIFFUSION OF NICKELAND COPPER THROUGH THIN GOLD FILMS
R.K. Lewis, S.K. Ray, K. Seshan 425
ELASTIC RECOIL ANALYSIS OF HYDROGEN IN ION-IMPLANTED'MAGNETIC BUBBLE GARNETS USING 44 MeV CHLORINE IONS
A. Leiberich, B. Flaugher, and R. Wolfe 431
APPLICATIONS OF SURFACE ANALYSIS BY LASER IONIZATION(SALI) TO INSULATORS AND II-VI COMPOUNDS
C.H. Becker, C M . Stahle, and D.J. Thomson 447
INFLUENCE OF THE DENSITY OF OXIDE PARTICLES ON THEDIFFUSIONAL BEHAVIOR OF OXYGEN IN INTERNALLY OXIDIZED,SILVER-BASED ALLOYS
F.H. Sanchez, R.C. Mercader, A.F. Pasquevich,A.G. Bibiloni, and A. Lopez-Garcia 455
HIGH-TEMPERATURE RAMAN STUDIES OF PHASE TRANSITIONSIN THIN-FILM DIELECTRICS
Gregory J. Exarhos 461
USE OF ENERGY-LOSS STRUCTURES IN XPS CHARACTERISATIONOF SURFACES
J.E. Castle, I. Abu-Talib, and S.A. Richardson 471
AUTHOR INDEX
SUBJECT INDEX
481
483
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Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
Preface
This book contains papers presented at the symposium on "Applied Ma-terials Characterization" held in San Francisco, CA, April 15-18, 1985. Thissymposium, which was part of the Materials Research Society meeting, wasthe first ever to address the topic of materials characterization. Thesymposium provided an international forum consisting of eight oral sessionsin which eight invited and 55 contributed papers were presented.
The symposium dealt with both the development of advanced characteri-zation techniques and the application of characterization technology tonovel materials. Papers addressed understanding materials from an atomiclevel as well as bulk chemical and physical properties. Sessions dealt withattempting to unravel materials on a fundamental level using many of the morecommon electron and ion spectroscoples. In addition, frontier areas in newcharacterization techniques were also covered - novel methods such asRaman spectroscopy for studies of high-temperature phase transitions,conversion-electron Mossbauer spectroscopy, and positron annihilation studieswere shown to be promising surface analytical tools.
Symposium Co-Chairmen
W. Katz P. Williams
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
Acknowledgments
We would like to thank all the conference participants, particularlythe invited speakers who provided excellent reviews of their topics. Theyare:
W. Gibson, R.J. Hitzman, M. Isaacson, M. Lagally, C.W. Magee,R.P. Messmer, J. Spence, N. Winograd
We are also grateful to the session chairmen who directed the sessionsand guided discussion:
J. Burkstrand, V.R. Deline, B.K. Furman, C.W. Magee, R.P. Messmer,G.A. Smith
It is our pleasure to acknowledge with gratitude the financial supportprovided by the following companies:
A.G. Associates, Cameca Ins t rumen t s ,Charles Evans and associatesGeneral Ionex, Instruments, S.A., JOEL, Leybold-Heraeus, Perkin-Elmer-Physical Electronics Division, Philips, Surface ScienceInstruments, V.G. Instruments
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Cambridge University Press978-1-107-40569-1 - Materials Research Society Symposia Proceedings: Volume 48:Applied Materials CharacterizationEditors: W. Katz and P. WilliamsFrontmatterMore information
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