1 automated design of misaligned-carbon-nanotube-immune circuits nishant patil jie deng h.-s. philip...

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1

Automated Design of Misaligned-Carbon-Nanotube-Immune

Circuits

Nishant Patil

Jie Deng

H.-S. Philip Wong

Subhasish Mitra

Departments of Electrical Engineering & Computer ScienceStanford University

2

Misaligned Carbon Nanotubes (CNTs)

Misaligned-CNT-Immune Logic Design

Aligned CNTs on Quartz – Prof. Zhou, USC

3

CNFET Transistor Layout

Substrate (e.g Quartz) CNT undoped region

Lithographic Gate

CNT doped region

Side View Top View

Oxide

CNT undoped region

4

Perfect CNFET Inverter Layout

V. Derycke et al., Nano Letters, p. 453, 2001.N+ doped

SemiconductingCNTs

Vdd Contact

OutputContact

Gnd Contact

Gate

Input

Input

P+ doped Semiconducting

CNTs64nm = 4λ

4nm

5

CNFET Fabrication Process

Define cell regions on substrate

Etch CNTs outside cell regions

Define gates and contacts

Chemically dope CNTs

Vdd

Gnd

Out1 Out2

Gate A

Gate B

Gate B

Gate AGate

A

Gate B

GateA

Gate B

Out1 Out2

P+ doped CNTs

N+ doped CNTs

Vdd

Gnd

Undoped (intrinsic) CNTs

6

CNFET Imperfections: Misaligned CNTs

Out

Gate A

Gate B

Gate A

Gate B

VddA

AB

Short

Vdd

Gnd

Gnd

OutB

Out

A B

C D

Wanted: AC + BD

Got: AC + BD + AD

Gnd

Vdd

Wanted: A+B in pullup; Got: Short

7

BA

A

B

Misaligned-CNT-Immune NAND Design

Vdd

Gnd

Out

1. Grow CNTs

2. Define gates and contacts

3. Chemically dope P-type region

4. Chemically dope N-type region

5. Etch

Undoped region

enables misaligned-

CNT-immune design

8

BA

A

B

Misaligned-CNT-Immune NAND Design

Vdd

Gnd

Out

1. Grow CNTs

2. Define gates and contacts

3. Etch CNTs

4. Chemically dope P-type region

5. Chemically dope N-type region

Etched region

enables misaligned-

CNT-immune design

9

Generalized Algorithm

Characterize Layout

Misaligned-CNT-Immune

OR Misaligned-CNT-Vulnerable

Implement Arbitrary Logic function

Misaligned-CNT-Immune Layout

10

Contact

Doped

Gate A

Gate B

Contact

CCC

GA GA

GB GB

D D D

D

D D D

D

DDD

Misaligned-CNT-Vulnerable NAND: Pull-up

A

B

Implemented FunctionA or B or

(A AND B) or 1 ==

1 != A or B

A

B

Contact

Contact

1

1

A

B

1

CCC

Path 1: C-D-A-D-C : fn = APath 2: C-D-B-D-C : fn = B

Path 3: C-D-A-D-B-D-C : fn = A & BPath 4: C-D-C : fn = 1

Intended Function A or B

11

Misaligned-CNT-Immune NAND: Pull-up

UDGA GB

Doped

Doped

Gate B

Contact

Doped

Contact

Gate A

Doped

Undoped

Intended Function A or B

Implemented FunctionA or B or

(A and B) or (A and B and 0)

== A or B

B

Contact

Contact

A

Path 1: C-D-A-D-C : fn = APath 2: C-D-B-D-C : fn = B

Path 3: C-D-A-D-B-C : fn = A & BPath 4: C-D-B-UD-A-D-C : fn = 0

1

1A B

1

1

0

Contact

Contact

12

Misaligned-CNT-Immune Arbitrary Function

Gates

A + (B + C)(D + E)Undoped regionsCNTs

CB

Vdd/ Gnd Contact

A

Output Contact

ED

Intermediate Contact

Immune to ANY number of misaligned CNTs Arbitrary logic function Formal correctness proof (Details in paper)

13

Simulation Results

Penalties over Vulnerable CNFET Circuit

Cell Type Area Energy Delay [max {rise, fall}]

nand2 -1% 3% -7%

nand3 11% 15% 10%

nor2 -1% 5% 1%

nor3 11% 16% 10%

aoi21 -2% 1% 1%

Full Adder 12% 10% 7%

Misaligned-CNT-Immune vs. Misaligned-CNT-VulnerableCNFET model Deng & Wong, SISPAD 06

10% accuracy: DC & AC measurements Amlani, et al., IEDM 06

Significantly less penalty vs. traditional fault tolerance

14

Conclusion

Misaligned CNT Immune Design

Perfect alignment not needed: immune by design

Ideal case: 13X better EDP vs. 32nm CMOS

Efficient misaligned-CNT-immune circuits

Significantly less overhead than replication

Metallic CNTs

15

Thank You

16

Misaligned-CNT-Vulnerable NAND: Pulldown

A

BGate B

Contact

Contact

Gate A

Doped

Doped

Doped

Intended Function A and B

Path: C-D-A-D-B-D-C

Implemented FunctionA and B

Contact

Doped

Gate A

Gate B

Contact

Doped

Doped

A

B

Contact

Contact

1

1

A

1

B

1

1

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