化工概論: 製程分析模擬最適化與控制_陳奇中教授演講投影片
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化學工程概論Introduction to Chemical Engineering
製程設計、分析、模擬、最適化與控制Process Design, Analysis, Simulation, Optimization and Control
製程設計 (Process Design)
chemical
process
原料Raw
materials
1. 需經過哪些流程 ? Which process is suitable?2. 需由幾個單元程序組成生產線 ? What units should be involved in the process?
產品Products
原料 A
原料 B
蒸餾塔
產品
蒸氣
反應器
(Luyben and Luyben, 1997)
製程分析 (Process Analysis)
1. 是否可實現 ? (Realization)2. 能源消耗 ? (Energy issues)3. 操作可行性 ? (Operational feasibility)4. 設備維護 ? (Maintenance)
製程模擬 (Process Simulation)
軟體 : Aspen plus ( 整廠 )( 模組化 )
(Software) Chem CAD ( 整廠 )( 模組化 ) COMSOL Multiphysics ( 多重
物理量 ) … MATLAB ( 單元 )( 程式寫作 )
硬體 : computer, monitor, printer, etc.
(Hardware)
program design – algorithm, etc.
CSTR 混和器動態模擬設計
T
B
H
D
h
Tank diameter T 0.28m
Depth of liquid H 0.2m
Baffle width B 0.03m
Impeller diameter D 0.112m
Impeller blade width w 0.025m
Impeller blade height h 0.025m
Impeller clearance C 0.06m
Dimensionless parameters
D/T 0.4
H/T 0.714
B/T 0.107
C
w
Subdomain
ρ=1000 kg/m3
η=0.01 Pa ． s = 10 cp
攪拌葉設計
水平式 MOCVD 反應器之動態模擬 AIXTRON, AIX200/4 水平式 MOCVD 反應器
上口端進料 III: trimethylgallium, TMGa ( 三甲基鎵 )
下口端進料 V: tertiary- butylarsine, TBAs ( 叔丁基砷 )GaAs
Simulation of a MOCVD Reactor
0
0
Tp
t
t
uu u u u
u
ii i i i
cD c c R
t
u
p p
TC k T C T Q
t
u
動量平衡 (Momentum balance) 能量平衡 (Energy balance)
質量平衡 (Mass balance)
VV,in
VIII,in
化學反應機構 (Chemical reaction)
氣相反應 (Gas reaction)
TMGa+H2 MMGa+2CH4 (G1) TBAs AsH+C4H8+H2 (G2)
表面反應 (Surface reaction)
MMGa+AsH GaAs(s)+CH4 (S1)
製程最適化 (Process Optimization)
獲利最佳化 (maximal profits) 能源消耗最小化 (minimal energy loss) 原料成本最小化 (minimum costs)
操作條件之選擇 (selection of optimal operating conditions)
① 單目標 (single objective)
② 多目標 (multi-objective)
Where is the global minimum?
Benchmark test: search for the global minimum
Global optimal solution
X(-3.79,-3.32)
F=43.3030
2 22 21 2 1 2 1 2min 11 7 3 57
.
5 5, 1, 2i
F x x x x x x
s t
x i
Modified Himmelblau function, 1993
Convergence of the solution
Before After
Optimal design of an MOCVD reactor
98.65 10 / minGR dA
GR mA
0.003504GR GR
dAGR
911.65 10 / minGR dA
GR mA
0.00220GR GR
dAGR
Concept of multi-objective optimization 多目標最佳化
Cost
Com
fort
10 k 100 k
40%
90%
f 2
f1
Feasible objective space
Pareto-optimal front
Second level
Concept of Pareto-optimal solutions : non-dominated
A
B
CD
B dominate A
C dominate A
B, C non-dominated
D, E non-dominated
E dominate A, B, C
D dominate A, BE
(Goldberg, 1989)
-45 -40 -35 -30 -25 -20 -15 -10 -5 0-10
0
10
20
30
40
50
60
70
80
90
Growth Rate (nm/min)
Un
ifo
rmit
y in
de
x
Optimal Pareto-front solutions of an MOCVD
AD
C
B
Uncertainties ? 不明確因素
Sources of uncertainties
- modeling errors- physical parameter
variations- change of environments- unknown dynamics
…Deterministic design Not reliable
uncertainties
Uncertainty is
everywhere.
Deb et al. (2009)
Deterministic solution vs. Reliable solution
*Deterministic optimum
Reliable solution
Stochastic constraint
0 2 4 6 8 100
1
2
3
4
5
6
7
8
9
10
1
2Example 4.2
Solution cells with different reliability indices (0, 0.5, 1, 1.5, 3)
程序控制 (Process Control)
系統識別 (modeling) 控制器設計 (controller design) 控制系統分析 ( 穩定性 , 控制品質 )
(stability & performance) 常用控制策略 (control strategies)
PID controller
Model predictive control
Intelligent controllers, etc.
CSTR 反應器之 PI 控制
1 21 1
2
(1 )exp1a
dx xx D x
dt x
ux
xxBDx
dt
dxa
2
212
2
1exp)1()1(
2 2 2 20
1( ) ( ) ( )
t
c s sI
u t K x x x x dtT
Simulink
智慧型批次間控制 (Run-to-Run)
Rotational Wafer CarrierSlurry
Feeding System
Rotational Table
Supporting
the Pad and the Wafer
CMP Simulink
0 500 1000 1500 2000 2500 3000 3500 4000 4500 5000-500
0100
500
1000
1500
2000
2500
3000MIMO System with metrology delay of 0
Wafer Run#
Res
pons
es
Std.dev. = 60.0055(+0.0002) Mean = 2001.2
Std.dev. = 30.0075(+0.0063) Mean = 99.9
Non-Uniformity (Min. Std.dev.=60.0053)
Removal Rate (Min. Std.dev.=30.0012)
智慧型批次間控制技術 :傳統控制技術 :
半導體 CMP 製程 控制品質比較
結語 (Summary)
製程設計、分析、模擬、最適化與控制Process Design, Analysis, Simulation, Optimization and Control
高效率、低耗能、零汙染的 綠色新製程 (Green Process)
Q & A
謝謝聆聽敬請指教
Quiz (1/3)
1. What are the main parts of a green process? (1) high efficiency (2) low pollution (3) low material and energy consumptions (4) all the above.
2. Why a process should be operated at its optimum condition? (1) low cost and energy loss (2) high productivity (3) high profit (4) all the above.
Quiz (2/3)
3. Why a control system is necessary in a chemical process? (1) stable operation (2) disturbance rejection (3) low product variations (4) all the above.
4. Why a simulation tool is necessary for process design? (1) low cost (2) reliability (3) be able to achieve a better design (4) all the above.
Quiz (3/3)
5. What are the main issues of process analysis? (1) realization and operational feasibility (2) maintenance (3) energy consumptions (4) all the above.